Generation of 30-50 nm structures using easily fabricated, composite PDMS masks

Teri W Odom, Venkat R. Thalladi, J. Christopher Love, George M. Whitesides

Research output: Contribution to journalArticle

149 Citations (Scopus)

Abstract

This communication demonstrates an approach to generate simple nanostructures with critical dimensions down to 30 nm over cm2-sized areas using composite PDMS masks. These masks were patterned with feature sizes down to 100 nm. When used in phase-shifting lithography, these masks generated arrays of structures in photoresist with line widths as small as 30 nm, slots in metal with features down to 40 nm, and wells in epoxy with diameters as small as 100 nm. The wells were used to prepare arrays of uniformly sized nanocrystals of salts.

Original languageEnglish
Pages (from-to)12112-12113
Number of pages2
JournalJournal of the American Chemical Society
Volume124
Issue number41
DOIs
Publication statusPublished - Oct 16 2002

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Masks
Composite materials
Nanostructures
Photoresists
Linewidth
Nanoparticles
Nanocrystals
Lithography
Salts
Metals
Communication

ASJC Scopus subject areas

  • Chemistry(all)

Cite this

Generation of 30-50 nm structures using easily fabricated, composite PDMS masks. / Odom, Teri W; Thalladi, Venkat R.; Love, J. Christopher; Whitesides, George M.

In: Journal of the American Chemical Society, Vol. 124, No. 41, 16.10.2002, p. 12112-12113.

Research output: Contribution to journalArticle

Odom, Teri W ; Thalladi, Venkat R. ; Love, J. Christopher ; Whitesides, George M. / Generation of 30-50 nm structures using easily fabricated, composite PDMS masks. In: Journal of the American Chemical Society. 2002 ; Vol. 124, No. 41. pp. 12112-12113.
@article{5425d23209a64f3f9094a25adef882aa,
title = "Generation of 30-50 nm structures using easily fabricated, composite PDMS masks",
abstract = "This communication demonstrates an approach to generate simple nanostructures with critical dimensions down to 30 nm over cm2-sized areas using composite PDMS masks. These masks were patterned with feature sizes down to 100 nm. When used in phase-shifting lithography, these masks generated arrays of structures in photoresist with line widths as small as 30 nm, slots in metal with features down to 40 nm, and wells in epoxy with diameters as small as 100 nm. The wells were used to prepare arrays of uniformly sized nanocrystals of salts.",
author = "Odom, {Teri W} and Thalladi, {Venkat R.} and Love, {J. Christopher} and Whitesides, {George M.}",
year = "2002",
month = "10",
day = "16",
doi = "10.1021/ja0209464",
language = "English",
volume = "124",
pages = "12112--12113",
journal = "Journal of the American Chemical Society",
issn = "0002-7863",
publisher = "American Chemical Society",
number = "41",

}

TY - JOUR

T1 - Generation of 30-50 nm structures using easily fabricated, composite PDMS masks

AU - Odom, Teri W

AU - Thalladi, Venkat R.

AU - Love, J. Christopher

AU - Whitesides, George M.

PY - 2002/10/16

Y1 - 2002/10/16

N2 - This communication demonstrates an approach to generate simple nanostructures with critical dimensions down to 30 nm over cm2-sized areas using composite PDMS masks. These masks were patterned with feature sizes down to 100 nm. When used in phase-shifting lithography, these masks generated arrays of structures in photoresist with line widths as small as 30 nm, slots in metal with features down to 40 nm, and wells in epoxy with diameters as small as 100 nm. The wells were used to prepare arrays of uniformly sized nanocrystals of salts.

AB - This communication demonstrates an approach to generate simple nanostructures with critical dimensions down to 30 nm over cm2-sized areas using composite PDMS masks. These masks were patterned with feature sizes down to 100 nm. When used in phase-shifting lithography, these masks generated arrays of structures in photoresist with line widths as small as 30 nm, slots in metal with features down to 40 nm, and wells in epoxy with diameters as small as 100 nm. The wells were used to prepare arrays of uniformly sized nanocrystals of salts.

UR - http://www.scopus.com/inward/record.url?scp=0037120834&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0037120834&partnerID=8YFLogxK

U2 - 10.1021/ja0209464

DO - 10.1021/ja0209464

M3 - Article

VL - 124

SP - 12112

EP - 12113

JO - Journal of the American Chemical Society

JF - Journal of the American Chemical Society

SN - 0002-7863

IS - 41

ER -