Influence of surface roughness on the pull-off force in atomic force microscopy

Joonkyung Jang, Jaeyoung Sung, George C Schatz

Research output: Contribution to journalArticle

23 Citations (Scopus)

Abstract

We investigate how the pull-off force in atomic force microscopy (AFM), which arises from a nanoscale water bridge between the AFM tip and the surface, is influenced by atomic scale (smaller than 0.6 nm) roughness in the surface. Adopting a lattice gas model for water, we have simulated the adhesion of a silicon-nitride tip (with a 20nm diameter) to mica under ambient humidity. The pull-off force responds sensitively to both surface and tip roughness, and its humidity dependence changes significantly with slight variation in the tip and surface morphology. The change in the pull-off force due to roughness smaller than 0.6 nm can be larger than the change from doubling the tip radius. The roughness effect is large at low humidities and diminishes as humidity increases. Even at 80 percent humidity, the pull-off force varies considerably with changes in tip-surface geometry. On average, the pull-off force decreases with increasing tip roughness. However it decreases with surface roughness for small roughness (

Original languageEnglish
Pages (from-to)4648-4654
Number of pages7
JournalJournal of Physical Chemistry C
Volume111
Issue number12
DOIs
Publication statusPublished - Mar 29 2007

Fingerprint

Atomic force microscopy
surface roughness
Surface roughness
atomic force microscopy
roughness
humidity
Atmospheric humidity
surface geometry
Water
Mica
mica
Silicon nitride
silicon nitrides
water
Surface morphology
adhesion
Adhesion
Gases
radii
Geometry

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Energy(all)

Cite this

Influence of surface roughness on the pull-off force in atomic force microscopy. / Jang, Joonkyung; Sung, Jaeyoung; Schatz, George C.

In: Journal of Physical Chemistry C, Vol. 111, No. 12, 29.03.2007, p. 4648-4654.

Research output: Contribution to journalArticle

@article{aaf54bb5e1e24e00ae07a2e361a9ba4e,
title = "Influence of surface roughness on the pull-off force in atomic force microscopy",
abstract = "We investigate how the pull-off force in atomic force microscopy (AFM), which arises from a nanoscale water bridge between the AFM tip and the surface, is influenced by atomic scale (smaller than 0.6 nm) roughness in the surface. Adopting a lattice gas model for water, we have simulated the adhesion of a silicon-nitride tip (with a 20nm diameter) to mica under ambient humidity. The pull-off force responds sensitively to both surface and tip roughness, and its humidity dependence changes significantly with slight variation in the tip and surface morphology. The change in the pull-off force due to roughness smaller than 0.6 nm can be larger than the change from doubling the tip radius. The roughness effect is large at low humidities and diminishes as humidity increases. Even at 80 percent humidity, the pull-off force varies considerably with changes in tip-surface geometry. On average, the pull-off force decreases with increasing tip roughness. However it decreases with surface roughness for small roughness (",
author = "Joonkyung Jang and Jaeyoung Sung and Schatz, {George C}",
year = "2007",
month = "3",
day = "29",
doi = "10.1021/jp066667a",
language = "English",
volume = "111",
pages = "4648--4654",
journal = "Journal of Physical Chemistry C",
issn = "1932-7447",
publisher = "American Chemical Society",
number = "12",

}

TY - JOUR

T1 - Influence of surface roughness on the pull-off force in atomic force microscopy

AU - Jang, Joonkyung

AU - Sung, Jaeyoung

AU - Schatz, George C

PY - 2007/3/29

Y1 - 2007/3/29

N2 - We investigate how the pull-off force in atomic force microscopy (AFM), which arises from a nanoscale water bridge between the AFM tip and the surface, is influenced by atomic scale (smaller than 0.6 nm) roughness in the surface. Adopting a lattice gas model for water, we have simulated the adhesion of a silicon-nitride tip (with a 20nm diameter) to mica under ambient humidity. The pull-off force responds sensitively to both surface and tip roughness, and its humidity dependence changes significantly with slight variation in the tip and surface morphology. The change in the pull-off force due to roughness smaller than 0.6 nm can be larger than the change from doubling the tip radius. The roughness effect is large at low humidities and diminishes as humidity increases. Even at 80 percent humidity, the pull-off force varies considerably with changes in tip-surface geometry. On average, the pull-off force decreases with increasing tip roughness. However it decreases with surface roughness for small roughness (

AB - We investigate how the pull-off force in atomic force microscopy (AFM), which arises from a nanoscale water bridge between the AFM tip and the surface, is influenced by atomic scale (smaller than 0.6 nm) roughness in the surface. Adopting a lattice gas model for water, we have simulated the adhesion of a silicon-nitride tip (with a 20nm diameter) to mica under ambient humidity. The pull-off force responds sensitively to both surface and tip roughness, and its humidity dependence changes significantly with slight variation in the tip and surface morphology. The change in the pull-off force due to roughness smaller than 0.6 nm can be larger than the change from doubling the tip radius. The roughness effect is large at low humidities and diminishes as humidity increases. Even at 80 percent humidity, the pull-off force varies considerably with changes in tip-surface geometry. On average, the pull-off force decreases with increasing tip roughness. However it decreases with surface roughness for small roughness (

UR - http://www.scopus.com/inward/record.url?scp=34147188519&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=34147188519&partnerID=8YFLogxK

U2 - 10.1021/jp066667a

DO - 10.1021/jp066667a

M3 - Article

VL - 111

SP - 4648

EP - 4654

JO - Journal of Physical Chemistry C

JF - Journal of Physical Chemistry C

SN - 1932-7447

IS - 12

ER -