Abstract
Plasma- and chemical vapor deposited films containing hydrogen, Si, B and O, but of unknown thickness and stoichiometry have been assigned concentration ratios through a combination of H-profiling using the 1H(15N, αγ)12C(4.43 MeV) reaction and RBS analysis. Relatively intense 15N++ beams exceeding the 6.38 MeV resonance energy have been obtained from a 3.75 MeV accelerator with a commercial ion source and terminal analysis. A discussion is given of the method of obtaining film concentration ratios in some representative cases. A search was made for H at the SiO2Si interface. Some preliminary investigations have been made on the H concentration in several metals as supplied: Nb, V, Ta, Al, Ni, OFHC Cu, Ti, Mo and steel and on the effect of acid dips in loading H. Hydrogen in acid-loaded steel migrated under the influence of the probing 15N beam, but relaxed back when the beam was removed.
| Original language | English |
|---|---|
| Pages (from-to) | 547-550 |
| Number of pages | 4 |
| Journal | Nuclear Instruments and Methods |
| Volume | 168 |
| Issue number | 1-3 |
| DOIs | |
| Publication status | Published - 1980 |
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Hydrogen ratios and profiles in deposited amorphous and polycrystalline films and in metals using nuclear techniques. / Benenson, R. E.; Feldman, Leonard C; Bagley, B. G.
In: Nuclear Instruments and Methods, Vol. 168, No. 1-3, 1980, p. 547-550.Research output: Contribution to journal › Article
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TY - JOUR
T1 - Hydrogen ratios and profiles in deposited amorphous and polycrystalline films and in metals using nuclear techniques
AU - Benenson, R. E.
AU - Feldman, Leonard C
AU - Bagley, B. G.
PY - 1980
Y1 - 1980
N2 - Plasma- and chemical vapor deposited films containing hydrogen, Si, B and O, but of unknown thickness and stoichiometry have been assigned concentration ratios through a combination of H-profiling using the 1H(15N, αγ)12C(4.43 MeV) reaction and RBS analysis. Relatively intense 15N++ beams exceeding the 6.38 MeV resonance energy have been obtained from a 3.75 MeV accelerator with a commercial ion source and terminal analysis. A discussion is given of the method of obtaining film concentration ratios in some representative cases. A search was made for H at the SiO2Si interface. Some preliminary investigations have been made on the H concentration in several metals as supplied: Nb, V, Ta, Al, Ni, OFHC Cu, Ti, Mo and steel and on the effect of acid dips in loading H. Hydrogen in acid-loaded steel migrated under the influence of the probing 15N beam, but relaxed back when the beam was removed.
AB - Plasma- and chemical vapor deposited films containing hydrogen, Si, B and O, but of unknown thickness and stoichiometry have been assigned concentration ratios through a combination of H-profiling using the 1H(15N, αγ)12C(4.43 MeV) reaction and RBS analysis. Relatively intense 15N++ beams exceeding the 6.38 MeV resonance energy have been obtained from a 3.75 MeV accelerator with a commercial ion source and terminal analysis. A discussion is given of the method of obtaining film concentration ratios in some representative cases. A search was made for H at the SiO2Si interface. Some preliminary investigations have been made on the H concentration in several metals as supplied: Nb, V, Ta, Al, Ni, OFHC Cu, Ti, Mo and steel and on the effect of acid dips in loading H. Hydrogen in acid-loaded steel migrated under the influence of the probing 15N beam, but relaxed back when the beam was removed.
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U2 - 10.1016/0029-554X(80)91308-7
DO - 10.1016/0029-554X(80)91308-7
M3 - Article
AN - SCOPUS:0347991201
VL - 168
SP - 547
EP - 550
JO - Nuclear Instruments and Methods
JF - Nuclear Instruments and Methods
SN - 0029-554X
IS - 1-3
ER -