Abstract
To explore the origin of chuck-related surface nonuniformities in thin films deposited from solutions, real-time observations of evaporative cooling effects during spin-coating of solvents are made using an IR-switched-field-effect-transistor (FET) array camera. The evaporative cooling depends strongly on the volatility of the solvent being tested. For acetone (the most volatile solvent tested) the cooling effect can be as large as 10 degrees Celsius when a silicon wafer is used as the substrate. Comparisons are made between wafer type and position on the substrate and sources of the temperature differences are discussed within the framework of the basic spin-coating paradigm. It is likely that these evaporative cooling effects play an important role in the development of chuck-related surface nonuniformities during spin coating; solvent systems may be selected to help optimize film uniformity. These aspects of solution engineering are also discussed.
| Original language | English |
|---|---|
| Pages (from-to) | 1782-1788 |
| Number of pages | 7 |
| Journal | Optical Engineering |
| Volume | 34 |
| Issue number | 6 |
| Publication status | Published - Jun 1995 |
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ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics
Cite this
Infrared observation of evaporative cooling during spin-coating processes. / Birnie, Dunbar P; Zelinski, Brian J.; Perry, David L.
In: Optical Engineering, Vol. 34, No. 6, 06.1995, p. 1782-1788.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Infrared observation of evaporative cooling during spin-coating processes
AU - Birnie, Dunbar P
AU - Zelinski, Brian J.
AU - Perry, David L.
PY - 1995/6
Y1 - 1995/6
N2 - To explore the origin of chuck-related surface nonuniformities in thin films deposited from solutions, real-time observations of evaporative cooling effects during spin-coating of solvents are made using an IR-switched-field-effect-transistor (FET) array camera. The evaporative cooling depends strongly on the volatility of the solvent being tested. For acetone (the most volatile solvent tested) the cooling effect can be as large as 10 degrees Celsius when a silicon wafer is used as the substrate. Comparisons are made between wafer type and position on the substrate and sources of the temperature differences are discussed within the framework of the basic spin-coating paradigm. It is likely that these evaporative cooling effects play an important role in the development of chuck-related surface nonuniformities during spin coating; solvent systems may be selected to help optimize film uniformity. These aspects of solution engineering are also discussed.
AB - To explore the origin of chuck-related surface nonuniformities in thin films deposited from solutions, real-time observations of evaporative cooling effects during spin-coating of solvents are made using an IR-switched-field-effect-transistor (FET) array camera. The evaporative cooling depends strongly on the volatility of the solvent being tested. For acetone (the most volatile solvent tested) the cooling effect can be as large as 10 degrees Celsius when a silicon wafer is used as the substrate. Comparisons are made between wafer type and position on the substrate and sources of the temperature differences are discussed within the framework of the basic spin-coating paradigm. It is likely that these evaporative cooling effects play an important role in the development of chuck-related surface nonuniformities during spin coating; solvent systems may be selected to help optimize film uniformity. These aspects of solution engineering are also discussed.
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M3 - Article
AN - SCOPUS:0029313805
VL - 34
SP - 1782
EP - 1788
JO - Optical Engineering
JF - Optical Engineering
SN - 0091-3286
IS - 6
ER -