Highly uniform 300 mm wafer-scale deposition of single and multilayered chemically derived graphene thin films

Hisato Yamaguchi, Goki Eda, Cecilia Mattevi, Ho Kwon Kim, Manish Chhowalla

Research output: Contribution to journalArticlepeer-review

174 Citations (Scopus)

Abstract

The deposition of atomically thin highly uniform chemically derived graphene (CDG) films on 300 mm SiO 2/Si wafers is reported. We demonstrate that the very thin films can be lifted off to form uniform membranes that can be free-standing or transferred onto any substrate. Detailed maps of thickness using Raman spectroscopy and atomic force microscopy height profiles reveal that the film thickness is very uniform and highly controllable, ranging from 1-2 layers up to 30 layers. After reduction using a variety of methods, the CDG films are transparent and electrically active with FET devices yielding high mobilities of ̃15 cm 2/(V s) and sheet resistance of ̃1 kω;/sq at ̃70% transparency.

Original languageEnglish
Pages (from-to)524-528
Number of pages5
JournalACS nano
Volume4
Issue number1
DOIs
Publication statusPublished - Jan 26 2010

Keywords

  • Flexible
  • Graphene
  • Large area deposition
  • Solution processed
  • Transparent conductors

ASJC Scopus subject areas

  • Materials Science(all)
  • Engineering(all)
  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Highly uniform 300 mm wafer-scale deposition of single and multilayered chemically derived graphene thin films'. Together they form a unique fingerprint.

Cite this