Generation of chrome masks with micrometer-scale features using microlens lithography

H. Wu; T. W. Odom; G. M. Whitesides

doi:10.1002/1521-4095(20020903)14:17<1213::AID-ADMA1213>3.0.CO;2-S

Generation of chrome masks with micrometer-scale features using microlens lithography

H. Wu, T. W. Odom, G. M. Whitesides

Northwestern University

Research output: Contribution to journal › Article

24 Citations (Scopus)

Abstract

Periodic patterns with submicrometer features in a photoresist supported on glass have been generated using arrays of microlenses and macroscopic transparency-film photomasks. The Figure shows a pattern obtained with a mask in the shape of the letter "G". Deposition of a chromium film, followed by lift-off. converts the photoresist pattern into a chrome mask for pattern transfer to other substrates by contact photolithography.

Original language	English
Pages (from-to)	1213-1216
Number of pages	4
Journal	Advanced Materials
Volume	14
Issue number	17
DOIs	https://doi.org/10.1002/1521-4095(20020903)14:17<1213::AID-ADMA1213>3.0.CO;2-S
Publication status	Published - Sep 3 2002

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ASJC Scopus subject areas

Materials Science(all)
Mechanics of Materials
Mechanical Engineering

Cite this

Wu, H., Odom, T. W., & Whitesides, G. M. (2002). Generation of chrome masks with micrometer-scale features using microlens lithography. Advanced Materials, 14(17), 1213-1216. https://doi.org/10.1002/1521-4095(20020903)14:17<1213::AID-ADMA1213>3.0.CO;2-S

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Access to Document

10.1002/1521-4095(20020903)14:17<1213::AID-ADMA1213>3.0.CO;2-S