Investigation of the reactions during alkylation of chlorine-terminated silicon (111) surfaces

Sandrine Rivillon Amy; David J. Michalak; Yves J. Chabal; Leszek Wielunski; Patrick T. Hurley; Nathan S. Lewis

doi:10.1021/jp071793f

Investigation of the reactions during alkylation of chlorine-terminated silicon (111) surfaces

Sandrine Rivillon Amy, David J. Michalak, Yves J. Chabal, Leszek Wielunski, Patrick T. Hurley, Nathan S. Lewis

California Institute of Technology

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43 Citations (Scopus)

Abstract

Absorption infrared spectroscopy (IRAS) and Rutherford backscattering (RBS) have been used to investigate the reaction of chlorine-terminated Si(111) surfaces with organometallic molecules (Grignard reagents). Although the predominant reaction leads to alkylation, with formation of covalent Si-C bonds, evidenced by a 678 cm^-1 feature assigned to the Si-C stretch mode, solvents typically used during alkylation (tetrahydrofuran and methanol) can also react with Cl/Si(111) surfaces, either during the alkylation reaction or during the rinsing/cleaning process to form Si-OC_nH_2n+1 as observed by the presence of a SiO-C stretch mode at 1090 cm^-1. We also address the origin of some silicon oxidation observed after the methylation or ethylation reactions.

Original language	English
Pages (from-to)	13053-13061
Number of pages	9
Journal	Journal of Physical Chemistry C
Volume	111
Issue number	35
DOIs	https://doi.org/10.1021/jp071793f
Publication status	Published - Sep 6 2007

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ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Energy(all)
Physical and Theoretical Chemistry
Surfaces, Coatings and Films

Cite this

Amy, S. R., Michalak, D. J., Chabal, Y. J., Wielunski, L., Hurley, P. T., & Lewis, N. S. (2007). Investigation of the reactions during alkylation of chlorine-terminated silicon (111) surfaces. Journal of Physical Chemistry C, 111(35), 13053-13061. https://doi.org/10.1021/jp071793f

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abstract = "Absorption infrared spectroscopy (IRAS) and Rutherford backscattering (RBS) have been used to investigate the reaction of chlorine-terminated Si(111) surfaces with organometallic molecules (Grignard reagents). Although the predominant reaction leads to alkylation, with formation of covalent Si-C bonds, evidenced by a 678 cm-1 feature assigned to the Si-C stretch mode, solvents typically used during alkylation (tetrahydrofuran and methanol) can also react with Cl/Si(111) surfaces, either during the alkylation reaction or during the rinsing/cleaning process to form Si-OCnH2n+1 as observed by the presence of a SiO-C stretch mode at 1090 cm-1. We also address the origin of some silicon oxidation observed after the methylation or ethylation reactions.",

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AU - Michalak, David J.

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AU - Hurley, Patrick T.

AU - Lewis, Nathan S.

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AB - Absorption infrared spectroscopy (IRAS) and Rutherford backscattering (RBS) have been used to investigate the reaction of chlorine-terminated Si(111) surfaces with organometallic molecules (Grignard reagents). Although the predominant reaction leads to alkylation, with formation of covalent Si-C bonds, evidenced by a 678 cm-1 feature assigned to the Si-C stretch mode, solvents typically used during alkylation (tetrahydrofuran and methanol) can also react with Cl/Si(111) surfaces, either during the alkylation reaction or during the rinsing/cleaning process to form Si-OCnH2n+1 as observed by the presence of a SiO-C stretch mode at 1090 cm-1. We also address the origin of some silicon oxidation observed after the methylation or ethylation reactions.

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10.1021/jp071793f