Investigation of the reactions during alkylation of chlorine-terminated silicon (111) surfaces

Sandrine Rivillon Amy; David J. Michalak; Yves J. Chabal; Leszek Wielunski; Patrick T. Hurley; Nathan S. Lewis

doi:10.1021/jp071793f

Investigation of the reactions during alkylation of chlorine-terminated silicon (111) surfaces

Sandrine Rivillon Amy, David J. Michalak, Yves J. Chabal, Leszek Wielunski, Patrick T. Hurley, Nathan S. Lewis

California Institute of Technology

Research output: Contribution to journal › Article › peer-review

43 Citations (Scopus)

Abstract

Absorption infrared spectroscopy (IRAS) and Rutherford backscattering (RBS) have been used to investigate the reaction of chlorine-terminated Si(111) surfaces with organometallic molecules (Grignard reagents). Although the predominant reaction leads to alkylation, with formation of covalent Si-C bonds, evidenced by a 678 cm^-1 feature assigned to the Si-C stretch mode, solvents typically used during alkylation (tetrahydrofuran and methanol) can also react with Cl/Si(111) surfaces, either during the alkylation reaction or during the rinsing/cleaning process to form Si-OC_nH_2n+1 as observed by the presence of a SiO-C stretch mode at 1090 cm^-1. We also address the origin of some silicon oxidation observed after the methylation or ethylation reactions.

Original language	English
Pages (from-to)	13053-13061
Number of pages	9
Journal	Journal of Physical Chemistry C
Volume	111
Issue number	35
DOIs	https://doi.org/10.1021/jp071793f
Publication status	Published - Sep 6 2007

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Energy(all)
Physical and Theoretical Chemistry
Surfaces, Coatings and Films

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abstract = "Absorption infrared spectroscopy (IRAS) and Rutherford backscattering (RBS) have been used to investigate the reaction of chlorine-terminated Si(111) surfaces with organometallic molecules (Grignard reagents). Although the predominant reaction leads to alkylation, with formation of covalent Si-C bonds, evidenced by a 678 cm-1 feature assigned to the Si-C stretch mode, solvents typically used during alkylation (tetrahydrofuran and methanol) can also react with Cl/Si(111) surfaces, either during the alkylation reaction or during the rinsing/cleaning process to form Si-OCnH2n+1 as observed by the presence of a SiO-C stretch mode at 1090 cm-1. We also address the origin of some silicon oxidation observed after the methylation or ethylation reactions.",

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AU - Amy, Sandrine Rivillon

AU - Michalak, David J.

AU - Chabal, Yves J.

AU - Wielunski, Leszek

AU - Hurley, Patrick T.

AU - Lewis, Nathan S.

PY - 2007/9/6

Y1 - 2007/9/6

N2 - Absorption infrared spectroscopy (IRAS) and Rutherford backscattering (RBS) have been used to investigate the reaction of chlorine-terminated Si(111) surfaces with organometallic molecules (Grignard reagents). Although the predominant reaction leads to alkylation, with formation of covalent Si-C bonds, evidenced by a 678 cm-1 feature assigned to the Si-C stretch mode, solvents typically used during alkylation (tetrahydrofuran and methanol) can also react with Cl/Si(111) surfaces, either during the alkylation reaction or during the rinsing/cleaning process to form Si-OCnH2n+1 as observed by the presence of a SiO-C stretch mode at 1090 cm-1. We also address the origin of some silicon oxidation observed after the methylation or ethylation reactions.

AB - Absorption infrared spectroscopy (IRAS) and Rutherford backscattering (RBS) have been used to investigate the reaction of chlorine-terminated Si(111) surfaces with organometallic molecules (Grignard reagents). Although the predominant reaction leads to alkylation, with formation of covalent Si-C bonds, evidenced by a 678 cm-1 feature assigned to the Si-C stretch mode, solvents typically used during alkylation (tetrahydrofuran and methanol) can also react with Cl/Si(111) surfaces, either during the alkylation reaction or during the rinsing/cleaning process to form Si-OCnH2n+1 as observed by the presence of a SiO-C stretch mode at 1090 cm-1. We also address the origin of some silicon oxidation observed after the methylation or ethylation reactions.

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Investigation of the reactions during alkylation of chlorine-terminated silicon (111) surfaces

Abstract

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