High-rotational symmetry lattices fabricated by Moiré nanolithography

Steven M. Lubin; Wei Zhou; Alexander J. Hryn; Mark D. Huntington; Teri W. Odom

doi:10.1021/nl302535p

High-rotational symmetry lattices fabricated by Moiré nanolithography

Steven M. Lubin, Wei Zhou, Alexander J. Hryn, Mark D. Huntington, Teri W. Odom

Northwestern University

Research output: Contribution to journal › Article › peer-review

41 Citations (Scopus)

Abstract

This paper describes a new nanofabrication method, moiré nanolithography, that can fabricate subwavelength lattices with high-rotational symmetries. By exposing elastomeric photomasks sequentially at multiple offset angles, we created arrays with rotational symmetries as high as 36-fold, which is three times higher than quasiperiodic lattices (≥12-fold) and six times higher than two-dimensional periodic lattices (≥6-fold). Because these moiré nanopatterns can be generated over wafer-scale areas, they are promising for a range of photonic applications, especially those that require broadband, omnidirectional absorption of visible light.

Original language	English
Pages (from-to)	4948-4952
Number of pages	5
Journal	Nano letters
Volume	12
Issue number	9
DOIs	https://doi.org/10.1021/nl302535p
Publication status	Published - Sep 12 2012

Keywords

Nanopatterning
high rotational symmetry lattices
moiré patterns
quasiperiodic
soft lithography

ASJC Scopus subject areas

Bioengineering
Chemistry(all)
Materials Science(all)
Condensed Matter Physics
Mechanical Engineering

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10.1021/nl302535p

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abstract = "This paper describes a new nanofabrication method, moir{\'e} nanolithography, that can fabricate subwavelength lattices with high-rotational symmetries. By exposing elastomeric photomasks sequentially at multiple offset angles, we created arrays with rotational symmetries as high as 36-fold, which is three times higher than quasiperiodic lattices (≥12-fold) and six times higher than two-dimensional periodic lattices (≥6-fold). Because these moir{\'e} nanopatterns can be generated over wafer-scale areas, they are promising for a range of photonic applications, especially those that require broadband, omnidirectional absorption of visible light.",

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AU - Zhou, Wei

AU - Hryn, Alexander J.

AU - Huntington, Mark D.

AU - Odom, Teri W.

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AB - This paper describes a new nanofabrication method, moiré nanolithography, that can fabricate subwavelength lattices with high-rotational symmetries. By exposing elastomeric photomasks sequentially at multiple offset angles, we created arrays with rotational symmetries as high as 36-fold, which is three times higher than quasiperiodic lattices (≥12-fold) and six times higher than two-dimensional periodic lattices (≥6-fold). Because these moiré nanopatterns can be generated over wafer-scale areas, they are promising for a range of photonic applications, especially those that require broadband, omnidirectional absorption of visible light.

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