High-rotational symmetry lattices fabricated by Moiré nanolithography

Steven M. Lubin, Wei Zhou, Alexander J. Hryn, Mark D. Huntington, Teri W. Odom

Research output: Contribution to journalArticle

40 Citations (Scopus)

Abstract

This paper describes a new nanofabrication method, moiré nanolithography, that can fabricate subwavelength lattices with high-rotational symmetries. By exposing elastomeric photomasks sequentially at multiple offset angles, we created arrays with rotational symmetries as high as 36-fold, which is three times higher than quasiperiodic lattices (≥12-fold) and six times higher than two-dimensional periodic lattices (≥6-fold). Because these moiré nanopatterns can be generated over wafer-scale areas, they are promising for a range of photonic applications, especially those that require broadband, omnidirectional absorption of visible light.

Original languageEnglish
Pages (from-to)4948-4952
Number of pages5
JournalNano letters
Volume12
Issue number9
DOIs
Publication statusPublished - Sep 12 2012

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Keywords

  • Nanopatterning
  • high rotational symmetry lattices
  • moiré patterns
  • quasiperiodic
  • soft lithography

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

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