Abstract
Thin films of the Bi-2212 and Tl-2212 compounds were prepared by MOCVD deposition techniques. Resistivity versus temperature and critical current density measurements were used to characterize the electrical properties. An analysis of the data based on a proposed model determined the influence of intragranular weak links. Thin film samples in both systems with near optimum oxygen doping showed a correlation between the slope and magnitude of the resistivity in the normal state. Samples with reduced oxygen content displayed a strong increase in the intragrain boundary resistance, consistent with weak link defects. The results agree with a similar analysis of YBCO samples and support a common mechanism for the development of weak links in cuprates.
| Original language | English |
|---|---|
| Title of host publication | Materials Research Society Symposium - Proceedings |
| Publisher | Materials Research Society |
| Pages | 315-320 |
| Number of pages | 6 |
| Volume | 401 |
| Publication status | Published - 1996 |
| Event | Proceedings of the 1995 MRS Fall Symposium - Boston, MA, USA Duration: Nov 27 1995 → Nov 30 1995 |
Other
| Other | Proceedings of the 1995 MRS Fall Symposium |
|---|---|
| City | Boston, MA, USA |
| Period | 11/27/95 → 11/30/95 |
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ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
Cite this
Influence of weak links and oxygen deficiency on electrical properties of Bi-2212 and Ti-2212 HTS thin films. / Schindler, Jon L.; DiMeo, Frank; Duran, Carolyn R.; Hinds, Bruce J.; Wessels, Bruce W.; Marks, Tobin J; Kannewurf, Carl R.
Materials Research Society Symposium - Proceedings. Vol. 401 Materials Research Society, 1996. p. 315-320.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
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TY - GEN
T1 - Influence of weak links and oxygen deficiency on electrical properties of Bi-2212 and Ti-2212 HTS thin films
AU - Schindler, Jon L.
AU - DiMeo, Frank
AU - Duran, Carolyn R.
AU - Hinds, Bruce J.
AU - Wessels, Bruce W.
AU - Marks, Tobin J
AU - Kannewurf, Carl R.
PY - 1996
Y1 - 1996
N2 - Thin films of the Bi-2212 and Tl-2212 compounds were prepared by MOCVD deposition techniques. Resistivity versus temperature and critical current density measurements were used to characterize the electrical properties. An analysis of the data based on a proposed model determined the influence of intragranular weak links. Thin film samples in both systems with near optimum oxygen doping showed a correlation between the slope and magnitude of the resistivity in the normal state. Samples with reduced oxygen content displayed a strong increase in the intragrain boundary resistance, consistent with weak link defects. The results agree with a similar analysis of YBCO samples and support a common mechanism for the development of weak links in cuprates.
AB - Thin films of the Bi-2212 and Tl-2212 compounds were prepared by MOCVD deposition techniques. Resistivity versus temperature and critical current density measurements were used to characterize the electrical properties. An analysis of the data based on a proposed model determined the influence of intragranular weak links. Thin film samples in both systems with near optimum oxygen doping showed a correlation between the slope and magnitude of the resistivity in the normal state. Samples with reduced oxygen content displayed a strong increase in the intragrain boundary resistance, consistent with weak link defects. The results agree with a similar analysis of YBCO samples and support a common mechanism for the development of weak links in cuprates.
UR - http://www.scopus.com/inward/record.url?scp=0029733206&partnerID=8YFLogxK
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M3 - Conference contribution
AN - SCOPUS:0029733206
VL - 401
SP - 315
EP - 320
BT - Materials Research Society Symposium - Proceedings
PB - Materials Research Society
ER -