In situ growth of epitaxial YAlO3 thin films by metal-organic chemical vapor deposition

Bin Han, Deborah A. Neumayer, Douglas L. Schulz, Bruce J. Hinds, Tobin J Marks, Hong Zhang, Vinayak P. Dravid

Research output: Contribution to journalArticle

23 Citations (Scopus)
Original languageEnglish
Pages (from-to)14-16
Number of pages3
JournalChemistry of Materials
Volume5
Issue number1
Publication statusPublished - 1993

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Organic Chemicals
Epitaxial films
Organic chemicals
Chemical vapor deposition
Metals
Thin films

ASJC Scopus subject areas

  • Materials Chemistry
  • Materials Science(all)

Cite this

Han, B., Neumayer, D. A., Schulz, D. L., Hinds, B. J., Marks, T. J., Zhang, H., & Dravid, V. P. (1993). In situ growth of epitaxial YAlO3 thin films by metal-organic chemical vapor deposition. Chemistry of Materials, 5(1), 14-16.

In situ growth of epitaxial YAlO3 thin films by metal-organic chemical vapor deposition. / Han, Bin; Neumayer, Deborah A.; Schulz, Douglas L.; Hinds, Bruce J.; Marks, Tobin J; Zhang, Hong; Dravid, Vinayak P.

In: Chemistry of Materials, Vol. 5, No. 1, 1993, p. 14-16.

Research output: Contribution to journalArticle

Han, B, Neumayer, DA, Schulz, DL, Hinds, BJ, Marks, TJ, Zhang, H & Dravid, VP 1993, 'In situ growth of epitaxial YAlO3 thin films by metal-organic chemical vapor deposition', Chemistry of Materials, vol. 5, no. 1, pp. 14-16.
Han, Bin ; Neumayer, Deborah A. ; Schulz, Douglas L. ; Hinds, Bruce J. ; Marks, Tobin J ; Zhang, Hong ; Dravid, Vinayak P. / In situ growth of epitaxial YAlO3 thin films by metal-organic chemical vapor deposition. In: Chemistry of Materials. 1993 ; Vol. 5, No. 1. pp. 14-16.
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