High-Resolution Distance Dependence Study of Surface-Enhanced Raman Scattering Enabled by Atomic Layer Deposition

Sicelo S. Masango, Ryan A. Hackler, Nicolas Large, Anne Isabelle Henry, Michael O. McAnally, George C Schatz, Peter C Stair, Richard P. Van Duyne

Research output: Contribution to journalArticle

48 Citations (Scopus)

Abstract

We present a high-resolution distance dependence study of surface-enhanced Raman scattering (SERS) enabled by atomic layer deposition (ALD) at 55 and 100 °C. ALD is used to deposit monolayers of Al2O3 on bare silver film over nanospheres (AgFONs) and AgFONs functionalized with self-assembled monolayers. Operando SERS is used to measure the intensities of the Al-CH3 and C-H stretches from trimethylaluminum (TMA) as a function of distance from the AgFON surface. This study clearly demonstrates that SERS on AgFON substrates displays both a short- and long-range nanometer scale distance dependence. Excellent agreement is obtained between these experiments and theory that incorporates both short-range and long-range terms. This is a high-resolution operando SERS distance dependence study performed in one integrated experiment using ALD Al2O3 as the spacer layer and Raman label simultaneously. The long-range SERS distance dependence should make it possible to detect chemisorbed surface species located as far as ∼3 nm from the AgFON substrate and will provide new insight into the surface chemistry of ALD and catalytic reactions.

Original languageEnglish
Pages (from-to)4251-4259
Number of pages9
JournalNano Letters
Volume16
Issue number7
DOIs
Publication statusPublished - Jul 13 2016

Fingerprint

Atomic layer deposition
atomic layer epitaxy
Raman scattering
Raman spectra
high resolution
Nanospheres
Self assembled monolayers
Substrates
Surface chemistry
Silver
Labels
Monolayers
spacers
Deposits
Experiments
deposits
silver
chemistry

Keywords

  • atomic layer deposition
  • distance dependence
  • operando
  • Surface-enhanced Raman scattering

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanical Engineering

Cite this

Masango, S. S., Hackler, R. A., Large, N., Henry, A. I., McAnally, M. O., Schatz, G. C., ... Van Duyne, R. P. (2016). High-Resolution Distance Dependence Study of Surface-Enhanced Raman Scattering Enabled by Atomic Layer Deposition. Nano Letters, 16(7), 4251-4259. https://doi.org/10.1021/acs.nanolett.6b01276

High-Resolution Distance Dependence Study of Surface-Enhanced Raman Scattering Enabled by Atomic Layer Deposition. / Masango, Sicelo S.; Hackler, Ryan A.; Large, Nicolas; Henry, Anne Isabelle; McAnally, Michael O.; Schatz, George C; Stair, Peter C; Van Duyne, Richard P.

In: Nano Letters, Vol. 16, No. 7, 13.07.2016, p. 4251-4259.

Research output: Contribution to journalArticle

Masango, Sicelo S. ; Hackler, Ryan A. ; Large, Nicolas ; Henry, Anne Isabelle ; McAnally, Michael O. ; Schatz, George C ; Stair, Peter C ; Van Duyne, Richard P. / High-Resolution Distance Dependence Study of Surface-Enhanced Raman Scattering Enabled by Atomic Layer Deposition. In: Nano Letters. 2016 ; Vol. 16, No. 7. pp. 4251-4259.
@article{ff4f1ca47c4643659fb1b6d928944888,
title = "High-Resolution Distance Dependence Study of Surface-Enhanced Raman Scattering Enabled by Atomic Layer Deposition",
abstract = "We present a high-resolution distance dependence study of surface-enhanced Raman scattering (SERS) enabled by atomic layer deposition (ALD) at 55 and 100 °C. ALD is used to deposit monolayers of Al2O3 on bare silver film over nanospheres (AgFONs) and AgFONs functionalized with self-assembled monolayers. Operando SERS is used to measure the intensities of the Al-CH3 and C-H stretches from trimethylaluminum (TMA) as a function of distance from the AgFON surface. This study clearly demonstrates that SERS on AgFON substrates displays both a short- and long-range nanometer scale distance dependence. Excellent agreement is obtained between these experiments and theory that incorporates both short-range and long-range terms. This is a high-resolution operando SERS distance dependence study performed in one integrated experiment using ALD Al2O3 as the spacer layer and Raman label simultaneously. The long-range SERS distance dependence should make it possible to detect chemisorbed surface species located as far as ∼3 nm from the AgFON substrate and will provide new insight into the surface chemistry of ALD and catalytic reactions.",
keywords = "atomic layer deposition, distance dependence, operando, Surface-enhanced Raman scattering",
author = "Masango, {Sicelo S.} and Hackler, {Ryan A.} and Nicolas Large and Henry, {Anne Isabelle} and McAnally, {Michael O.} and Schatz, {George C} and Stair, {Peter C} and {Van Duyne}, {Richard P.}",
year = "2016",
month = "7",
day = "13",
doi = "10.1021/acs.nanolett.6b01276",
language = "English",
volume = "16",
pages = "4251--4259",
journal = "Nano Letters",
issn = "1530-6984",
publisher = "American Chemical Society",
number = "7",

}

TY - JOUR

T1 - High-Resolution Distance Dependence Study of Surface-Enhanced Raman Scattering Enabled by Atomic Layer Deposition

AU - Masango, Sicelo S.

AU - Hackler, Ryan A.

AU - Large, Nicolas

AU - Henry, Anne Isabelle

AU - McAnally, Michael O.

AU - Schatz, George C

AU - Stair, Peter C

AU - Van Duyne, Richard P.

PY - 2016/7/13

Y1 - 2016/7/13

N2 - We present a high-resolution distance dependence study of surface-enhanced Raman scattering (SERS) enabled by atomic layer deposition (ALD) at 55 and 100 °C. ALD is used to deposit monolayers of Al2O3 on bare silver film over nanospheres (AgFONs) and AgFONs functionalized with self-assembled monolayers. Operando SERS is used to measure the intensities of the Al-CH3 and C-H stretches from trimethylaluminum (TMA) as a function of distance from the AgFON surface. This study clearly demonstrates that SERS on AgFON substrates displays both a short- and long-range nanometer scale distance dependence. Excellent agreement is obtained between these experiments and theory that incorporates both short-range and long-range terms. This is a high-resolution operando SERS distance dependence study performed in one integrated experiment using ALD Al2O3 as the spacer layer and Raman label simultaneously. The long-range SERS distance dependence should make it possible to detect chemisorbed surface species located as far as ∼3 nm from the AgFON substrate and will provide new insight into the surface chemistry of ALD and catalytic reactions.

AB - We present a high-resolution distance dependence study of surface-enhanced Raman scattering (SERS) enabled by atomic layer deposition (ALD) at 55 and 100 °C. ALD is used to deposit monolayers of Al2O3 on bare silver film over nanospheres (AgFONs) and AgFONs functionalized with self-assembled monolayers. Operando SERS is used to measure the intensities of the Al-CH3 and C-H stretches from trimethylaluminum (TMA) as a function of distance from the AgFON surface. This study clearly demonstrates that SERS on AgFON substrates displays both a short- and long-range nanometer scale distance dependence. Excellent agreement is obtained between these experiments and theory that incorporates both short-range and long-range terms. This is a high-resolution operando SERS distance dependence study performed in one integrated experiment using ALD Al2O3 as the spacer layer and Raman label simultaneously. The long-range SERS distance dependence should make it possible to detect chemisorbed surface species located as far as ∼3 nm from the AgFON substrate and will provide new insight into the surface chemistry of ALD and catalytic reactions.

KW - atomic layer deposition

KW - distance dependence

KW - operando

KW - Surface-enhanced Raman scattering

UR - http://www.scopus.com/inward/record.url?scp=84978689291&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84978689291&partnerID=8YFLogxK

U2 - 10.1021/acs.nanolett.6b01276

DO - 10.1021/acs.nanolett.6b01276

M3 - Article

VL - 16

SP - 4251

EP - 4259

JO - Nano Letters

JF - Nano Letters

SN - 1530-6984

IS - 7

ER -