Investigating carbon materials for use as the electron emission source in a parallel electron-beam lithography system

W. I. Milne, K. B K Teo, Manish Chhowalla, G. A J Amaratunga, J. Yuan, J. Robertson, P. Legagneux, G. Pirio, Karim Bouzehouane, D. Pribat, W. Bruenger, C. Trautmann

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

A microelectronic parallel electron-beam lithography system using an array of field emitting microguns is currently being developed. This paper investigates the suitability of various carbon based materials for the electron source in this device, namely tetrahedrally bonded amorphous carbon (ta-C), nanoclustered carbon and carbon nanotubes. Ta-C was most easily integrated into a gated field emitter structure and various methods, such as plasma and heavy ion irradiation, were used to induce emission sites in the ta-C. However, the creation of such emission sites at desired locations appeared to be difficult/random in nature and thus the material was unsuitable for this application. In contrast, nanoclustered carbon material readily field emits with a high site density but the by-products from the deposition process create integration issues when using the material in a microelectronic gated structure. Carbon nanotubes are currently the most promising candidate for use as the emission source. We have developed a high yield and clean (amorphous carbon by-product free) PECVD process to deposit single free standing nanotubes at desired locations with exceptional uniformity in terms of nanotube height and diameter. Field emission from an array of nanotubes was also obtained.

Original languageEnglish
Pages (from-to)317-320
Number of pages4
JournalCurrent Applied Physics
Volume1
Issue number4-5
DOIs
Publication statusPublished - Nov 2001

Fingerprint

Electron beam lithography
Electron emission
electron emission
Carbon
lithography
electron beams
Nanotubes
Carbon Nanotubes
carbon
Amorphous carbon
nanotubes
Microelectronics
Byproducts
Carbon nanotubes
microelectronics
Electron sources
Heavy Ions
carbon nanotubes
Plasma enhanced chemical vapor deposition
Ion bombardment

Keywords

  • 81.05.U
  • 85.35.K
  • 95.40.H
  • Carbon nanotubes
  • Diamond like carbon
  • Field emission

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Investigating carbon materials for use as the electron emission source in a parallel electron-beam lithography system. / Milne, W. I.; Teo, K. B K; Chhowalla, Manish; Amaratunga, G. A J; Yuan, J.; Robertson, J.; Legagneux, P.; Pirio, G.; Bouzehouane, Karim; Pribat, D.; Bruenger, W.; Trautmann, C.

In: Current Applied Physics, Vol. 1, No. 4-5, 11.2001, p. 317-320.

Research output: Contribution to journalArticle

Milne, WI, Teo, KBK, Chhowalla, M, Amaratunga, GAJ, Yuan, J, Robertson, J, Legagneux, P, Pirio, G, Bouzehouane, K, Pribat, D, Bruenger, W & Trautmann, C 2001, 'Investigating carbon materials for use as the electron emission source in a parallel electron-beam lithography system', Current Applied Physics, vol. 1, no. 4-5, pp. 317-320. https://doi.org/10.1016/S1567-1739(01)00030-X
Milne, W. I. ; Teo, K. B K ; Chhowalla, Manish ; Amaratunga, G. A J ; Yuan, J. ; Robertson, J. ; Legagneux, P. ; Pirio, G. ; Bouzehouane, Karim ; Pribat, D. ; Bruenger, W. ; Trautmann, C. / Investigating carbon materials for use as the electron emission source in a parallel electron-beam lithography system. In: Current Applied Physics. 2001 ; Vol. 1, No. 4-5. pp. 317-320.
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