Gate metal-induced diffusion and interface reactions in Hf oxide films on Si

Lyudmila V. Goncharova, Mateus Dalponte, Ozgur Celik, Eric Garfunkel, Torgny Gustafsson, Pat S. Lysaght, Gennadi I. Bersuker

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

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