Large second-order optical nonlinearities in pulsed laser ablated silicon carbide thin films

P. M. Lundquist; H. C. Ong; W. P. Lin; R. P.H. Chang; J. B. Ketterson; G. K. Wong

doi:10.1063/1.114842

Large second-order optical nonlinearities in pulsed laser ablated silicon carbide thin films

P. M. Lundquist, H. C. Ong, W. P. Lin, R. P.H. Chang, J. B. Ketterson, G. K. Wong

Northwestern University

Research output: Contribution to journal › Article › peer-review

21 Citations (Scopus)

Abstract

Large second-order nonlinear optical response has been observed in silicon carbide thin films deposited by pulsed laser ablation on sapphire and fused silica substrates; films on both substrates were uniform and optically transparent but exhibited distinct orientations. The d₃₃ values of the sapphire-substrate samples were determined to be 10 pm/V.

Original language	English
Pages (from-to)	2919
Number of pages	1
Journal	Applied Physics Letters
Volume	67
DOIs	https://doi.org/10.1063/1.114842
Publication status	Published - 1995

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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title = "Large second-order optical nonlinearities in pulsed laser ablated silicon carbide thin films",

abstract = "Large second-order nonlinear optical response has been observed in silicon carbide thin films deposited by pulsed laser ablation on sapphire and fused silica substrates; films on both substrates were uniform and optically transparent but exhibited distinct orientations. The d33 values of the sapphire-substrate samples were determined to be 10 pm/V.",

author = "Lundquist, {P. M.} and Ong, {H. C.} and Lin, {W. P.} and Chang, {R. P.H.} and Ketterson, {J. B.} and Wong, {G. K.}",

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AU - Chang, R. P.H.

AU - Ketterson, J. B.

AU - Wong, G. K.

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Large second-order optical nonlinearities in pulsed laser ablated silicon carbide thin films

Abstract

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