Low-temperature deposition of diamond films for optical coatings

T. P. Ong; Robert P. H. Chang

doi:10.1063/1.102106

Low-temperature deposition of diamond films for optical coatings

T. P. Ong, Robert P. H. Chang

Northwestern University

Research output: Contribution to journal › Article

78 Citations (Scopus)

Abstract

A low-temperature (≊400°C) plasma-enhanced chemical vapor deposition process has been developed to grow diamond films for optical coatings application. Films with fine grains (≤3000 Å) have been obtained by controlling diamond nucleation. The surface roughness of the films is on the order of 50-200 Å. The optical transparency of the films is over 60% in the range 0.6-2 μm wavelength, which is comparable to that of Type IIa natural diamond. Using a block-on ring tribotester, it is found that the diamond films adhere well to quartz substrates.

Original language	English
Pages (from-to)	2063-2065
Number of pages	3
Journal	Applied Physics Letters
Volume	55
Issue number	20
DOIs	https://doi.org/10.1063/1.102106
Publication status	Published - 1989

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ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

Cite this

Ong, T. P., & Chang, R. P. H. (1989). Low-temperature deposition of diamond films for optical coatings. Applied Physics Letters, 55(20), 2063-2065. https://doi.org/10.1063/1.102106

@article{12647512dbcf4b15810349203a9d04ab,

title = "Low-temperature deposition of diamond films for optical coatings",

abstract = "A low-temperature (≊400°C) plasma-enhanced chemical vapor deposition process has been developed to grow diamond films for optical coatings application. Films with fine grains (≤3000 {\AA}) have been obtained by controlling diamond nucleation. The surface roughness of the films is on the order of 50-200 {\AA}. The optical transparency of the films is over 60% in the range 0.6-2 μm wavelength, which is comparable to that of Type IIa natural diamond. Using a block-on ring tribotester, it is found that the diamond films adhere well to quartz substrates.",

author = "Ong, {T. P.} and Chang, {Robert P. H.}",

year = "1989",

doi = "10.1063/1.102106",

language = "English",

volume = "55",

pages = "2063--2065",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "20",

}

TY - JOUR

T1 - Low-temperature deposition of diamond films for optical coatings

AU - Ong, T. P.

AU - Chang, Robert P. H.

PY - 1989

Y1 - 1989

N2 - A low-temperature (≊400°C) plasma-enhanced chemical vapor deposition process has been developed to grow diamond films for optical coatings application. Films with fine grains (≤3000 Å) have been obtained by controlling diamond nucleation. The surface roughness of the films is on the order of 50-200 Å. The optical transparency of the films is over 60% in the range 0.6-2 μm wavelength, which is comparable to that of Type IIa natural diamond. Using a block-on ring tribotester, it is found that the diamond films adhere well to quartz substrates.

AB - A low-temperature (≊400°C) plasma-enhanced chemical vapor deposition process has been developed to grow diamond films for optical coatings application. Films with fine grains (≤3000 Å) have been obtained by controlling diamond nucleation. The surface roughness of the films is on the order of 50-200 Å. The optical transparency of the films is over 60% in the range 0.6-2 μm wavelength, which is comparable to that of Type IIa natural diamond. Using a block-on ring tribotester, it is found that the diamond films adhere well to quartz substrates.

UR - http://www.scopus.com/inward/record.url?scp=0001086393&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0001086393&partnerID=8YFLogxK

U2 - 10.1063/1.102106

DO - 10.1063/1.102106

M3 - Article

AN - SCOPUS:0001086393

VL - 55

SP - 2063

EP - 2065

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 20

ER -

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10.1063/1.102106