Abstract
A low-temperature (≊400°C) plasma-enhanced chemical vapor deposition process has been developed to grow diamond films for optical coatings application. Films with fine grains (≤3000 Å) have been obtained by controlling diamond nucleation. The surface roughness of the films is on the order of 50-200 Å. The optical transparency of the films is over 60% in the range 0.6-2 μm wavelength, which is comparable to that of Type IIa natural diamond. Using a block-on ring tribotester, it is found that the diamond films adhere well to quartz substrates.
| Original language | English |
|---|---|
| Pages (from-to) | 2063-2065 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 55 |
| Issue number | 20 |
| DOIs | |
| Publication status | Published - 1989 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)
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Cite this
Ong, T. P., & Chang, R. P. H. (1989). Low-temperature deposition of diamond films for optical coatings. Applied Physics Letters, 55(20), 2063-2065. https://doi.org/10.1063/1.102106