Investigating narrow plasmons in nanoparticle arrays fabricated using Electron Beam Lithography

Erin M. Hicks, Linda Gunnarrsson, Tomas Rindevicius, Shengli Zou, Bengt Kasemo, Mikael Käll, George C Schatz, Kenneth G. Spears, Richard P. Van Duyne

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

The improvement of nanofabrication is one of the driving forces behind advancements in the fields of electronics, photonics and sensors. Precise control over nanoscale architecture is an essential aspect in relating new size-dependent material properties. Direct writing methods such as Electron Beam Lithography (EBL), enable precise "user-defined" writing of nanostructures in a wide range of materials. Using electrodynamics calculations, Schatz and coworkers have discovered one dimensional array structures built from spherical silver nanoparticles that produce remarkably narrow plasmon resonance spectra upon irradiation with light that is polarized perpendicularly to the array axis. In order to investigate these interactions, precise control of nanoparticle orientation, size, shape and spacing is necessary. If the overall structures have excessive defects then the effect may not be seen. To have the best control over array fabrication and to look at these interactions experimentally. EBL was used to construct lines of circular cylinders of varying interparticle spacings. Dark field microscopy was used to look at overall sample homogeneity and collect the single particle plasmon resonance spectrum. Additionally, a UV-visible spectrometer with a variable angle stage was used to look at the bulk line properties. With experimental verification of the theory will lead to not only a more thorough understanding of the underlying principles of nanophotonics, but also application in biosensing, that potentially improve on current technologies.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium Proceedings
EditorsD. LaVan, M. McNie, C.S. Ozkan, S. Prasad
Pages317-322
Number of pages6
Volume872
Publication statusPublished - 2005
Event2005 materials Research Society Spring Meeting - San Francisco, CA, United States
Duration: Mar 28 2005Apr 1 2005

Other

Other2005 materials Research Society Spring Meeting
CountryUnited States
CitySan Francisco, CA
Period3/28/054/1/05

Fingerprint

Plasmons
Electron beam lithography
Nanoparticles
Nanophotonics
Electrodynamics
Circular cylinders
Nanotechnology
Silver
Photonics
Spectrometers
Nanostructures
Materials properties
Microscopic examination
Electronic equipment
Irradiation
Fabrication
Defects
Sensors

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Hicks, E. M., Gunnarrsson, L., Rindevicius, T., Zou, S., Kasemo, B., Käll, M., ... Van Duyne, R. P. (2005). Investigating narrow plasmons in nanoparticle arrays fabricated using Electron Beam Lithography. In D. LaVan, M. McNie, C. S. Ozkan, & S. Prasad (Eds.), Materials Research Society Symposium Proceedings (Vol. 872, pp. 317-322). [J16.1]

Investigating narrow plasmons in nanoparticle arrays fabricated using Electron Beam Lithography. / Hicks, Erin M.; Gunnarrsson, Linda; Rindevicius, Tomas; Zou, Shengli; Kasemo, Bengt; Käll, Mikael; Schatz, George C; Spears, Kenneth G.; Van Duyne, Richard P.

Materials Research Society Symposium Proceedings. ed. / D. LaVan; M. McNie; C.S. Ozkan; S. Prasad. Vol. 872 2005. p. 317-322 J16.1.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Hicks, EM, Gunnarrsson, L, Rindevicius, T, Zou, S, Kasemo, B, Käll, M, Schatz, GC, Spears, KG & Van Duyne, RP 2005, Investigating narrow plasmons in nanoparticle arrays fabricated using Electron Beam Lithography. in D LaVan, M McNie, CS Ozkan & S Prasad (eds), Materials Research Society Symposium Proceedings. vol. 872, J16.1, pp. 317-322, 2005 materials Research Society Spring Meeting, San Francisco, CA, United States, 3/28/05.
Hicks EM, Gunnarrsson L, Rindevicius T, Zou S, Kasemo B, Käll M et al. Investigating narrow plasmons in nanoparticle arrays fabricated using Electron Beam Lithography. In LaVan D, McNie M, Ozkan CS, Prasad S, editors, Materials Research Society Symposium Proceedings. Vol. 872. 2005. p. 317-322. J16.1
Hicks, Erin M. ; Gunnarrsson, Linda ; Rindevicius, Tomas ; Zou, Shengli ; Kasemo, Bengt ; Käll, Mikael ; Schatz, George C ; Spears, Kenneth G. ; Van Duyne, Richard P. / Investigating narrow plasmons in nanoparticle arrays fabricated using Electron Beam Lithography. Materials Research Society Symposium Proceedings. editor / D. LaVan ; M. McNie ; C.S. Ozkan ; S. Prasad. Vol. 872 2005. pp. 317-322
@inproceedings{66cae9996db944988ab9a297d3bc41af,
title = "Investigating narrow plasmons in nanoparticle arrays fabricated using Electron Beam Lithography",
abstract = "The improvement of nanofabrication is one of the driving forces behind advancements in the fields of electronics, photonics and sensors. Precise control over nanoscale architecture is an essential aspect in relating new size-dependent material properties. Direct writing methods such as Electron Beam Lithography (EBL), enable precise {"}user-defined{"} writing of nanostructures in a wide range of materials. Using electrodynamics calculations, Schatz and coworkers have discovered one dimensional array structures built from spherical silver nanoparticles that produce remarkably narrow plasmon resonance spectra upon irradiation with light that is polarized perpendicularly to the array axis. In order to investigate these interactions, precise control of nanoparticle orientation, size, shape and spacing is necessary. If the overall structures have excessive defects then the effect may not be seen. To have the best control over array fabrication and to look at these interactions experimentally. EBL was used to construct lines of circular cylinders of varying interparticle spacings. Dark field microscopy was used to look at overall sample homogeneity and collect the single particle plasmon resonance spectrum. Additionally, a UV-visible spectrometer with a variable angle stage was used to look at the bulk line properties. With experimental verification of the theory will lead to not only a more thorough understanding of the underlying principles of nanophotonics, but also application in biosensing, that potentially improve on current technologies.",
author = "Hicks, {Erin M.} and Linda Gunnarrsson and Tomas Rindevicius and Shengli Zou and Bengt Kasemo and Mikael K{\"a}ll and Schatz, {George C} and Spears, {Kenneth G.} and {Van Duyne}, {Richard P.}",
year = "2005",
language = "English",
volume = "872",
pages = "317--322",
editor = "D. LaVan and M. McNie and C.S. Ozkan and S. Prasad",
booktitle = "Materials Research Society Symposium Proceedings",

}

TY - GEN

T1 - Investigating narrow plasmons in nanoparticle arrays fabricated using Electron Beam Lithography

AU - Hicks, Erin M.

AU - Gunnarrsson, Linda

AU - Rindevicius, Tomas

AU - Zou, Shengli

AU - Kasemo, Bengt

AU - Käll, Mikael

AU - Schatz, George C

AU - Spears, Kenneth G.

AU - Van Duyne, Richard P.

PY - 2005

Y1 - 2005

N2 - The improvement of nanofabrication is one of the driving forces behind advancements in the fields of electronics, photonics and sensors. Precise control over nanoscale architecture is an essential aspect in relating new size-dependent material properties. Direct writing methods such as Electron Beam Lithography (EBL), enable precise "user-defined" writing of nanostructures in a wide range of materials. Using electrodynamics calculations, Schatz and coworkers have discovered one dimensional array structures built from spherical silver nanoparticles that produce remarkably narrow plasmon resonance spectra upon irradiation with light that is polarized perpendicularly to the array axis. In order to investigate these interactions, precise control of nanoparticle orientation, size, shape and spacing is necessary. If the overall structures have excessive defects then the effect may not be seen. To have the best control over array fabrication and to look at these interactions experimentally. EBL was used to construct lines of circular cylinders of varying interparticle spacings. Dark field microscopy was used to look at overall sample homogeneity and collect the single particle plasmon resonance spectrum. Additionally, a UV-visible spectrometer with a variable angle stage was used to look at the bulk line properties. With experimental verification of the theory will lead to not only a more thorough understanding of the underlying principles of nanophotonics, but also application in biosensing, that potentially improve on current technologies.

AB - The improvement of nanofabrication is one of the driving forces behind advancements in the fields of electronics, photonics and sensors. Precise control over nanoscale architecture is an essential aspect in relating new size-dependent material properties. Direct writing methods such as Electron Beam Lithography (EBL), enable precise "user-defined" writing of nanostructures in a wide range of materials. Using electrodynamics calculations, Schatz and coworkers have discovered one dimensional array structures built from spherical silver nanoparticles that produce remarkably narrow plasmon resonance spectra upon irradiation with light that is polarized perpendicularly to the array axis. In order to investigate these interactions, precise control of nanoparticle orientation, size, shape and spacing is necessary. If the overall structures have excessive defects then the effect may not be seen. To have the best control over array fabrication and to look at these interactions experimentally. EBL was used to construct lines of circular cylinders of varying interparticle spacings. Dark field microscopy was used to look at overall sample homogeneity and collect the single particle plasmon resonance spectrum. Additionally, a UV-visible spectrometer with a variable angle stage was used to look at the bulk line properties. With experimental verification of the theory will lead to not only a more thorough understanding of the underlying principles of nanophotonics, but also application in biosensing, that potentially improve on current technologies.

UR - http://www.scopus.com/inward/record.url?scp=30644476418&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=30644476418&partnerID=8YFLogxK

M3 - Conference contribution

VL - 872

SP - 317

EP - 322

BT - Materials Research Society Symposium Proceedings

A2 - LaVan, D.

A2 - McNie, M.

A2 - Ozkan, C.S.

A2 - Prasad, S.

ER -