Abstract
Thin films of the Bi-2212 and Tl-2212 compounds were prepared by MOCVD deposition techniques. Resistivity versus temperature and critical current density measurements were used to characterize the electrical properties. An analysis of the data based on a proposed model determined the influence of intragranular weak links. Thin film samples in both systems with near optimum oxygen doping showed a correlation between the slope and magnitude of the resistivity in the normal state. Samples with reduced oxygen content displayed a strong increase in the intragrain boundary resistance, consistent with weak link defects. The results agree with a similar analysis of YBCO samples and support a common mechanism for the development of weak links in cuprates.
Original language | English |
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Title of host publication | Materials Research Society Symposium - Proceedings |
Publisher | Materials Research Society |
Pages | 315-320 |
Number of pages | 6 |
Volume | 401 |
Publication status | Published - 1996 |
Event | Proceedings of the 1995 MRS Fall Symposium - Boston, MA, USA Duration: Nov 27 1995 → Nov 30 1995 |
Other
Other | Proceedings of the 1995 MRS Fall Symposium |
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City | Boston, MA, USA |
Period | 11/27/95 → 11/30/95 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials