Abstract
Periodic patterns with submicrometer features in a photoresist supported on glass have been generated using arrays of microlenses and macroscopic transparency-film photomasks. The Figure shows a pattern obtained with a mask in the shape of the letter "G". Deposition of a chromium film, followed by lift-off. converts the photoresist pattern into a chrome mask for pattern transfer to other substrates by contact photolithography.
| Original language | English |
|---|---|
| Journal | Advanced Materials |
| Volume | 14 |
| Issue number | 17 |
| DOIs | |
| Publication status | Published - Sep 3 2002 |
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ASJC Scopus subject areas
- Materials Science(all)
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Generation of chrome masks with micrometer-scale features using microlens lithography. / Wu, H.; Odom, Teri W; Whitesides, G. M.
In: Advanced Materials, Vol. 14, No. 17, 03.09.2002.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Generation of chrome masks with micrometer-scale features using microlens lithography
AU - Wu, H.
AU - Odom, Teri W
AU - Whitesides, G. M.
PY - 2002/9/3
Y1 - 2002/9/3
N2 - Periodic patterns with submicrometer features in a photoresist supported on glass have been generated using arrays of microlenses and macroscopic transparency-film photomasks. The Figure shows a pattern obtained with a mask in the shape of the letter "G". Deposition of a chromium film, followed by lift-off. converts the photoresist pattern into a chrome mask for pattern transfer to other substrates by contact photolithography.
AB - Periodic patterns with submicrometer features in a photoresist supported on glass have been generated using arrays of microlenses and macroscopic transparency-film photomasks. The Figure shows a pattern obtained with a mask in the shape of the letter "G". Deposition of a chromium film, followed by lift-off. converts the photoresist pattern into a chrome mask for pattern transfer to other substrates by contact photolithography.
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UR - http://www.scopus.com/inward/citedby.url?scp=0037015253&partnerID=8YFLogxK
U2 - 10.1002/1521-4095(20020903)14:17<1213::AID-ADMA1213>3.0.CO;2-S
DO - 10.1002/1521-4095(20020903)14:17<1213::AID-ADMA1213>3.0.CO;2-S
M3 - Article
VL - 14
JO - Advanced Materials
JF - Advanced Materials
SN - 0935-9648
IS - 17
ER -