Abstract
The field of integrated optics is dependent on major advances in the development of new nonlinear optical (NLO) thin-film materials. NLO materials that are thermally stable and can be fabricated on a variety of substrates would offer vital gains in flexibility and cost. In this work, SiC thin films have been fabricated on sapphire, fused silica, and silicon substrates. The two optically transparent substrates result in films with large second-order optical nonlinearities, as large as 30 times the d11 value of quartz. The refractory nature of SiC and its high melting point suggest that its robustness should compare favorably to organic NLO waveguide materials. The large NLO coefficients indicate that SiC may be competitive with currently available inorganic thin-film materials.
| Original language | English |
|---|---|
| Pages (from-to) | 2919-2921 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 67 |
| Issue number | 20 |
| DOIs | |
| Publication status | Published - Jan 1 1995 |
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ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)
Cite this
Large second-order optical nonlinearities in pulsed laser ablated silicon carbide thin films. / Lundquist, P. M.; Ong, H. C.; Lin, W. P.; Chang, R. P H; Ketterson, J. B.; Wong, G. K.
In: Applied Physics Letters, Vol. 67, No. 20, 01.01.1995, p. 2919-2921.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Large second-order optical nonlinearities in pulsed laser ablated silicon carbide thin films
AU - Lundquist, P. M.
AU - Ong, H. C.
AU - Lin, W. P.
AU - Chang, R. P H
AU - Ketterson, J. B.
AU - Wong, G. K.
PY - 1995/1/1
Y1 - 1995/1/1
N2 - The field of integrated optics is dependent on major advances in the development of new nonlinear optical (NLO) thin-film materials. NLO materials that are thermally stable and can be fabricated on a variety of substrates would offer vital gains in flexibility and cost. In this work, SiC thin films have been fabricated on sapphire, fused silica, and silicon substrates. The two optically transparent substrates result in films with large second-order optical nonlinearities, as large as 30 times the d11 value of quartz. The refractory nature of SiC and its high melting point suggest that its robustness should compare favorably to organic NLO waveguide materials. The large NLO coefficients indicate that SiC may be competitive with currently available inorganic thin-film materials.
AB - The field of integrated optics is dependent on major advances in the development of new nonlinear optical (NLO) thin-film materials. NLO materials that are thermally stable and can be fabricated on a variety of substrates would offer vital gains in flexibility and cost. In this work, SiC thin films have been fabricated on sapphire, fused silica, and silicon substrates. The two optically transparent substrates result in films with large second-order optical nonlinearities, as large as 30 times the d11 value of quartz. The refractory nature of SiC and its high melting point suggest that its robustness should compare favorably to organic NLO waveguide materials. The large NLO coefficients indicate that SiC may be competitive with currently available inorganic thin-film materials.
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U2 - 10.1063/1.114842
DO - 10.1063/1.114842
M3 - Article
VL - 67
SP - 2919
EP - 2921
JO - Applied Physics Letters
JF - Applied Physics Letters
SN - 0003-6951
IS - 20
ER -