Low-temperature ABC-type atomic layer deposition: synthesis of highly uniform ultrafine supported metal nanoparticles

Junling Lu, Peter C. Stair

Research output: Contribution to journalArticle

59 Citations (Scopus)


[Figure Presented] Sheltered growth: A novel atomic layer deposition (ALD) method to synthesize highly uniform ultrafine supported metal nanoparticles is described. The ALD process includes growing protected metal nanoparticles and new support layers simultaneously at low temperature. In the final stage, the activation of the metal nanoparticles can be achieved by removing the protective ligands through calcination or reduction at elevated temperature (see picture).

Original languageEnglish
Pages (from-to)2547-2551
Number of pages5
JournalAngewandte Chemie - International Edition
Issue number14
Publication statusPublished - Mar 29 2010



  • Atomic layer deposition
  • Low-temperature techniques
  • Metal nanoparticles
  • Palladium
  • Supported catalysts

ASJC Scopus subject areas

  • Catalysis
  • Chemistry(all)

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