Influence of weak links and oxygen deficiency on electrical properties of Bi-2212 and Ti-2212 HTS thin films

Jon L. Schindler; Frank DiMeo; Carolyn R. Duran; Bruce J. Hinds; Bruce W. Wessels; Tobin J Marks; Carl R. Kannewurf

Influence of weak links and oxygen deficiency on electrical properties of Bi-2212 and Ti-2212 HTS thin films

Jon L. Schindler, Frank DiMeo, Carolyn R. Duran, Bruce J. Hinds, Bruce W. Wessels, Tobin J Marks, Carl R. Kannewurf

Northwestern University

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Thin films of the Bi-2212 and Tl-2212 compounds were prepared by MOCVD deposition techniques. Resistivity versus temperature and critical current density measurements were used to characterize the electrical properties. An analysis of the data based on a proposed model determined the influence of intragranular weak links. Thin film samples in both systems with near optimum oxygen doping showed a correlation between the slope and magnitude of the resistivity in the normal state. Samples with reduced oxygen content displayed a strong increase in the intragrain boundary resistance, consistent with weak link defects. The results agree with a similar analysis of YBCO samples and support a common mechanism for the development of weak links in cuprates.

Original language	English
Title of host publication	Materials Research Society Symposium - Proceedings
Publisher	Materials Research Society
Pages	315-320
Number of pages	6
Volume	401
Publication status	Published - 1996
Event	Proceedings of the 1995 MRS Fall Symposium - Boston, MA, USA Duration: Nov 27 1995 → Nov 30 1995

Other

Other	Proceedings of the 1995 MRS Fall Symposium
City	Boston, MA, USA
Period	11/27/95 → 11/30/95

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials

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Schindler, J. L., DiMeo, F., Duran, C. R., Hinds, B. J., Wessels, B. W., Marks, T. J., & Kannewurf, C. R. (1996). Influence of weak links and oxygen deficiency on electrical properties of Bi-2212 and Ti-2212 HTS thin films. In Materials Research Society Symposium - Proceedings (Vol. 401, pp. 315-320). Materials Research Society.

Influence of weak links and oxygen deficiency on electrical properties of Bi-2212 and Ti-2212 HTS thin films. / Schindler, Jon L.; DiMeo, Frank; Duran, Carolyn R.; Hinds, Bruce J.; Wessels, Bruce W.; Marks, Tobin J; Kannewurf, Carl R.

Materials Research Society Symposium - Proceedings. Vol. 401 Materials Research Society, 1996. p. 315-320.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Schindler, JL, DiMeo, F, Duran, CR, Hinds, BJ, Wessels, BW, Marks, TJ & Kannewurf, CR 1996, Influence of weak links and oxygen deficiency on electrical properties of Bi-2212 and Ti-2212 HTS thin films. in Materials Research Society Symposium - Proceedings. vol. 401, Materials Research Society, pp. 315-320, Proceedings of the 1995 MRS Fall Symposium, Boston, MA, USA, 11/27/95.

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title = "Influence of weak links and oxygen deficiency on electrical properties of Bi-2212 and Ti-2212 HTS thin films",

abstract = "Thin films of the Bi-2212 and Tl-2212 compounds were prepared by MOCVD deposition techniques. Resistivity versus temperature and critical current density measurements were used to characterize the electrical properties. An analysis of the data based on a proposed model determined the influence of intragranular weak links. Thin film samples in both systems with near optimum oxygen doping showed a correlation between the slope and magnitude of the resistivity in the normal state. Samples with reduced oxygen content displayed a strong increase in the intragrain boundary resistance, consistent with weak link defects. The results agree with a similar analysis of YBCO samples and support a common mechanism for the development of weak links in cuprates.",

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language = "English",

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AU - Schindler, Jon L.

AU - DiMeo, Frank

AU - Duran, Carolyn R.

AU - Hinds, Bruce J.

AU - Wessels, Bruce W.

AU - Marks, Tobin J

AU - Kannewurf, Carl R.

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N2 - Thin films of the Bi-2212 and Tl-2212 compounds were prepared by MOCVD deposition techniques. Resistivity versus temperature and critical current density measurements were used to characterize the electrical properties. An analysis of the data based on a proposed model determined the influence of intragranular weak links. Thin film samples in both systems with near optimum oxygen doping showed a correlation between the slope and magnitude of the resistivity in the normal state. Samples with reduced oxygen content displayed a strong increase in the intragrain boundary resistance, consistent with weak link defects. The results agree with a similar analysis of YBCO samples and support a common mechanism for the development of weak links in cuprates.

AB - Thin films of the Bi-2212 and Tl-2212 compounds were prepared by MOCVD deposition techniques. Resistivity versus temperature and critical current density measurements were used to characterize the electrical properties. An analysis of the data based on a proposed model determined the influence of intragranular weak links. Thin film samples in both systems with near optimum oxygen doping showed a correlation between the slope and magnitude of the resistivity in the normal state. Samples with reduced oxygen content displayed a strong increase in the intragrain boundary resistance, consistent with weak link defects. The results agree with a similar analysis of YBCO samples and support a common mechanism for the development of weak links in cuprates.

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