Fabrication of inverted opal ZnO photonic crystals by atomic layer deposition

M. Scharrer, X. Wu, A. Yamilov, H. Cao, R. P.H. Chang

Research output: Contribution to journalArticle

140 Citations (Scopus)

Abstract

We have fabricated three-dimensional optically active ZnO photonic crystals by infiltrating polystyrene opal templates using a low-temperature atomic layer deposition process. The polystyrene is removed by firing the samples at elevated temperatures, and reactive ion etching is used to remove the top layer of ZnO and expose the (111) photonic crystal surface. The resulting structures have high filling fractions, possess photonic band gaps in the near-UV to visible spectrum, and exhibit efficient photoluminescence.

Original languageEnglish
Article number151113
Pages (from-to)1-3
Number of pages3
JournalApplied Physics Letters
Volume86
Issue number15
DOIs
Publication statusPublished - Jul 4 2005

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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