Abstract
Periodic patterns with submicrometer features in a photoresist supported on glass have been generated using arrays of microlenses and macroscopic transparency-film photomasks. The Figure shows a pattern obtained with a mask in the shape of the letter "G". Deposition of a chromium film, followed by lift-off. converts the photoresist pattern into a chrome mask for pattern transfer to other substrates by contact photolithography.
| Original language | English |
|---|---|
| Pages (from-to) | 1213-1216 |
| Number of pages | 4 |
| Journal | Advanced Materials |
| Volume | 14 |
| Issue number | 17 |
| DOIs | |
| Publication status | Published - Sep 3 2002 |
ASJC Scopus subject areas
- Materials Science(all)
- Mechanics of Materials
- Mechanical Engineering
Fingerprint Dive into the research topics of 'Generation of chrome masks with micrometer-scale features using microlens lithography'. Together they form a unique fingerprint.
Cite this
Wu, H., Odom, T. W., & Whitesides, G. M. (2002). Generation of chrome masks with micrometer-scale features using microlens lithography. Advanced Materials, 14(17), 1213-1216. https://doi.org/10.1002/1521-4095(20020903)14:17<1213::AID-ADMA1213>3.0.CO;2-S