This paper reviews recent progress in understanding microstructural and growth-mechanistic aspects of ultrathin (2O, and N2 as well as a variety of deposition methods. We show that a basic understanding of the gas-phase and thin-film oxygen and nitrogen incorporation chemistries facilities the processing of layered oxynitride nanostructures with desirable electrical properties.
|Number of pages||22|
|Journal||IBM Journal of Research and Development|
|Publication status||Published - May 1999|
ASJC Scopus subject areas
- Hardware and Architecture