Abstract
Absorption infrared spectroscopy (IRAS) and Rutherford backscattering (RBS) have been used to investigate the reaction of chlorine-terminated Si(111) surfaces with organometallic molecules (Grignard reagents). Although the predominant reaction leads to alkylation, with formation of covalent Si-C bonds, evidenced by a 678 cm-1 feature assigned to the Si-C stretch mode, solvents typically used during alkylation (tetrahydrofuran and methanol) can also react with Cl/Si(111) surfaces, either during the alkylation reaction or during the rinsing/cleaning process to form Si-OCnH2n+1 as observed by the presence of a SiO-C stretch mode at 1090 cm-1. We also address the origin of some silicon oxidation observed after the methylation or ethylation reactions.
| Original language | English |
|---|---|
| Pages (from-to) | 13053-13061 |
| Number of pages | 9 |
| Journal | Journal of Physical Chemistry C |
| Volume | 111 |
| Issue number | 35 |
| DOIs | |
| Publication status | Published - Sep 6 2007 |
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ASJC Scopus subject areas
- Physical and Theoretical Chemistry
- Electronic, Optical and Magnetic Materials
- Surfaces, Coatings and Films
- Energy(all)
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Investigation of the reactions during alkylation of chlorine-terminated silicon (111) surfaces. / Amy, Sandrine Rivillon; Michalak, David J.; Chabal, Yves J.; Wielunski, Leszek; Hurley, Patrick T.; Lewis, Nathan S.
In: Journal of Physical Chemistry C, Vol. 111, No. 35, 06.09.2007, p. 13053-13061.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Investigation of the reactions during alkylation of chlorine-terminated silicon (111) surfaces
AU - Amy, Sandrine Rivillon
AU - Michalak, David J.
AU - Chabal, Yves J.
AU - Wielunski, Leszek
AU - Hurley, Patrick T.
AU - Lewis, Nathan S
PY - 2007/9/6
Y1 - 2007/9/6
N2 - Absorption infrared spectroscopy (IRAS) and Rutherford backscattering (RBS) have been used to investigate the reaction of chlorine-terminated Si(111) surfaces with organometallic molecules (Grignard reagents). Although the predominant reaction leads to alkylation, with formation of covalent Si-C bonds, evidenced by a 678 cm-1 feature assigned to the Si-C stretch mode, solvents typically used during alkylation (tetrahydrofuran and methanol) can also react with Cl/Si(111) surfaces, either during the alkylation reaction or during the rinsing/cleaning process to form Si-OCnH2n+1 as observed by the presence of a SiO-C stretch mode at 1090 cm-1. We also address the origin of some silicon oxidation observed after the methylation or ethylation reactions.
AB - Absorption infrared spectroscopy (IRAS) and Rutherford backscattering (RBS) have been used to investigate the reaction of chlorine-terminated Si(111) surfaces with organometallic molecules (Grignard reagents). Although the predominant reaction leads to alkylation, with formation of covalent Si-C bonds, evidenced by a 678 cm-1 feature assigned to the Si-C stretch mode, solvents typically used during alkylation (tetrahydrofuran and methanol) can also react with Cl/Si(111) surfaces, either during the alkylation reaction or during the rinsing/cleaning process to form Si-OCnH2n+1 as observed by the presence of a SiO-C stretch mode at 1090 cm-1. We also address the origin of some silicon oxidation observed after the methylation or ethylation reactions.
UR - http://www.scopus.com/inward/record.url?scp=34648813637&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=34648813637&partnerID=8YFLogxK
U2 - 10.1021/jp071793f
DO - 10.1021/jp071793f
M3 - Article
AN - SCOPUS:34648813637
VL - 111
SP - 13053
EP - 13061
JO - Journal of Physical Chemistry C
JF - Journal of Physical Chemistry C
SN - 1932-7447
IS - 35
ER -