Fabrication of inverted opal ZnO photonic crystals by atomic layer deposition

M. Scharrer, X. Wu, A. Yamilov, H. Cao, Robert P. H. Chang

Research output: Contribution to journalArticle

137 Citations (Scopus)

Abstract

We have fabricated three-dimensional optically active ZnO photonic crystals by infiltrating polystyrene opal templates using a low-temperature atomic layer deposition process. The polystyrene is removed by firing the samples at elevated temperatures, and reactive ion etching is used to remove the top layer of ZnO and expose the (111) photonic crystal surface. The resulting structures have high filling fractions, possess photonic band gaps in the near-UV to visible spectrum, and exhibit efficient photoluminescence.

Original languageEnglish
Article number151113
Pages (from-to)1-3
Number of pages3
JournalApplied Physics Letters
Volume86
Issue number15
DOIs
Publication statusPublished - 2005

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atomic layer epitaxy
photonics
fabrication
polystyrene
crystals
visible spectrum
crystal surfaces
templates
etching
photoluminescence
ions
temperature

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Fabrication of inverted opal ZnO photonic crystals by atomic layer deposition. / Scharrer, M.; Wu, X.; Yamilov, A.; Cao, H.; Chang, Robert P. H.

In: Applied Physics Letters, Vol. 86, No. 15, 151113, 2005, p. 1-3.

Research output: Contribution to journalArticle

Scharrer, M. ; Wu, X. ; Yamilov, A. ; Cao, H. ; Chang, Robert P. H. / Fabrication of inverted opal ZnO photonic crystals by atomic layer deposition. In: Applied Physics Letters. 2005 ; Vol. 86, No. 15. pp. 1-3.
@article{4b815241bd3944e0b4e5b9714ed97ca4,
title = "Fabrication of inverted opal ZnO photonic crystals by atomic layer deposition",
abstract = "We have fabricated three-dimensional optically active ZnO photonic crystals by infiltrating polystyrene opal templates using a low-temperature atomic layer deposition process. The polystyrene is removed by firing the samples at elevated temperatures, and reactive ion etching is used to remove the top layer of ZnO and expose the (111) photonic crystal surface. The resulting structures have high filling fractions, possess photonic band gaps in the near-UV to visible spectrum, and exhibit efficient photoluminescence.",
author = "M. Scharrer and X. Wu and A. Yamilov and H. Cao and Chang, {Robert P. H.}",
year = "2005",
doi = "10.1063/1.1900957",
language = "English",
volume = "86",
pages = "1--3",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",
number = "15",

}

TY - JOUR

T1 - Fabrication of inverted opal ZnO photonic crystals by atomic layer deposition

AU - Scharrer, M.

AU - Wu, X.

AU - Yamilov, A.

AU - Cao, H.

AU - Chang, Robert P. H.

PY - 2005

Y1 - 2005

N2 - We have fabricated three-dimensional optically active ZnO photonic crystals by infiltrating polystyrene opal templates using a low-temperature atomic layer deposition process. The polystyrene is removed by firing the samples at elevated temperatures, and reactive ion etching is used to remove the top layer of ZnO and expose the (111) photonic crystal surface. The resulting structures have high filling fractions, possess photonic band gaps in the near-UV to visible spectrum, and exhibit efficient photoluminescence.

AB - We have fabricated three-dimensional optically active ZnO photonic crystals by infiltrating polystyrene opal templates using a low-temperature atomic layer deposition process. The polystyrene is removed by firing the samples at elevated temperatures, and reactive ion etching is used to remove the top layer of ZnO and expose the (111) photonic crystal surface. The resulting structures have high filling fractions, possess photonic band gaps in the near-UV to visible spectrum, and exhibit efficient photoluminescence.

UR - http://www.scopus.com/inward/record.url?scp=20844459639&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=20844459639&partnerID=8YFLogxK

U2 - 10.1063/1.1900957

DO - 10.1063/1.1900957

M3 - Article

VL - 86

SP - 1

EP - 3

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 15

M1 - 151113

ER -