Influence of weak links and oxygen deficiency on electrical properties of Bi-2212 and Ti-2212 HTS thin films

Jon L. Schindler; Frank DiMeo; Carolyn R. Duran; Bruce J. Hinds; Bruce W. Wessels; Tobin J Marks; Carl R. Kannewurf

Influence of weak links and oxygen deficiency on electrical properties of Bi-2212 and Ti-2212 HTS thin films

Jon L. Schindler, Frank DiMeo, Carolyn R. Duran, Bruce J. Hinds, Bruce W. Wessels, Tobin J Marks, Carl R. Kannewurf

Northwestern University

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Thin films of the Bi-2212 and Tl-2212 compounds were prepared by MOCVD deposition techniques. Resistivity versus temperature and critical current density measurements were used to characterize the electrical properties. An analysis of the data based on a proposed model determined the influence of intragranular weak links. Thin film samples in both systems with near optimum oxygen doping showed a correlation between the slope and magnitude of the resistivity in the normal state. Samples with reduced oxygen content displayed a strong increase in the intragrain boundary resistance, consistent with weak link defects. The results agree with a similar analysis of YBCO samples and support a common mechanism for the development of weak links in cuprates.

Original language	English
Title of host publication	Materials Research Society Symposium - Proceedings
Publisher	Materials Research Society
Pages	315-320
Number of pages	6
Volume	401
Publication status	Published - 1996
Event	Proceedings of the 1995 MRS Fall Symposium - Boston, MA, USA Duration: Nov 27 1995 → Nov 30 1995

Other

Other	Proceedings of the 1995 MRS Fall Symposium
City	Boston, MA, USA
Period	11/27/95 → 11/30/95

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials

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Influence of weak links and oxygen deficiency on electrical properties of Bi-2212 and Ti-2212 HTS thin films. / Schindler, Jon L.; DiMeo, Frank; Duran, Carolyn R.; Hinds, Bruce J.; Wessels, Bruce W.; Marks, Tobin J; Kannewurf, Carl R.

Materials Research Society Symposium - Proceedings. Vol. 401 Materials Research Society, 1996. p. 315-320.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Schindler, JL, DiMeo, F, Duran, CR, Hinds, BJ, Wessels, BW, Marks, TJ & Kannewurf, CR 1996, Influence of weak links and oxygen deficiency on electrical properties of Bi-2212 and Ti-2212 HTS thin films. in Materials Research Society Symposium - Proceedings. vol. 401, Materials Research Society, pp. 315-320, Proceedings of the 1995 MRS Fall Symposium, Boston, MA, USA, 11/27/95.

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title = "Influence of weak links and oxygen deficiency on electrical properties of Bi-2212 and Ti-2212 HTS thin films",

abstract = "Thin films of the Bi-2212 and Tl-2212 compounds were prepared by MOCVD deposition techniques. Resistivity versus temperature and critical current density measurements were used to characterize the electrical properties. An analysis of the data based on a proposed model determined the influence of intragranular weak links. Thin film samples in both systems with near optimum oxygen doping showed a correlation between the slope and magnitude of the resistivity in the normal state. Samples with reduced oxygen content displayed a strong increase in the intragrain boundary resistance, consistent with weak link defects. The results agree with a similar analysis of YBCO samples and support a common mechanism for the development of weak links in cuprates.",

author = "Schindler, {Jon L.} and Frank DiMeo and Duran, {Carolyn R.} and Hinds, {Bruce J.} and Wessels, {Bruce W.} and Marks, {Tobin J} and Kannewurf, {Carl R.}",

year = "1996",

language = "English",

volume = "401",

pages = "315--320",

booktitle = "Materials Research Society Symposium - Proceedings",

publisher = "Materials Research Society",

note = "Proceedings of the 1995 MRS Fall Symposium ; Conference date: 27-11-1995 Through 30-11-1995",

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T1 - Influence of weak links and oxygen deficiency on electrical properties of Bi-2212 and Ti-2212 HTS thin films

AU - Schindler, Jon L.

AU - DiMeo, Frank

AU - Duran, Carolyn R.

AU - Hinds, Bruce J.

AU - Wessels, Bruce W.

AU - Marks, Tobin J

AU - Kannewurf, Carl R.

PY - 1996

Y1 - 1996

N2 - Thin films of the Bi-2212 and Tl-2212 compounds were prepared by MOCVD deposition techniques. Resistivity versus temperature and critical current density measurements were used to characterize the electrical properties. An analysis of the data based on a proposed model determined the influence of intragranular weak links. Thin film samples in both systems with near optimum oxygen doping showed a correlation between the slope and magnitude of the resistivity in the normal state. Samples with reduced oxygen content displayed a strong increase in the intragrain boundary resistance, consistent with weak link defects. The results agree with a similar analysis of YBCO samples and support a common mechanism for the development of weak links in cuprates.

AB - Thin films of the Bi-2212 and Tl-2212 compounds were prepared by MOCVD deposition techniques. Resistivity versus temperature and critical current density measurements were used to characterize the electrical properties. An analysis of the data based on a proposed model determined the influence of intragranular weak links. Thin film samples in both systems with near optimum oxygen doping showed a correlation between the slope and magnitude of the resistivity in the normal state. Samples with reduced oxygen content displayed a strong increase in the intragrain boundary resistance, consistent with weak link defects. The results agree with a similar analysis of YBCO samples and support a common mechanism for the development of weak links in cuprates.

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