Highly tetrahedral amorphous carbon films with low stress

Manish Chhowalla, Y. Yin, G. A J Amaratunga, D. R. McKenzie, Th Frauenheim

Research output: Contribution to journalArticle

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Abstract

We have deposited boronated highly tetrahedral amorphous carbon (ta-C:B) films with low stress using a filtered cathodic vacuum arc. The sp3 fraction, hardness, and resistivity were measured as a function of the ion energy and were found to reach a maximum above 50 eV for B concentrations of 2% and 4%. The most significant result we found was that highly tetrahedral a-C:B film (sp3 ≈ 80%) with low stress (1-3 GPa) with B concentrations up to 4% could be obtained. The B in the films was found to be predominantly (≈75%) sp2 bonded. Additionally, the stress in the films did not vary with the ion energy or sp3 fraction unlike in regular ta-C films.

Original languageEnglish
Pages (from-to)2344-2346
Number of pages3
JournalApplied Physics Letters
Volume69
Issue number16
Publication statusPublished - Oct 14 1996

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carbon
ions
hardness
arcs
vacuum
electrical resistivity
energy

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Chhowalla, M., Yin, Y., Amaratunga, G. A. J., McKenzie, D. R., & Frauenheim, T. (1996). Highly tetrahedral amorphous carbon films with low stress. Applied Physics Letters, 69(16), 2344-2346.

Highly tetrahedral amorphous carbon films with low stress. / Chhowalla, Manish; Yin, Y.; Amaratunga, G. A J; McKenzie, D. R.; Frauenheim, Th.

In: Applied Physics Letters, Vol. 69, No. 16, 14.10.1996, p. 2344-2346.

Research output: Contribution to journalArticle

Chhowalla, M, Yin, Y, Amaratunga, GAJ, McKenzie, DR & Frauenheim, T 1996, 'Highly tetrahedral amorphous carbon films with low stress', Applied Physics Letters, vol. 69, no. 16, pp. 2344-2346.
Chhowalla M, Yin Y, Amaratunga GAJ, McKenzie DR, Frauenheim T. Highly tetrahedral amorphous carbon films with low stress. Applied Physics Letters. 1996 Oct 14;69(16):2344-2346.
Chhowalla, Manish ; Yin, Y. ; Amaratunga, G. A J ; McKenzie, D. R. ; Frauenheim, Th. / Highly tetrahedral amorphous carbon films with low stress. In: Applied Physics Letters. 1996 ; Vol. 69, No. 16. pp. 2344-2346.
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