Imaging of Atomic Layer Deposited (ALD) tungsten monolayers on α-TiO2(110) by X-ray standing wave Fourier inversion

Chang Yong Kim, Jeffrey W. Elam, Michael J. Pellin, Dipak K. Goswami, Steven T. Christensen, Mark C. Hersam, Peter C. Stair, Michael J. Bedzyk

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

A single atomic layer of tungsten grown by atomic layer deposition (ALD) on a single-crystal rutile TiO2(110) support is studied by the X-ray standing wave (XSW) technique. The surface structural and chemical properties were also examined using atomic force microscopy, X-ray photoelectron spectroscopy, and low-energy electron diffraction. The XSW measured set of hkl Fourier components for the W atomic distribution function are summed together to produce a model-independent 3D map of the W atoms relative to the rutile lattice. The 3D atomic image shows surface tungsten atoms equally occupying the two nonequivalent Ti sites with a slight outward displacement. This corresponds to the atop and bridge sites with respect to the underlying lattice oxygen atoms. These XSW measurements clearly show that ALD conformal layers can be highly coherent with respect to the substrate lattice.

Original languageEnglish
Pages (from-to)12616-12620
Number of pages5
JournalJournal of Physical Chemistry B
Volume110
Issue number25
DOIs
Publication statusPublished - Jun 29 2006

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Materials Chemistry

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