Highly volatile, low-melting, fluorine-free precursors for MOCVD of lanthanide oxide-containing thin films

John A. Belot, Anchuan Wang, Richard J. McNeely, Louise Liable-Sands, Arnold L. Rheingold, Tobin J. Marks

Research output: Contribution to journalArticle

30 Citations (Scopus)
Original languageEnglish
Pages (from-to)65-69
Number of pages5
JournalChemical Vapor Deposition
Volume5
Issue number2
DOIs
Publication statusPublished - Mar 1999

ASJC Scopus subject areas

  • Chemistry(all)
  • Surfaces and Interfaces
  • Process Chemistry and Technology

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