Formation of carbon nanoclusters by implantation of keV carbon ions in fused silica followed by thermal annealing

P. Olivero, J. L. Peng, A. Liu, P. Reichart, J. C. McCallum, J. Y. Sze, S. P. Lau, B. K. Tay, R. Kalish, Sarit Dhar, Leonard C Feldman, D. N. Jamieson, S. Prawer

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In the last decade, the synthesis and characterization of nanometer sized carbon clusters have attracted growing interest within the scientific community. This is due to both scientific interest in the process of diamond nucleation and growth, and to the promising technological applications in nanoelectronics and quantum communications and computing. Our research group has demonstrated that MeV carbon ion implantation in fused silica followed by thermal annealing in the presence of hydrogen leads to the formation of nanocrystalline diamond, with cluster size ranging from 5 to 40 nm. In the present paper, we report the synthesis of carbon nanoclusters by the implantation into fused silica of keV carbon ions using the Plasma Immersion Ion Implantation (PIII) technique, followed by thermal annealing in forming gas (4% 2H in Ar). The present study is aimed at evaluating this implantation technique that has the advantage of allowing high fluence-rates on large substrates. The carbon nanostructures have been characterized with optical absorption and Raman spectroscopies, cross sectional Transmission Electron Microscopy (TEM), and Parallel Electron Energy Loss Spectroscopy (PEELS). Nuclear Reaction Analysis (NRA) has been employed to evaluate the deuterium incorporation during the annealing process, as a key mechanism to stabilize the formation of the clusters.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsJ.-C. Chiao, D.N. Jamieson, L. Faraone, A.S. Dzurak
Pages35-43
Number of pages9
Volume5650
DOIs
Publication statusPublished - 2005
EventMicro- and Nanotechnology: Materials, Processes, Packaging, and Systems II - Sydney, Australia
Duration: Dec 13 2004Dec 15 2004

Other

OtherMicro- and Nanotechnology: Materials, Processes, Packaging, and Systems II
CountryAustralia
CitySydney
Period12/13/0412/15/04

Fingerprint

Nanoclusters
Fused silica
nanoclusters
Ion implantation
implantation
Annealing
silicon dioxide
annealing
Carbon
carbon
Ions
Diamonds
ions
ion implantation
Quantum communication
Carbon clusters
diamonds
Nanoelectronics
Nuclear reactions
Electron energy loss spectroscopy

Keywords

  • Carbon nanoclusters
  • keV ion implantation
  • Nuclear Reaction Analysis
  • Plasma ion immersion implantation
  • Raman spectroscopy

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Olivero, P., Peng, J. L., Liu, A., Reichart, P., McCallum, J. C., Sze, J. Y., ... Prawer, S. (2005). Formation of carbon nanoclusters by implantation of keV carbon ions in fused silica followed by thermal annealing. In J-C. Chiao, D. N. Jamieson, L. Faraone, & A. S. Dzurak (Eds.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 5650, pp. 35-43). [10] https://doi.org/10.1117/12.582855

Formation of carbon nanoclusters by implantation of keV carbon ions in fused silica followed by thermal annealing. / Olivero, P.; Peng, J. L.; Liu, A.; Reichart, P.; McCallum, J. C.; Sze, J. Y.; Lau, S. P.; Tay, B. K.; Kalish, R.; Dhar, Sarit; Feldman, Leonard C; Jamieson, D. N.; Prawer, S.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / J.-C. Chiao; D.N. Jamieson; L. Faraone; A.S. Dzurak. Vol. 5650 2005. p. 35-43 10.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Olivero, P, Peng, JL, Liu, A, Reichart, P, McCallum, JC, Sze, JY, Lau, SP, Tay, BK, Kalish, R, Dhar, S, Feldman, LC, Jamieson, DN & Prawer, S 2005, Formation of carbon nanoclusters by implantation of keV carbon ions in fused silica followed by thermal annealing. in J-C Chiao, DN Jamieson, L Faraone & AS Dzurak (eds), Proceedings of SPIE - The International Society for Optical Engineering. vol. 5650, 10, pp. 35-43, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II, Sydney, Australia, 12/13/04. https://doi.org/10.1117/12.582855
Olivero P, Peng JL, Liu A, Reichart P, McCallum JC, Sze JY et al. Formation of carbon nanoclusters by implantation of keV carbon ions in fused silica followed by thermal annealing. In Chiao J-C, Jamieson DN, Faraone L, Dzurak AS, editors, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 5650. 2005. p. 35-43. 10 https://doi.org/10.1117/12.582855
Olivero, P. ; Peng, J. L. ; Liu, A. ; Reichart, P. ; McCallum, J. C. ; Sze, J. Y. ; Lau, S. P. ; Tay, B. K. ; Kalish, R. ; Dhar, Sarit ; Feldman, Leonard C ; Jamieson, D. N. ; Prawer, S. / Formation of carbon nanoclusters by implantation of keV carbon ions in fused silica followed by thermal annealing. Proceedings of SPIE - The International Society for Optical Engineering. editor / J.-C. Chiao ; D.N. Jamieson ; L. Faraone ; A.S. Dzurak. Vol. 5650 2005. pp. 35-43
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