Low-temperature ABC-type atomic layer deposition

synthesis of highly uniform ultrafine supported metal nanoparticles

Junling Lu, Peter C Stair

Research output: Contribution to journalArticle

56 Citations (Scopus)

Abstract

[Figure Presented] Sheltered growth: A novel atomic layer deposition (ALD) method to synthesize highly uniform ultrafine supported metal nanoparticles is described. The ALD process includes growing protected metal nanoparticles and new support layers simultaneously at low temperature. In the final stage, the activation of the metal nanoparticles can be achieved by removing the protective ligands through calcination or reduction at elevated temperature (see picture).

Original languageEnglish
Pages (from-to)2547-2551
Number of pages5
JournalAngewandte Chemie - International Edition
Volume49
Issue number14
DOIs
Publication statusPublished - Mar 29 2010

Fingerprint

Atomic layer deposition
Metal nanoparticles
Calcination
Temperature
Chemical activation
Ligands
Ultrafine

Keywords

  • Atomic layer deposition
  • Low-temperature techniques
  • Metal nanoparticles
  • Palladium
  • Supported catalysts

ASJC Scopus subject areas

  • Chemistry(all)
  • Catalysis

Cite this

@article{6d63f1938db14379af4e748d4d64c3ff,
title = "Low-temperature ABC-type atomic layer deposition: synthesis of highly uniform ultrafine supported metal nanoparticles",
abstract = "[Figure Presented] Sheltered growth: A novel atomic layer deposition (ALD) method to synthesize highly uniform ultrafine supported metal nanoparticles is described. The ALD process includes growing protected metal nanoparticles and new support layers simultaneously at low temperature. In the final stage, the activation of the metal nanoparticles can be achieved by removing the protective ligands through calcination or reduction at elevated temperature (see picture).",
keywords = "Atomic layer deposition, Low-temperature techniques, Metal nanoparticles, Palladium, Supported catalysts",
author = "Junling Lu and Stair, {Peter C}",
year = "2010",
month = "3",
day = "29",
doi = "10.1002/anie.200907168",
language = "English",
volume = "49",
pages = "2547--2551",
journal = "Angewandte Chemie - International Edition",
issn = "1433-7851",
publisher = "John Wiley and Sons Ltd",
number = "14",

}

TY - JOUR

T1 - Low-temperature ABC-type atomic layer deposition

T2 - synthesis of highly uniform ultrafine supported metal nanoparticles

AU - Lu, Junling

AU - Stair, Peter C

PY - 2010/3/29

Y1 - 2010/3/29

N2 - [Figure Presented] Sheltered growth: A novel atomic layer deposition (ALD) method to synthesize highly uniform ultrafine supported metal nanoparticles is described. The ALD process includes growing protected metal nanoparticles and new support layers simultaneously at low temperature. In the final stage, the activation of the metal nanoparticles can be achieved by removing the protective ligands through calcination or reduction at elevated temperature (see picture).

AB - [Figure Presented] Sheltered growth: A novel atomic layer deposition (ALD) method to synthesize highly uniform ultrafine supported metal nanoparticles is described. The ALD process includes growing protected metal nanoparticles and new support layers simultaneously at low temperature. In the final stage, the activation of the metal nanoparticles can be achieved by removing the protective ligands through calcination or reduction at elevated temperature (see picture).

KW - Atomic layer deposition

KW - Low-temperature techniques

KW - Metal nanoparticles

KW - Palladium

KW - Supported catalysts

UR - http://www.scopus.com/inward/record.url?scp=77950229150&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77950229150&partnerID=8YFLogxK

U2 - 10.1002/anie.200907168

DO - 10.1002/anie.200907168

M3 - Article

VL - 49

SP - 2547

EP - 2551

JO - Angewandte Chemie - International Edition

JF - Angewandte Chemie - International Edition

SN - 1433-7851

IS - 14

ER -