Low temperature atomic layer deposited TiO2 compact layers for planar perovskite solar cells

I. S. Kim, Richard T. Haasch, Duyen H. Cao, O. K. Farha, Joseph T Hupp, Mercouri G Kanatzidis, A. B F Martinson

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Titanium dioxide (TiO2) thin films have been utilized in a wide range of applications in optoelectronics and solar energy conversion. In particular, TiO2 has been exclusively used in photovoltaic devices and photoelectrochemical cells owing to its ability to efficiently transport electrons and passivate photoactive materials against aqueous media. However, TiO2 exhibits optimal transport properties in the crystalline anatase phase, and thus requires a high temperature annealing, which significantly limits its application in temperature sensitive substrates or active materials (e.g. organic-inorganic hybrid perovskites). Moreover, while high resistance of TiO2 films necessitates the need for ultrathin films to reduce series resistance in PV devices, the synthesis of ultrathin pinhole-free TiO2 films remains a challenge through conventional deposition methods. To address these issues, TiO2 compact layers for planar perovskite PV devices were deposited via atomic layer deposition (ALD) - a chemically diverse vapor phase deposition technique with the capability to synthesize ultrathin pinhole-free films.

Original languageEnglish
Title of host publicationAtomic Layer Deposition Applications 12
PublisherElectrochemical Society Inc.
Pages111-116
Number of pages6
Volume75
Edition6
ISBN (Electronic)9781607685395
DOIs
Publication statusPublished - 2016
EventSymposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting - Honolulu, United States
Duration: Oct 2 2016Oct 7 2016

Other

OtherSymposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting
CountryUnited States
CityHonolulu
Period10/2/1610/7/16

Fingerprint

Titanium dioxide
Photoelectrochemical cells
Atomic layer deposition
Ultrathin films
Energy conversion
Optoelectronic devices
Perovskite
Transport properties
Temperature
Solar energy
Vapors
Annealing
Crystalline materials
Thin films
Substrates
Perovskite solar cells
Electron Transport

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Kim, I. S., Haasch, R. T., Cao, D. H., Farha, O. K., Hupp, J. T., Kanatzidis, M. G., & Martinson, A. B. F. (2016). Low temperature atomic layer deposited TiO2 compact layers for planar perovskite solar cells. In Atomic Layer Deposition Applications 12 (6 ed., Vol. 75, pp. 111-116). Electrochemical Society Inc.. https://doi.org/10.1149/07506.0111ecst

Low temperature atomic layer deposited TiO2 compact layers for planar perovskite solar cells. / Kim, I. S.; Haasch, Richard T.; Cao, Duyen H.; Farha, O. K.; Hupp, Joseph T; Kanatzidis, Mercouri G; Martinson, A. B F.

Atomic Layer Deposition Applications 12. Vol. 75 6. ed. Electrochemical Society Inc., 2016. p. 111-116.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Kim, IS, Haasch, RT, Cao, DH, Farha, OK, Hupp, JT, Kanatzidis, MG & Martinson, ABF 2016, Low temperature atomic layer deposited TiO2 compact layers for planar perovskite solar cells. in Atomic Layer Deposition Applications 12. 6 edn, vol. 75, Electrochemical Society Inc., pp. 111-116, Symposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting, Honolulu, United States, 10/2/16. https://doi.org/10.1149/07506.0111ecst
Kim IS, Haasch RT, Cao DH, Farha OK, Hupp JT, Kanatzidis MG et al. Low temperature atomic layer deposited TiO2 compact layers for planar perovskite solar cells. In Atomic Layer Deposition Applications 12. 6 ed. Vol. 75. Electrochemical Society Inc. 2016. p. 111-116 https://doi.org/10.1149/07506.0111ecst
Kim, I. S. ; Haasch, Richard T. ; Cao, Duyen H. ; Farha, O. K. ; Hupp, Joseph T ; Kanatzidis, Mercouri G ; Martinson, A. B F. / Low temperature atomic layer deposited TiO2 compact layers for planar perovskite solar cells. Atomic Layer Deposition Applications 12. Vol. 75 6. ed. Electrochemical Society Inc., 2016. pp. 111-116
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