Investigation of carbon nitride films by cathodic arc evaporation

M. Chhowalla, I. Alexandrou, C. Kiely, G. A.J. Amaratunga, R. Aharonov, R. F. Fontana

Research output: Contribution to journalArticle

36 Citations (Scopus)

Abstract

Presently there is great interest in deposition of the β-phase C3N4 because its predicted hardness and moduli exceed those of diamond. The use of energetic particle beam methods have shown promise in terms of nitrogen incorporation. Energetic and highly ionized beams from cathodic arcs have also proven to be effective in deposition of tetrahedral amorphous carbon (ta-C). In this paper we report on C-N films deposited using a carbon arc in nitrogen atmosphere. Films with nitrogen concentration ranging from 17-32% were deposited as a function of nitrogen pressure and substrate temperature. CNx films deposited above room temperature and 1 mTorr (0.013 Pa) of N2 were found to have low stress, indicating the presence of mostly sp2 bonding.

Original languageEnglish
Pages (from-to)103-106
Number of pages4
JournalThin Solid Films
Volume290-291
DOIs
Publication statusPublished - Dec 15 1996

Keywords

  • Carbon nitride films
  • Cathodic arcs

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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  • Cite this

    Chhowalla, M., Alexandrou, I., Kiely, C., Amaratunga, G. A. J., Aharonov, R., & Fontana, R. F. (1996). Investigation of carbon nitride films by cathodic arc evaporation. Thin Solid Films, 290-291, 103-106. https://doi.org/10.1016/S0040-6090(96)09067-0