High-rotational symmetry lattices fabricated by Moiré nanolithography

Steven M. Lubin; Wei Zhou; Alexander J. Hryn; Mark D. Huntington; Teri W. Odom

doi:10.1021/nl302535p

High-rotational symmetry lattices fabricated by Moiré nanolithography

Steven M. Lubin, Wei Zhou, Alexander J. Hryn, Mark D. Huntington, Teri W. Odom

Northwestern University

Research output: Contribution to journal › Article

40 Citations (Scopus)

Abstract

This paper describes a new nanofabrication method, moiré nanolithography, that can fabricate subwavelength lattices with high-rotational symmetries. By exposing elastomeric photomasks sequentially at multiple offset angles, we created arrays with rotational symmetries as high as 36-fold, which is three times higher than quasiperiodic lattices (≥12-fold) and six times higher than two-dimensional periodic lattices (≥6-fold). Because these moiré nanopatterns can be generated over wafer-scale areas, they are promising for a range of photonic applications, especially those that require broadband, omnidirectional absorption of visible light.

Original language	English
Pages (from-to)	4948-4952
Number of pages	5
Journal	Nano letters
Volume	12
Issue number	9
DOIs	https://doi.org/10.1021/nl302535p
Publication status	Published - Sep 12 2012

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Keywords

Nanopatterning
high rotational symmetry lattices
moiré patterns
quasiperiodic
soft lithography

ASJC Scopus subject areas

Bioengineering
Chemistry(all)
Materials Science(all)
Condensed Matter Physics
Mechanical Engineering

Cite this

Lubin, S. M., Zhou, W., Hryn, A. J., Huntington, M. D., & Odom, T. W. (2012). High-rotational symmetry lattices fabricated by Moiré nanolithography. Nano letters, 12(9), 4948-4952. https://doi.org/10.1021/nl302535p

@article{1b3b7b16f82f45d68d34937171702964,

title = "High-rotational symmetry lattices fabricated by Moir{\'e} nanolithography",

abstract = "This paper describes a new nanofabrication method, moir{\'e} nanolithography, that can fabricate subwavelength lattices with high-rotational symmetries. By exposing elastomeric photomasks sequentially at multiple offset angles, we created arrays with rotational symmetries as high as 36-fold, which is three times higher than quasiperiodic lattices (≥12-fold) and six times higher than two-dimensional periodic lattices (≥6-fold). Because these moir{\'e} nanopatterns can be generated over wafer-scale areas, they are promising for a range of photonic applications, especially those that require broadband, omnidirectional absorption of visible light.",

keywords = "Nanopatterning, high rotational symmetry lattices, moir{\'e} patterns, quasiperiodic, soft lithography",

author = "Lubin, {Steven M.} and Wei Zhou and Hryn, {Alexander J.} and Huntington, {Mark D.} and Odom, {Teri W.}",

year = "2012",

month = sep

day = "12",

doi = "10.1021/nl302535p",

language = "English",

volume = "12",

pages = "4948--4952",

journal = "Nano Letters",

issn = "1530-6984",

publisher = "American Chemical Society",

number = "9",

}

TY - JOUR

T1 - High-rotational symmetry lattices fabricated by Moiré nanolithography

AU - Lubin, Steven M.

AU - Zhou, Wei

AU - Hryn, Alexander J.

AU - Huntington, Mark D.

AU - Odom, Teri W.

PY - 2012/9/12

Y1 - 2012/9/12

N2 - This paper describes a new nanofabrication method, moiré nanolithography, that can fabricate subwavelength lattices with high-rotational symmetries. By exposing elastomeric photomasks sequentially at multiple offset angles, we created arrays with rotational symmetries as high as 36-fold, which is three times higher than quasiperiodic lattices (≥12-fold) and six times higher than two-dimensional periodic lattices (≥6-fold). Because these moiré nanopatterns can be generated over wafer-scale areas, they are promising for a range of photonic applications, especially those that require broadband, omnidirectional absorption of visible light.

AB - This paper describes a new nanofabrication method, moiré nanolithography, that can fabricate subwavelength lattices with high-rotational symmetries. By exposing elastomeric photomasks sequentially at multiple offset angles, we created arrays with rotational symmetries as high as 36-fold, which is three times higher than quasiperiodic lattices (≥12-fold) and six times higher than two-dimensional periodic lattices (≥6-fold). Because these moiré nanopatterns can be generated over wafer-scale areas, they are promising for a range of photonic applications, especially those that require broadband, omnidirectional absorption of visible light.

KW - Nanopatterning

KW - high rotational symmetry lattices

KW - moiré patterns

KW - quasiperiodic

KW - soft lithography

UR - http://www.scopus.com/inward/record.url?scp=84866324637&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84866324637&partnerID=8YFLogxK

U2 - 10.1021/nl302535p

DO - 10.1021/nl302535p

M3 - Article

C2 - 22897722

AN - SCOPUS:84866324637

VL - 12

SP - 4948

EP - 4952

JO - Nano Letters

JF - Nano Letters

SN - 1530-6984

IS - 9

ER -

Access to Document

10.1021/nl302535p