Influence of annealing on ZnO thin film grown by plasma-assisted MOCVD

Guotong Du, Jinzhong Wang, Xinqiang Wang, Xiuying Jiang, Shuren Yang, Yan Ma, Wei Yan, Dingsan Gao, Xiang Liu, Hui Cao, Junying Xu, Robert P. H. Chang

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29 Citations (Scopus)

Abstract

ZnO films were grown on C-plane sapphire substrate by plasma-assisted MOCVD. The films was characterized by XRD, photoluminescence (PL) and the optical transmission spectrum. We found tensile strain in the sample, which had been annealed many times during the growth process, while there is compressive strain in the sample, which was annealed only one time after growth. The PL spectra at room temperature for the sample annealed many times exhibited only one emitting peak at around 380 nm. However, we find Γ5 and Γ6 free exciton peaks in the sample annealed only one time after growth. At the same time, the optical transmission indicate that the maximum of the sample's transmission decreases against with the increasing of the c-axis length in ranges from 190 to 900 nm.

Original languageEnglish
Pages (from-to)473-476
Number of pages4
JournalVacuum
Volume69
Issue number4
DOIs
Publication statusPublished - Jan 24 2003

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Keywords

  • Optical transmission
  • PL
  • Plasma-assisted MOCVD
  • XRD

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

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