Highly volatile, low-melting, fluorine-free precursors for MOCVD of lanthanide oxide-containing thin films

John A. Belot, Anchuan Wang, Richard J. McNeely, Louise Liable-Sands, Arnold L. Rheingold, Tobin J Marks

Research output: Contribution to journalArticle

30 Citations (Scopus)
Original languageEnglish
Pages (from-to)65-69
Number of pages5
JournalChemical Vapor Deposition
Volume5
Issue number2
Publication statusPublished - Mar 1999

ASJC Scopus subject areas

  • Process Chemistry and Technology
  • Electrochemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Belot, J. A., Wang, A., McNeely, R. J., Liable-Sands, L., Rheingold, A. L., & Marks, T. J. (1999). Highly volatile, low-melting, fluorine-free precursors for MOCVD of lanthanide oxide-containing thin films. Chemical Vapor Deposition, 5(2), 65-69.