Abstract
This paper describes a new nanofabrication method, moiré nanolithography, that can fabricate subwavelength lattices with high-rotational symmetries. By exposing elastomeric photomasks sequentially at multiple offset angles, we created arrays with rotational symmetries as high as 36-fold, which is three times higher than quasiperiodic lattices (≥12-fold) and six times higher than two-dimensional periodic lattices (≥6-fold). Because these moiré nanopatterns can be generated over wafer-scale areas, they are promising for a range of photonic applications, especially those that require broadband, omnidirectional absorption of visible light.
| Original language | English |
|---|---|
| Pages (from-to) | 4948-4952 |
| Number of pages | 5 |
| Journal | Nano Letters |
| Volume | 12 |
| Issue number | 9 |
| DOIs | |
| Publication status | Published - Sep 12 2012 |
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Keywords
- high rotational symmetry lattices
- moiré patterns
- Nanopatterning
- quasiperiodic
- soft lithography
ASJC Scopus subject areas
- Condensed Matter Physics
- Bioengineering
- Chemistry(all)
- Materials Science(all)
- Mechanical Engineering
Cite this
High-rotational symmetry lattices fabricated by Moiré nanolithography. / Lubin, Steven M.; Zhou, Wei; Hryn, Alexander J.; Huntington, Mark D.; Odom, Teri W.
In: Nano Letters, Vol. 12, No. 9, 12.09.2012, p. 4948-4952.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - High-rotational symmetry lattices fabricated by Moiré nanolithography
AU - Lubin, Steven M.
AU - Zhou, Wei
AU - Hryn, Alexander J.
AU - Huntington, Mark D.
AU - Odom, Teri W
PY - 2012/9/12
Y1 - 2012/9/12
N2 - This paper describes a new nanofabrication method, moiré nanolithography, that can fabricate subwavelength lattices with high-rotational symmetries. By exposing elastomeric photomasks sequentially at multiple offset angles, we created arrays with rotational symmetries as high as 36-fold, which is three times higher than quasiperiodic lattices (≥12-fold) and six times higher than two-dimensional periodic lattices (≥6-fold). Because these moiré nanopatterns can be generated over wafer-scale areas, they are promising for a range of photonic applications, especially those that require broadband, omnidirectional absorption of visible light.
AB - This paper describes a new nanofabrication method, moiré nanolithography, that can fabricate subwavelength lattices with high-rotational symmetries. By exposing elastomeric photomasks sequentially at multiple offset angles, we created arrays with rotational symmetries as high as 36-fold, which is three times higher than quasiperiodic lattices (≥12-fold) and six times higher than two-dimensional periodic lattices (≥6-fold). Because these moiré nanopatterns can be generated over wafer-scale areas, they are promising for a range of photonic applications, especially those that require broadband, omnidirectional absorption of visible light.
KW - high rotational symmetry lattices
KW - moiré patterns
KW - Nanopatterning
KW - quasiperiodic
KW - soft lithography
UR - http://www.scopus.com/inward/record.url?scp=84866324637&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84866324637&partnerID=8YFLogxK
U2 - 10.1021/nl302535p
DO - 10.1021/nl302535p
M3 - Article
C2 - 22897722
AN - SCOPUS:84866324637
VL - 12
SP - 4948
EP - 4952
JO - Nano Letters
JF - Nano Letters
SN - 1530-6984
IS - 9
ER -