Generation of chrome masks with micrometer-scale features using microlens lithography

H. Wu, Teri W Odom, G. M. Whitesides

Research output: Contribution to journalArticle

22 Citations (Scopus)

Abstract

Periodic patterns with submicrometer features in a photoresist supported on glass have been generated using arrays of microlenses and macroscopic transparency-film photomasks. The Figure shows a pattern obtained with a mask in the shape of the letter "G". Deposition of a chromium film, followed by lift-off. converts the photoresist pattern into a chrome mask for pattern transfer to other substrates by contact photolithography.

Original languageEnglish
JournalAdvanced Materials
Volume14
Issue number17
DOIs
Publication statusPublished - Sep 3 2002

Fingerprint

Photoresists
Lithography
Masks
Microlenses
Photomasks
Photolithography
Chromium
Transparency
Glass
Substrates

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Generation of chrome masks with micrometer-scale features using microlens lithography. / Wu, H.; Odom, Teri W; Whitesides, G. M.

In: Advanced Materials, Vol. 14, No. 17, 03.09.2002.

Research output: Contribution to journalArticle

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