Large magnetoresistance in post-annealed polycrystalline and epitaxial Bi thin films

Sunglae Cho, Yunki Kim, L. J. Olafsen, I. Vurgaftman, Arthur J Freeman, G. K L Wong, J. R. Meyer, C. A. Hoffman, J. B. Ketterson

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

The magnetoresistance (MR) in post-annealed polycrystalline and epitaxial Bi thin films was discussed. The ring reflection high-energy electron diffraction (RHEED) patterns were shown by the films on Si(100). The results showed an increase in the MR by a factor of 2560 at 5K as compared with 343 for an as-grown epitaxial film was observed due to enhanced carrier mobilities.

Original languageEnglish
Pages (from-to)201-203
Number of pages3
JournalJournal of Magnetism and Magnetic Materials
Volume239
Issue number1-3
DOIs
Publication statusPublished - Feb 2002

Fingerprint

Magnetoresistance
Thin films
Reflection high energy electron diffraction
Epitaxial films
Carrier mobility
thin films
carrier mobility
high energy electrons
Diffraction patterns
diffraction patterns
electron diffraction
rings

Keywords

  • Bismuth
  • Magnetoresistance
  • Thin films
  • Transport

ASJC Scopus subject areas

  • Condensed Matter Physics

Cite this

Large magnetoresistance in post-annealed polycrystalline and epitaxial Bi thin films. / Cho, Sunglae; Kim, Yunki; Olafsen, L. J.; Vurgaftman, I.; Freeman, Arthur J; Wong, G. K L; Meyer, J. R.; Hoffman, C. A.; Ketterson, J. B.

In: Journal of Magnetism and Magnetic Materials, Vol. 239, No. 1-3, 02.2002, p. 201-203.

Research output: Contribution to journalArticle

Cho, S, Kim, Y, Olafsen, LJ, Vurgaftman, I, Freeman, AJ, Wong, GKL, Meyer, JR, Hoffman, CA & Ketterson, JB 2002, 'Large magnetoresistance in post-annealed polycrystalline and epitaxial Bi thin films', Journal of Magnetism and Magnetic Materials, vol. 239, no. 1-3, pp. 201-203. https://doi.org/10.1016/S0304-8853(01)00557-1
Cho, Sunglae ; Kim, Yunki ; Olafsen, L. J. ; Vurgaftman, I. ; Freeman, Arthur J ; Wong, G. K L ; Meyer, J. R. ; Hoffman, C. A. ; Ketterson, J. B. / Large magnetoresistance in post-annealed polycrystalline and epitaxial Bi thin films. In: Journal of Magnetism and Magnetic Materials. 2002 ; Vol. 239, No. 1-3. pp. 201-203.
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