Abstract
This paper describes a new nanofabrication method, moiré nanolithography, that can fabricate subwavelength lattices with high-rotational symmetries. By exposing elastomeric photomasks sequentially at multiple offset angles, we created arrays with rotational symmetries as high as 36-fold, which is three times higher than quasiperiodic lattices (≥12-fold) and six times higher than two-dimensional periodic lattices (≥6-fold). Because these moiré nanopatterns can be generated over wafer-scale areas, they are promising for a range of photonic applications, especially those that require broadband, omnidirectional absorption of visible light.
| Original language | English |
|---|---|
| Pages (from-to) | 4948-4952 |
| Number of pages | 5 |
| Journal | Nano letters |
| Volume | 12 |
| Issue number | 9 |
| DOIs | |
| Publication status | Published - Sep 12 2012 |
Keywords
- Nanopatterning
- high rotational symmetry lattices
- moiré patterns
- quasiperiodic
- soft lithography
ASJC Scopus subject areas
- Bioengineering
- Chemistry(all)
- Materials Science(all)
- Condensed Matter Physics
- Mechanical Engineering
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Cite this
Lubin, S. M., Zhou, W., Hryn, A. J., Huntington, M. D., & Odom, T. W. (2012). High-rotational symmetry lattices fabricated by Moiré nanolithography. Nano letters, 12(9), 4948-4952. https://doi.org/10.1021/nl302535p