Field emission from atomically thin edges of reduced graphene oxide

Katsuhisa Murakami, Hisato Yamaguchi, Goki Eda, Takeshi Fujita, Pengfei Guan, Weichao Wang, Cheng Gong, Julien Boisse, Steve Miller, Muge Acik, Kyeongjae Cho, Yves J. Chabal, Mingwei Chen, Fujio Wakaya, Mikio Takai, Manish Chhowalla

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The electron emission properties of thin edges of reduced graphene oxide (rGO) were investigated by field emission microscopy (FEM) and in-situ field ion microscopy (FIM). The electron emission patterns of thin rGO edge consisted of alternating bright and dark fringe bands in the FEM image. The FIM image showed the array of bright spots along the FEM patterns. These results suggested that the field emission occurs at the atomically thin edges of rGO.

Original languageEnglish
Title of host publicationProceedings of the International Display Workshops
Pages1775-1778
Number of pages4
Volume3
Publication statusPublished - 2011
Event18th International Display Workshops 2011, IDW 2011 - Nagoya, Japan
Duration: Dec 7 2011Dec 9 2011

Other

Other18th International Display Workshops 2011, IDW 2011
CountryJapan
CityNagoya
Period12/7/1112/9/11

Fingerprint

Graphite
Field emission
Oxides
Graphene
Microscopy
Microscopic examination
Electron emission
Electrons
Ions

ASJC Scopus subject areas

  • Computer Vision and Pattern Recognition
  • Human-Computer Interaction
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Radiology Nuclear Medicine and imaging

Cite this

Murakami, K., Yamaguchi, H., Eda, G., Fujita, T., Guan, P., Wang, W., ... Chhowalla, M. (2011). Field emission from atomically thin edges of reduced graphene oxide. In Proceedings of the International Display Workshops (Vol. 3, pp. 1775-1778)

Field emission from atomically thin edges of reduced graphene oxide. / Murakami, Katsuhisa; Yamaguchi, Hisato; Eda, Goki; Fujita, Takeshi; Guan, Pengfei; Wang, Weichao; Gong, Cheng; Boisse, Julien; Miller, Steve; Acik, Muge; Cho, Kyeongjae; Chabal, Yves J.; Chen, Mingwei; Wakaya, Fujio; Takai, Mikio; Chhowalla, Manish.

Proceedings of the International Display Workshops. Vol. 3 2011. p. 1775-1778.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Murakami, K, Yamaguchi, H, Eda, G, Fujita, T, Guan, P, Wang, W, Gong, C, Boisse, J, Miller, S, Acik, M, Cho, K, Chabal, YJ, Chen, M, Wakaya, F, Takai, M & Chhowalla, M 2011, Field emission from atomically thin edges of reduced graphene oxide. in Proceedings of the International Display Workshops. vol. 3, pp. 1775-1778, 18th International Display Workshops 2011, IDW 2011, Nagoya, Japan, 12/7/11.
Murakami K, Yamaguchi H, Eda G, Fujita T, Guan P, Wang W et al. Field emission from atomically thin edges of reduced graphene oxide. In Proceedings of the International Display Workshops. Vol. 3. 2011. p. 1775-1778
Murakami, Katsuhisa ; Yamaguchi, Hisato ; Eda, Goki ; Fujita, Takeshi ; Guan, Pengfei ; Wang, Weichao ; Gong, Cheng ; Boisse, Julien ; Miller, Steve ; Acik, Muge ; Cho, Kyeongjae ; Chabal, Yves J. ; Chen, Mingwei ; Wakaya, Fujio ; Takai, Mikio ; Chhowalla, Manish. / Field emission from atomically thin edges of reduced graphene oxide. Proceedings of the International Display Workshops. Vol. 3 2011. pp. 1775-1778
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AU - Gong, Cheng

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AU - Miller, Steve

AU - Acik, Muge

AU - Cho, Kyeongjae

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AU - Wakaya, Fujio

AU - Takai, Mikio

AU - Chhowalla, Manish

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AB - The electron emission properties of thin edges of reduced graphene oxide (rGO) were investigated by field emission microscopy (FEM) and in-situ field ion microscopy (FIM). The electron emission patterns of thin rGO edge consisted of alternating bright and dark fringe bands in the FEM image. The FIM image showed the array of bright spots along the FEM patterns. These results suggested that the field emission occurs at the atomically thin edges of rGO.

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