In situ x-ray diffraction studies of YBa2Cu3O x

S. Williams, J. Q. Zheng, M. C. Shih, X. K. Wang, S. J. Lee, E. D. Rippert, S. Maglic, Hiroshi Kajiyama, D. Segel, P. Dutta, Robert P. H. Chang, J. B. Ketterson, T. Roberts, Y. Lin, R. T. Kampwirth, K. Gray

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Abstract

Using a specially designed off-axis faced magnetron sputtering chamber we have performed in situ x-ray diffraction studies of the growth of YBa 2Cu3Ox films using a synchrotron light source. The orientation and rocking curve width were studied as a function of substrate temperature, O2/Ar partial pressures, and deposition rate. Growth rate was studied on SrTiO3, LaAlO3, and MgO.

Original languageEnglish
Pages (from-to)4798-4804
Number of pages7
JournalJournal of Applied Physics
Volume72
Issue number10
DOIs
Publication statusPublished - 1992

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ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Williams, S., Zheng, J. Q., Shih, M. C., Wang, X. K., Lee, S. J., Rippert, E. D., ... Gray, K. (1992). In situ x-ray diffraction studies of YBa2Cu3O x. Journal of Applied Physics, 72(10), 4798-4804. https://doi.org/10.1063/1.352093