Highly uniform 300 mm wafer-scale deposition of single and multilayered chemically derived graphene thin films

Hisato Yamaguchi; Goki Eda; Cecilia Mattevi; Ho Kwon Kim; Manish Chhowalla

doi:10.1021/nn901496p

Highly uniform 300 mm wafer-scale deposition of single and multilayered chemically derived graphene thin films

Hisato Yamaguchi, Goki Eda, Cecilia Mattevi, Ho Kwon Kim, Manish Chhowalla

Rutgers University

Research output: Contribution to journal › Article

167 Citations (Scopus)

Abstract

The deposition of atomically thin highly uniform chemically derived graphene (CDG) films on 300 mm SiO ₂/Si wafers is reported. We demonstrate that the very thin films can be lifted off to form uniform membranes that can be free-standing or transferred onto any substrate. Detailed maps of thickness using Raman spectroscopy and atomic force microscopy height profiles reveal that the film thickness is very uniform and highly controllable, ranging from 1-2 layers up to 30 layers. After reduction using a variety of methods, the CDG films are transparent and electrically active with FET devices yielding high mobilities of ̃15 cm ₂/(V s) and sheet resistance of ̃1 kω;/sq at ̃70% transparency.

Original language	English
Pages (from-to)	524-528
Number of pages	5
Journal	ACS nano
Volume	4
Issue number	1
DOIs	https://doi.org/10.1021/nn901496p
Publication status	Published - Jan 26 2010

Fingerprint

Keywords

Flexible
Graphene
Large area deposition
Solution processed
Transparent conductors

ASJC Scopus subject areas

Materials Science(all)
Engineering(all)
Physics and Astronomy(all)

Cite this

Yamaguchi, H., Eda, G., Mattevi, C., Kim, H. K., & Chhowalla, M. (2010). Highly uniform 300 mm wafer-scale deposition of single and multilayered chemically derived graphene thin films. ACS nano, 4(1), 524-528. https://doi.org/10.1021/nn901496p

@article{7cb1e4af78bb4cdf87a3455065f5addf,

title = "Highly uniform 300 mm wafer-scale deposition of single and multilayered chemically derived graphene thin films",

abstract = "The deposition of atomically thin highly uniform chemically derived graphene (CDG) films on 300 mm SiO 2/Si wafers is reported. We demonstrate that the very thin films can be lifted off to form uniform membranes that can be free-standing or transferred onto any substrate. Detailed maps of thickness using Raman spectroscopy and atomic force microscopy height profiles reveal that the film thickness is very uniform and highly controllable, ranging from 1-2 layers up to 30 layers. After reduction using a variety of methods, the CDG films are transparent and electrically active with FET devices yielding high mobilities of{\~ }15 cm 2/(V s) and sheet resistance of{\~ }1 kω;/sq at{\~ }70% transparency.",

keywords = "Flexible, Graphene, Large area deposition, Solution processed, Transparent conductors",

author = "Hisato Yamaguchi and Goki Eda and Cecilia Mattevi and Kim, {Ho Kwon} and Manish Chhowalla",

year = "2010",

month = jan

day = "26",

doi = "10.1021/nn901496p",

language = "English",

volume = "4",

pages = "524--528",

journal = "ACS Nano",

issn = "1936-0851",

publisher = "American Chemical Society",

number = "1",

}

TY - JOUR

T1 - Highly uniform 300 mm wafer-scale deposition of single and multilayered chemically derived graphene thin films

AU - Yamaguchi, Hisato

AU - Eda, Goki

AU - Mattevi, Cecilia

AU - Kim, Ho Kwon

AU - Chhowalla, Manish

PY - 2010/1/26

Y1 - 2010/1/26

N2 - The deposition of atomically thin highly uniform chemically derived graphene (CDG) films on 300 mm SiO 2/Si wafers is reported. We demonstrate that the very thin films can be lifted off to form uniform membranes that can be free-standing or transferred onto any substrate. Detailed maps of thickness using Raman spectroscopy and atomic force microscopy height profiles reveal that the film thickness is very uniform and highly controllable, ranging from 1-2 layers up to 30 layers. After reduction using a variety of methods, the CDG films are transparent and electrically active with FET devices yielding high mobilities of ̃15 cm 2/(V s) and sheet resistance of ̃1 kω;/sq at ̃70% transparency.

AB - The deposition of atomically thin highly uniform chemically derived graphene (CDG) films on 300 mm SiO 2/Si wafers is reported. We demonstrate that the very thin films can be lifted off to form uniform membranes that can be free-standing or transferred onto any substrate. Detailed maps of thickness using Raman spectroscopy and atomic force microscopy height profiles reveal that the film thickness is very uniform and highly controllable, ranging from 1-2 layers up to 30 layers. After reduction using a variety of methods, the CDG films are transparent and electrically active with FET devices yielding high mobilities of ̃15 cm 2/(V s) and sheet resistance of ̃1 kω;/sq at ̃70% transparency.

KW - Flexible

KW - Graphene

KW - Large area deposition

KW - Solution processed

KW - Transparent conductors

UR - http://www.scopus.com/inward/record.url?scp=75749115154&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=75749115154&partnerID=8YFLogxK

U2 - 10.1021/nn901496p

DO - 10.1021/nn901496p

M3 - Article

C2 - 20050640

AN - SCOPUS:75749115154

VL - 4

SP - 524

EP - 528

JO - ACS Nano

JF - ACS Nano

SN - 1936-0851

IS - 1

ER -

Access to Document

10.1021/nn901496p