Highly tetrahedral amorphous carbon films with low stress

Manish Chhowalla, Y. Yin, G. A J Amaratunga, D. R. McKenzie, Th Frauenheim

Research output: Contribution to journalArticle

104 Citations (Scopus)

Abstract

We have deposited boronated highly tetrahedral amorphous carbon (ta-C:B) films with low stress using a filtered cathodic vacuum arc. The sp3 fraction, hardness, and resistivity were measured as a function of the ion energy and were found to reach a maximum above 50 eV for B concentrations of 2% and 4%. The most significant result we found was that highly tetrahedral a-C:B film (sp3 ≈ 80%) with low stress (1-3 GPa) with B concentrations up to 4% could be obtained. The B in the films was found to be predominantly (≈75%) sp2 bonded. Additionally, the stress in the films did not vary with the ion energy or sp3 fraction unlike in regular ta-C films.

Original languageEnglish
Pages (from-to)2344-2346
Number of pages3
JournalApplied Physics Letters
Volume69
Issue number16
Publication statusPublished - Oct 14 1996

    Fingerprint

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Chhowalla, M., Yin, Y., Amaratunga, G. A. J., McKenzie, D. R., & Frauenheim, T. (1996). Highly tetrahedral amorphous carbon films with low stress. Applied Physics Letters, 69(16), 2344-2346.