In situ growth of epitaxial YAlO3 thin films by metal-organic chemical vapor deposition

Bin Han, Deborah A. Neumayer, Douglas L. Schulz, Bruce J. Hinds, Tobin J Marks, Hong Zhang, Vinayak P. Dravid

Research output: Contribution to journalArticle

23 Citations (Scopus)
Original languageEnglish
Pages (from-to)14-16
Number of pages3
JournalChemistry of Materials
Volume5
Issue number1
Publication statusPublished - 1993

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ASJC Scopus subject areas

  • Materials Chemistry
  • Materials Science(all)

Cite this

Han, B., Neumayer, D. A., Schulz, D. L., Hinds, B. J., Marks, T. J., Zhang, H., & Dravid, V. P. (1993). In situ growth of epitaxial YAlO3 thin films by metal-organic chemical vapor deposition. Chemistry of Materials, 5(1), 14-16.