Generation of chrome masks with micrometer-scale features using microlens lithography

H. Wu, T. W. Odom, G. M. Whitesides

Research output: Contribution to journalArticle

25 Citations (Scopus)

Abstract

Periodic patterns with submicrometer features in a photoresist supported on glass have been generated using arrays of microlenses and macroscopic transparency-film photomasks. The Figure shows a pattern obtained with a mask in the shape of the letter "G". Deposition of a chromium film, followed by lift-off. converts the photoresist pattern into a chrome mask for pattern transfer to other substrates by contact photolithography.

Original languageEnglish
Pages (from-to)1213-1216
Number of pages4
JournalAdvanced Materials
Volume14
Issue number17
DOIs
Publication statusPublished - Sep 3 2002

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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