Investigation of the reactions during alkylation of chlorine-terminated silicon (111) surfaces

Sandrine Rivillon Amy, David J. Michalak, Yves J. Chabal, Leszek Wielunski, Patrick T. Hurley, Nathan S. Lewis

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43 Citations (Scopus)

Abstract

Absorption infrared spectroscopy (IRAS) and Rutherford backscattering (RBS) have been used to investigate the reaction of chlorine-terminated Si(111) surfaces with organometallic molecules (Grignard reagents). Although the predominant reaction leads to alkylation, with formation of covalent Si-C bonds, evidenced by a 678 cm-1 feature assigned to the Si-C stretch mode, solvents typically used during alkylation (tetrahydrofuran and methanol) can also react with Cl/Si(111) surfaces, either during the alkylation reaction or during the rinsing/cleaning process to form Si-OCnH2n+1 as observed by the presence of a SiO-C stretch mode at 1090 cm-1. We also address the origin of some silicon oxidation observed after the methylation or ethylation reactions.

Original languageEnglish
Pages (from-to)13053-13061
Number of pages9
JournalJournal of Physical Chemistry C
Volume111
Issue number35
DOIs
Publication statusPublished - Sep 6 2007

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ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Energy(all)
  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films

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