Hafnium oxide gate dielectrics grown from an alkoxide precursor: Structure and defects

Martin M. Frank, Safak Sayan, Sabine Dörmann, Thomas J. Emge, Leszek S. Wielunski, Eric Garfunkel, Yves J. Chabal

Research output: Contribution to journalConference article

65 Citations (Scopus)

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Chemical Compounds

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