Abstract
Hillock formation on Pt bottom electrode surfaces has been investigated for <111 > Si and sapphire substrates. This paper correlates the electrical performance of Pt/PZT/Pt structured capacitors with the observed surface roughness and/or hillock presence on the Pt bottom electrode.
| Original language | English |
|---|---|
| Pages (from-to) | 61-73 |
| Number of pages | 13 |
| Journal | Integrated Ferroelectrics |
| Volume | 7 |
| Issue number | 1-4 |
| DOIs | |
| Publication status | Published - 1995 |
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ASJC Scopus subject areas
- Control and Systems Engineering
- Condensed Matter Physics
- Electrical and Electronic Engineering
- Ceramics and Composites
- Materials Chemistry
- Electronic, Optical and Magnetic Materials
Cite this
Investigation of surface roughness and hillock formation on platinized substrates used for pt/pzt/pt capacitor fabrication. / Kneer, Emil A.; Birnie, Dunbar P; Schrimpf, R. D.; Podlesny, J. C.; Teowee, G.
In: Integrated Ferroelectrics, Vol. 7, No. 1-4, 1995, p. 61-73.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Investigation of surface roughness and hillock formation on platinized substrates used for pt/pzt/pt capacitor fabrication
AU - Kneer, Emil A.
AU - Birnie, Dunbar P
AU - Schrimpf, R. D.
AU - Podlesny, J. C.
AU - Teowee, G.
PY - 1995
Y1 - 1995
N2 - Hillock formation on Pt bottom electrode surfaces has been investigated for <111 > Si and sapphire substrates. This paper correlates the electrical performance of Pt/PZT/Pt structured capacitors with the observed surface roughness and/or hillock presence on the Pt bottom electrode.
AB - Hillock formation on Pt bottom electrode surfaces has been investigated for <111 > Si and sapphire substrates. This paper correlates the electrical performance of Pt/PZT/Pt structured capacitors with the observed surface roughness and/or hillock presence on the Pt bottom electrode.
UR - http://www.scopus.com/inward/record.url?scp=84914595716&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84914595716&partnerID=8YFLogxK
U2 - 10.1080/10584589508220221
DO - 10.1080/10584589508220221
M3 - Article
AN - SCOPUS:84914595716
VL - 7
SP - 61
EP - 73
JO - Integrated Ferroelectrics
JF - Integrated Ferroelectrics
SN - 1058-4587
IS - 1-4
ER -