Investigation of the reactions during alkylation of chlorine-terminated silicon (111) surfaces

Sandrine Rivillon Amy, David J. Michalak, Yves J. Chabal, Leszek Wielunski, Patrick T. Hurley, Nathan S Lewis

Research output: Contribution to journalArticle

43 Citations (Scopus)

Abstract

Absorption infrared spectroscopy (IRAS) and Rutherford backscattering (RBS) have been used to investigate the reaction of chlorine-terminated Si(111) surfaces with organometallic molecules (Grignard reagents). Although the predominant reaction leads to alkylation, with formation of covalent Si-C bonds, evidenced by a 678 cm-1 feature assigned to the Si-C stretch mode, solvents typically used during alkylation (tetrahydrofuran and methanol) can also react with Cl/Si(111) surfaces, either during the alkylation reaction or during the rinsing/cleaning process to form Si-OCnH2n+1 as observed by the presence of a SiO-C stretch mode at 1090 cm-1. We also address the origin of some silicon oxidation observed after the methylation or ethylation reactions.

Original languageEnglish
Pages (from-to)13053-13061
Number of pages9
JournalJournal of Physical Chemistry C
Volume111
Issue number35
DOIs
Publication statusPublished - Sep 6 2007

Fingerprint

Chlorine
alkylation
Alkylation
Silicon
chlorine
silicon
Methylation
Rutherford backscattering spectroscopy
Organometallics
Absorption spectroscopy
methylation
Methanol
Infrared spectroscopy
Cleaning
tetrahydrofuran
cleaning
reagents
Oxidation
backscattering
absorption spectroscopy

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Energy(all)

Cite this

Investigation of the reactions during alkylation of chlorine-terminated silicon (111) surfaces. / Amy, Sandrine Rivillon; Michalak, David J.; Chabal, Yves J.; Wielunski, Leszek; Hurley, Patrick T.; Lewis, Nathan S.

In: Journal of Physical Chemistry C, Vol. 111, No. 35, 06.09.2007, p. 13053-13061.

Research output: Contribution to journalArticle

Amy, Sandrine Rivillon ; Michalak, David J. ; Chabal, Yves J. ; Wielunski, Leszek ; Hurley, Patrick T. ; Lewis, Nathan S. / Investigation of the reactions during alkylation of chlorine-terminated silicon (111) surfaces. In: Journal of Physical Chemistry C. 2007 ; Vol. 111, No. 35. pp. 13053-13061.
@article{3761b910bb76408aaac292991266dd93,
title = "Investigation of the reactions during alkylation of chlorine-terminated silicon (111) surfaces",
abstract = "Absorption infrared spectroscopy (IRAS) and Rutherford backscattering (RBS) have been used to investigate the reaction of chlorine-terminated Si(111) surfaces with organometallic molecules (Grignard reagents). Although the predominant reaction leads to alkylation, with formation of covalent Si-C bonds, evidenced by a 678 cm-1 feature assigned to the Si-C stretch mode, solvents typically used during alkylation (tetrahydrofuran and methanol) can also react with Cl/Si(111) surfaces, either during the alkylation reaction or during the rinsing/cleaning process to form Si-OCnH2n+1 as observed by the presence of a SiO-C stretch mode at 1090 cm-1. We also address the origin of some silicon oxidation observed after the methylation or ethylation reactions.",
author = "Amy, {Sandrine Rivillon} and Michalak, {David J.} and Chabal, {Yves J.} and Leszek Wielunski and Hurley, {Patrick T.} and Lewis, {Nathan S}",
year = "2007",
month = "9",
day = "6",
doi = "10.1021/jp071793f",
language = "English",
volume = "111",
pages = "13053--13061",
journal = "Journal of Physical Chemistry C",
issn = "1932-7447",
publisher = "American Chemical Society",
number = "35",

}

TY - JOUR

T1 - Investigation of the reactions during alkylation of chlorine-terminated silicon (111) surfaces

AU - Amy, Sandrine Rivillon

AU - Michalak, David J.

AU - Chabal, Yves J.

AU - Wielunski, Leszek

AU - Hurley, Patrick T.

AU - Lewis, Nathan S

PY - 2007/9/6

Y1 - 2007/9/6

N2 - Absorption infrared spectroscopy (IRAS) and Rutherford backscattering (RBS) have been used to investigate the reaction of chlorine-terminated Si(111) surfaces with organometallic molecules (Grignard reagents). Although the predominant reaction leads to alkylation, with formation of covalent Si-C bonds, evidenced by a 678 cm-1 feature assigned to the Si-C stretch mode, solvents typically used during alkylation (tetrahydrofuran and methanol) can also react with Cl/Si(111) surfaces, either during the alkylation reaction or during the rinsing/cleaning process to form Si-OCnH2n+1 as observed by the presence of a SiO-C stretch mode at 1090 cm-1. We also address the origin of some silicon oxidation observed after the methylation or ethylation reactions.

AB - Absorption infrared spectroscopy (IRAS) and Rutherford backscattering (RBS) have been used to investigate the reaction of chlorine-terminated Si(111) surfaces with organometallic molecules (Grignard reagents). Although the predominant reaction leads to alkylation, with formation of covalent Si-C bonds, evidenced by a 678 cm-1 feature assigned to the Si-C stretch mode, solvents typically used during alkylation (tetrahydrofuran and methanol) can also react with Cl/Si(111) surfaces, either during the alkylation reaction or during the rinsing/cleaning process to form Si-OCnH2n+1 as observed by the presence of a SiO-C stretch mode at 1090 cm-1. We also address the origin of some silicon oxidation observed after the methylation or ethylation reactions.

UR - http://www.scopus.com/inward/record.url?scp=34648813637&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=34648813637&partnerID=8YFLogxK

U2 - 10.1021/jp071793f

DO - 10.1021/jp071793f

M3 - Article

AN - SCOPUS:34648813637

VL - 111

SP - 13053

EP - 13061

JO - Journal of Physical Chemistry C

JF - Journal of Physical Chemistry C

SN - 1932-7447

IS - 35

ER -