Abstract
Absorption infrared spectroscopy (IRAS) and Rutherford backscattering (RBS) have been used to investigate the reaction of chlorine-terminated Si(111) surfaces with organometallic molecules (Grignard reagents). Although the predominant reaction leads to alkylation, with formation of covalent Si-C bonds, evidenced by a 678 cm-1 feature assigned to the Si-C stretch mode, solvents typically used during alkylation (tetrahydrofuran and methanol) can also react with Cl/Si(111) surfaces, either during the alkylation reaction or during the rinsing/cleaning process to form Si-OCnH2n+1 as observed by the presence of a SiO-C stretch mode at 1090 cm-1. We also address the origin of some silicon oxidation observed after the methylation or ethylation reactions.
Original language | English |
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Pages (from-to) | 13053-13061 |
Number of pages | 9 |
Journal | Journal of Physical Chemistry C |
Volume | 111 |
Issue number | 35 |
DOIs | |
Publication status | Published - Sep 6 2007 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Energy(all)
- Physical and Theoretical Chemistry
- Surfaces, Coatings and Films