| Original language | English |
|---|---|
| Pages (from-to) | 14-16 |
| Number of pages | 3 |
| Journal | Chemistry of Materials |
| Volume | 5 |
| Issue number | 1 |
| Publication status | Published - 1993 |
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ASJC Scopus subject areas
- Materials Chemistry
- Materials Science(all)
Cite this
Han, B., Neumayer, D. A., Schulz, D. L., Hinds, B. J., Marks, T. J., Zhang, H., & Dravid, V. P. (1993). In situ growth of epitaxial YAlO3 thin films by metal-organic chemical vapor deposition. Chemistry of Materials, 5(1), 14-16.