Highly uniform 300 mm wafer-scale deposition of single and multilayered chemically derived graphene thin films

Hisato Yamaguchi, Goki Eda, Cecilia Mattevi, HoKwon Kim, Manish Chhowalla

Research output: Contribution to journal › Article

161 Citations (Scopus)

Abstract

The deposition of atomically thin highly uniform chemically derived graphene (CDG) films on 300 mm SiO 2/Si wafers is reported. We demonstrate that the very thin films can be lifted off to form uniform membranes that can be free-standing or transferred onto any substrate. Detailed maps of thickness using Raman spectroscopy and atomic force microscopy height profiles reveal that the film thickness is very uniform and highly controllable, ranging from 1-2 layers up to 30 layers. After reduction using a variety of methods, the CDG films are transparent and electrically active with FET devices yielding high mobilities of ̃15 cm 2/(V s) and sheet resistance of ̃1 kω;/sq at ̃70% transparency.

Original languageEnglish
Pages (from-to)524-528
Number of pages5
JournalACS Nano
Volume4
Issue number1
DOIs
Publication statusPublished - Jan 26 2010

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Graphite
Graphene
graphene
wafers
Thin films
Sheet resistance
thin films
Field effect transistors
Transparency
Film thickness
Raman spectroscopy
Atomic force microscopy
film thickness
field effect transistors
atomic force microscopy
membranes
Membranes
Substrates
profiles

Keywords

  • Flexible
  • Graphene
  • Large area deposition
  • Solution processed
  • Transparent conductors

ASJC Scopus subject areas

  • Engineering(all)
  • Materials Science(all)
  • Physics and Astronomy(all)

Cite this

Highly uniform 300 mm wafer-scale deposition of single and multilayered chemically derived graphene thin films. / Yamaguchi, Hisato; Eda, Goki; Mattevi, Cecilia; Kim, HoKwon; Chhowalla, Manish.

In: ACS Nano, Vol. 4, No. 1, 26.01.2010, p. 524-528.

Research output: Contribution to journal › Article

Yamaguchi, H, Eda, G, Mattevi, C, Kim, H & Chhowalla, M 2010, 'Highly uniform 300 mm wafer-scale deposition of single and multilayered chemically derived graphene thin films', ACS Nano, vol. 4, no. 1, pp. 524-528. https://doi.org/10.1021/nn901496p
Yamaguchi H, Eda G, Mattevi C, Kim H, Chhowalla M. Highly uniform 300 mm wafer-scale deposition of single and multilayered chemically derived graphene thin films. ACS Nano. 2010 Jan 26;4(1):524-528. https://doi.org/10.1021/nn901496p
Yamaguchi, Hisato ; Eda, Goki ; Mattevi, Cecilia ; Kim, HoKwon ; Chhowalla, Manish. / Highly uniform 300 mm wafer-scale deposition of single and multilayered chemically derived graphene thin films. In: ACS Nano. 2010 ; Vol. 4, No. 1. pp. 524-528.
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