Low-Voltage Complementary Electronics from Ion-Gel-Gated Vertical Van der Waals Heterostructures

Yongsuk Choi, Junmo Kang, Deep Jariwala, Moon Sung Kang, Tobin J Marks, Mark C Hersam, Jeong Ho Cho

Research output: Contribution to journalArticle

40 Citations (Scopus)
Original languageEnglish
JournalAdvanced Materials
DOIs
Publication statusAccepted/In press - 2016

Keywords

  • Graphene
  • Ion gels
  • Low power
  • Schottky barrier
  • Transition-metal dichalcogenides
  • Vertical transistors

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Low-Voltage Complementary Electronics from Ion-Gel-Gated Vertical Van der Waals Heterostructures. / Choi, Yongsuk; Kang, Junmo; Jariwala, Deep; Kang, Moon Sung; Marks, Tobin J; Hersam, Mark C; Cho, Jeong Ho.

In: Advanced Materials, 2016.

Research output: Contribution to journalArticle

@article{78fe8c16e35b450c9c1c572e23dbdc54,
title = "Low-Voltage Complementary Electronics from Ion-Gel-Gated Vertical Van der Waals Heterostructures",
keywords = "Graphene, Ion gels, Low power, Schottky barrier, Transition-metal dichalcogenides, Vertical transistors",
author = "Yongsuk Choi and Junmo Kang and Deep Jariwala and Kang, {Moon Sung} and Marks, {Tobin J} and Hersam, {Mark C} and Cho, {Jeong Ho}",
year = "2016",
doi = "10.1002/adma.201506450",
language = "English",
journal = "Advanced Materials",
issn = "0935-9648",
publisher = "Wiley-VCH Verlag",

}

TY - JOUR

T1 - Low-Voltage Complementary Electronics from Ion-Gel-Gated Vertical Van der Waals Heterostructures

AU - Choi, Yongsuk

AU - Kang, Junmo

AU - Jariwala, Deep

AU - Kang, Moon Sung

AU - Marks, Tobin J

AU - Hersam, Mark C

AU - Cho, Jeong Ho

PY - 2016

Y1 - 2016

KW - Graphene

KW - Ion gels

KW - Low power

KW - Schottky barrier

KW - Transition-metal dichalcogenides

KW - Vertical transistors

UR - http://www.scopus.com/inward/record.url?scp=84961777792&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84961777792&partnerID=8YFLogxK

U2 - 10.1002/adma.201506450

DO - 10.1002/adma.201506450

M3 - Article

JO - Advanced Materials

JF - Advanced Materials

SN - 0935-9648

ER -