Highly volatile, low-melting, fluorine-free precursors for MOCVD of lanthanide oxide-containing thin films

John A. Belot, Anchuan Wang, Richard J. McNeely, Louise Liable-Sands, Arnold L. Rheingold, Tobin J Marks

Research output: Contribution to journal › Article

@article{3310a04cf8094f92bbda45fd763990cc,

title = "Highly volatile, low-melting, fluorine-free precursors for MOCVD of lanthanide oxide-containing thin films",

author = "Belot, {John A.} and Anchuan Wang and McNeely, {Richard J.} and Louise Liable-Sands and Rheingold, {Arnold L.} and Marks, {Tobin J}",

year = "1999",

month = mar

language = "English",

volume = "5",

pages = "65--69",

journal = "Chemical Vapor Deposition",

issn = "0948-1907",

publisher = "Wiley-VCH Verlag",

number = "2",

}

TY - JOUR

T1 - Highly volatile, low-melting, fluorine-free precursors for MOCVD of lanthanide oxide-containing thin films

AU - Belot, John A.

AU - Wang, Anchuan

AU - McNeely, Richard J.

AU - Liable-Sands, Louise

AU - Rheingold, Arnold L.

AU - Marks, Tobin J

PY - 1999/3

Y1 - 1999/3

UR - http://www.scopus.com/inward/record.url?scp=0039772494&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0039772494&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0039772494

VL - 5

SP - 65

EP - 69

JO - Chemical Vapor Deposition

JF - Chemical Vapor Deposition

SN - 0948-1907

IS - 2

ER -