Investigation of surface roughness and hillock formation on platinized substrates used for pt/pzt/pt capacitor fabrication

Emil A. Kneer, Dunbar P Birnie, R. D. Schrimpf, J. C. Podlesny, G. Teowee

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

Hillock formation on Pt bottom electrode surfaces has been investigated for <111 > Si and sapphire substrates. This paper correlates the electrical performance of Pt/PZT/Pt structured capacitors with the observed surface roughness and/or hillock presence on the Pt bottom electrode.

Original languageEnglish
Pages (from-to)61-73
Number of pages13
JournalIntegrated Ferroelectrics
Volume7
Issue number1-4
DOIs
Publication statusPublished - 1995

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capacitors
surface roughness
Capacitors
Surface roughness
Fabrication
Electrodes
fabrication
electrodes
Aluminum Oxide
Substrates
Sapphire
sapphire

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Ceramics and Composites
  • Materials Chemistry
  • Electronic, Optical and Magnetic Materials

Cite this

Investigation of surface roughness and hillock formation on platinized substrates used for pt/pzt/pt capacitor fabrication. / Kneer, Emil A.; Birnie, Dunbar P; Schrimpf, R. D.; Podlesny, J. C.; Teowee, G.

In: Integrated Ferroelectrics, Vol. 7, No. 1-4, 1995, p. 61-73.

Research output: Contribution to journalArticle

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AU - Teowee, G.

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