Large second-order optical nonlinearities in pulsed laser ablated silicon carbide thin films

P. M. Lundquist, H. C. Ong, W. P. Lin, R. P.H. Chang, J. B. Ketterson, G. K. Wong

Research output: Contribution to journalArticlepeer-review

21 Citations (Scopus)

Abstract

Large second-order nonlinear optical response has been observed in silicon carbide thin films deposited by pulsed laser ablation on sapphire and fused silica substrates; films on both substrates were uniform and optically transparent but exhibited distinct orientations. The d33 values of the sapphire-substrate samples were determined to be 10 pm/V.

Original languageEnglish
Pages (from-to)2919
Number of pages1
JournalApplied Physics Letters
Volume67
DOIs
Publication statusPublished - 1995

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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