Large second-order optical nonlinearities in pulsed laser ablated silicon carbide thin films

P. M. Lundquist, H. C. Ong, W. P. Lin, R. P H Chang, J. B. Ketterson, G. K. Wong

Research output: Contribution to journalArticle

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Abstract

The field of integrated optics is dependent on major advances in the development of new nonlinear optical (NLO) thin-film materials. NLO materials that are thermally stable and can be fabricated on a variety of substrates would offer vital gains in flexibility and cost. In this work, SiC thin films have been fabricated on sapphire, fused silica, and silicon substrates. The two optically transparent substrates result in films with large second-order optical nonlinearities, as large as 30 times the d11 value of quartz. The refractory nature of SiC and its high melting point suggest that its robustness should compare favorably to organic NLO waveguide materials. The large NLO coefficients indicate that SiC may be competitive with currently available inorganic thin-film materials.

Original languageEnglish
Pages (from-to)2919-2921
Number of pages3
JournalApplied Physics Letters
Volume67
Issue number20
DOIs
Publication statusPublished - Jan 1 1995

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silicon carbides
pulsed lasers
nonlinearity
thin films
integrated optics
refractories
optical materials
optical waveguides
melting points
flexibility
sapphire
quartz
silicon dioxide
costs
silicon
coefficients

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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Large second-order optical nonlinearities in pulsed laser ablated silicon carbide thin films. / Lundquist, P. M.; Ong, H. C.; Lin, W. P.; Chang, R. P H; Ketterson, J. B.; Wong, G. K.

In: Applied Physics Letters, Vol. 67, No. 20, 01.01.1995, p. 2919-2921.

Research output: Contribution to journalArticle

Lundquist, P. M. ; Ong, H. C. ; Lin, W. P. ; Chang, R. P H ; Ketterson, J. B. ; Wong, G. K. / Large second-order optical nonlinearities in pulsed laser ablated silicon carbide thin films. In: Applied Physics Letters. 1995 ; Vol. 67, No. 20. pp. 2919-2921.
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