Abstract
Periodic patterns with submicrometer features in a photoresist supported on glass have been generated using arrays of microlenses and macroscopic transparency-film photomasks. The Figure shows a pattern obtained with a mask in the shape of the letter "G". Deposition of a chromium film, followed by lift-off. converts the photoresist pattern into a chrome mask for pattern transfer to other substrates by contact photolithography.
Original language | English |
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Pages (from-to) | 1213-1216 |
Number of pages | 4 |
Journal | Advanced Materials |
Volume | 14 |
Issue number | 17 |
DOIs | |
Publication status | Published - Sep 3 2002 |
ASJC Scopus subject areas
- Materials Science(all)
- Mechanics of Materials
- Mechanical Engineering