In situ growth of epitaxial YAlO3 thin films by metal-organic chemical vapor deposition

Bin Han; Deborah A. Neumayer; Douglas L. Schulz; Bruce J. Hinds; Tobin J Marks; Hong Zhang; Vinayak P. Dravid

In situ growth of epitaxial YAlO₃ thin films by metal-organic chemical vapor deposition

Bin Han, Deborah A. Neumayer, Douglas L. Schulz, Bruce J. Hinds, Tobin J Marks, Hong Zhang, Vinayak P. Dravid

Northwestern University

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	14-16
Number of pages	3
Journal	Chemistry of Materials
Volume	5
Issue number	1
Publication status	Published - 1993

ASJC Scopus subject areas

Materials Chemistry
Materials Science(all)

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Cite this

@article{40536c10f58f477ba969382a59784a5b,

title = "In situ growth of epitaxial YAlO3 thin films by metal-organic chemical vapor deposition",

author = "Bin Han and Neumayer, {Deborah A.} and Schulz, {Douglas L.} and Hinds, {Bruce J.} and Marks, {Tobin J} and Hong Zhang and Dravid, {Vinayak P.}",

year = "1993",

language = "English",

volume = "5",

pages = "14--16",

journal = "Chemistry of Materials",

issn = "0897-4756",

publisher = "American Chemical Society",

number = "1",

}

TY - JOUR

T1 - In situ growth of epitaxial YAlO3 thin films by metal-organic chemical vapor deposition

AU - Han, Bin

AU - Neumayer, Deborah A.

AU - Schulz, Douglas L.

AU - Hinds, Bruce J.

AU - Marks, Tobin J

AU - Zhang, Hong

AU - Dravid, Vinayak P.

PY - 1993

Y1 - 1993

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M3 - Article

AN - SCOPUS:0041136030

VL - 5

SP - 14

EP - 16

JO - Chemistry of Materials

JF - Chemistry of Materials

SN - 0897-4756

IS - 1

ER -