Low-temperature deposition of diamond films for optical coatings

Research output: Contribution to journalArticle

78 Citations (Scopus)

Abstract

A low-temperature (≊400°C) plasma-enhanced chemical vapor deposition process has been developed to grow diamond films for optical coatings application. Films with fine grains (≤3000 Å) have been obtained by controlling diamond nucleation. The surface roughness of the films is on the order of 50-200 Å. The optical transparency of the films is over 60% in the range 0.6-2 μm wavelength, which is comparable to that of Type IIa natural diamond. Using a block-on ring tribotester, it is found that the diamond films adhere well to quartz substrates.

Original languageEnglish
Pages (from-to)2063-2065
Number of pages3
JournalApplied Physics Letters
Volume55
Issue number20
DOIs
Publication statusPublished - 1989

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optical coatings
diamond films
diamonds
cold plasmas
surface roughness
quartz
vapor deposition
nucleation
rings
wavelengths

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Low-temperature deposition of diamond films for optical coatings. / Ong, T. P.; Chang, Robert P. H.

In: Applied Physics Letters, Vol. 55, No. 20, 1989, p. 2063-2065.

Research output: Contribution to journalArticle

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