Hydration and reduction of molecular beam epitaxy grown vo x/α-fe 2o 3(0001): ambient pressure study

Chang Yong Kim, Jeffrey A. Klug, Peter C. Stair, Michael J. Bedzyk

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

Supported vanadium oxides processed under ambient environments have been studied by using X-ray standing wave (XSW) analysis of X-ray fluorescence spectroscopy and X-ray photoelectron spectroscopy (XPS). For the VO x/α-Fe 2O 3(0001) system, hydration and hydrogen annealing have been carried out under ambient pressure. Vanadium in the hydrated oxide phase occupies two high-symmetry surface adsorption sites with distinct adsorption heights, which resembles the adsorption geometry of fully oxidized vanadium. Reduction by the hydrogen annealing enhanced the V overlayer ordering by relocating a portion of the disordered V to highsymmetry sites. The V atoms located closer to the substrate oxygen layer in the hydrated phase moved toward the substrate after hydrogen reduction, while the V in the higher adsorption site stayed at the same height. The different responses of two adsorption sites to the reduction process are discussed and related to activities of the two sites

Original languageEnglish
Pages (from-to)1406-1410
Number of pages5
JournalJournal of Physical Chemistry C
Volume113
Issue number4
DOIs
Publication statusPublished - Jan 29 2009

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Energy(all)
  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films

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