Interface passivation of silicon dioxide layers on silicon carbide

S. Dhar, S. T. Pantelides, Leonard C Feldman, S. Wang, T. Isaacs-Smith, J. R. Williams

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

3 Citations (Scopus)
Original languageEnglish
Title of host publication2005 International Semiconductor Device Research Symposium
Pages236-237
Number of pages2
Volume2005
Publication statusPublished - 2005
Event2005 International Semiconductor Device Research Symposium - Bethesda, MD, United States
Duration: Dec 7 2005 → Dec 9 2005

Other

Other2005 International Semiconductor Device Research Symposium
CountryUnited States
CityBethesda, MD
Period12/7/05 → 12/9/05

Fingerprint

Passivation
Silicon carbide
Silica

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Dhar, S., Pantelides, S. T., Feldman, L. C., Wang, S., Isaacs-Smith, T., & Williams, J. R. (2005). Interface passivation of silicon dioxide layers on silicon carbide. In 2005 International Semiconductor Device Research Symposium (Vol. 2005, pp. 236-237). [1596071]

Interface passivation of silicon dioxide layers on silicon carbide. / Dhar, S.; Pantelides, S. T.; Feldman, Leonard C; Wang, S.; Isaacs-Smith, T.; Williams, J. R.

2005 International Semiconductor Device Research Symposium. Vol. 2005 2005. p. 236-237 1596071.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Dhar, S, Pantelides, ST, Feldman, LC, Wang, S, Isaacs-Smith, T & Williams, JR 2005, Interface passivation of silicon dioxide layers on silicon carbide. in 2005 International Semiconductor Device Research Symposium. vol. 2005, 1596071, pp. 236-237, 2005 International Semiconductor Device Research Symposium, Bethesda, MD, United States, 12/7/05.
Dhar S, Pantelides ST, Feldman LC, Wang S, Isaacs-Smith T, Williams JR. Interface passivation of silicon dioxide layers on silicon carbide. In 2005 International Semiconductor Device Research Symposium. Vol. 2005. 2005. p. 236-237. 1596071
Dhar, S. ; Pantelides, S. T. ; Feldman, Leonard C ; Wang, S. ; Isaacs-Smith, T. ; Williams, J. R. / Interface passivation of silicon dioxide layers on silicon carbide. 2005 International Semiconductor Device Research Symposium. Vol. 2005 2005. pp. 236-237
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