Mass spectroscopy of recoiled ion investigation of electrode segregation effects during the initial stages of SrBi2Ta2O9 film growth

J. Im, A. R. Krauss, O. Auciello, D. M. Gruen, Robert P. H. Chang

Research output: Chapter in Book/Report/Conference proceedingChapter

3 Citations (Scopus)

Abstract

The thermodynamic stability of Pt/Ti/SiO2/Si, Pt/TiO2/SiO2/Si, Pt/Ta/SiO2/Si, Ir/SiO2/Si, and RuO2/SiO2/Si electrode layers has been studied using mass spectroscopy of recoiled ions (MSRI), a new technique which provides monolayer-specific in situ surface analysis under conditions of modest oxygen partial pressures required for oxide film growth using sputter-deposition. Results of the initial stages of growth of SrBi2Ta2O9 films on the various substrates listed above are presented also. It is found that the initial growth of SrBi2Ta2O9 films strongly depends on the composition of the bottom electrode surface, on diffusion and segregation processes, and the presence of reactive species on the electrode surface.

Original languageEnglish
Title of host publicationIntegrated Ferroelectrics
Pages223-235
Number of pages13
Volume22
Edition1-4
Publication statusPublished - 1998

Fingerprint

Film growth
mass spectroscopy
Spectroscopy
Ions
Electrodes
electrodes
ions
Sputter deposition
Surface analysis
Partial pressure
Oxide films
partial pressure
oxide films
Monolayers
Thermodynamic stability
Oxygen
thermodynamics
oxygen
Substrates
Chemical analysis

Keywords

  • Ferroelectric films
  • Pt/Ti electrodes
  • SrBiTaO

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Physics and Astronomy (miscellaneous)
  • Condensed Matter Physics

Cite this

Im, J., Krauss, A. R., Auciello, O., Gruen, D. M., & Chang, R. P. H. (1998). Mass spectroscopy of recoiled ion investigation of electrode segregation effects during the initial stages of SrBi2Ta2O9 film growth. In Integrated Ferroelectrics (1-4 ed., Vol. 22, pp. 223-235)

Mass spectroscopy of recoiled ion investigation of electrode segregation effects during the initial stages of SrBi2Ta2O9 film growth. / Im, J.; Krauss, A. R.; Auciello, O.; Gruen, D. M.; Chang, Robert P. H.

Integrated Ferroelectrics. Vol. 22 1-4. ed. 1998. p. 223-235.

Research output: Chapter in Book/Report/Conference proceedingChapter

Im, J, Krauss, AR, Auciello, O, Gruen, DM & Chang, RPH 1998, Mass spectroscopy of recoiled ion investigation of electrode segregation effects during the initial stages of SrBi2Ta2O9 film growth. in Integrated Ferroelectrics. 1-4 edn, vol. 22, pp. 223-235.
Im J, Krauss AR, Auciello O, Gruen DM, Chang RPH. Mass spectroscopy of recoiled ion investigation of electrode segregation effects during the initial stages of SrBi2Ta2O9 film growth. In Integrated Ferroelectrics. 1-4 ed. Vol. 22. 1998. p. 223-235
Im, J. ; Krauss, A. R. ; Auciello, O. ; Gruen, D. M. ; Chang, Robert P. H. / Mass spectroscopy of recoiled ion investigation of electrode segregation effects during the initial stages of SrBi2Ta2O9 film growth. Integrated Ferroelectrics. Vol. 22 1-4. ed. 1998. pp. 223-235
@inbook{1d572d6605fe409ab24fa32fae81c2b3,
title = "Mass spectroscopy of recoiled ion investigation of electrode segregation effects during the initial stages of SrBi2Ta2O9 film growth",
abstract = "The thermodynamic stability of Pt/Ti/SiO2/Si, Pt/TiO2/SiO2/Si, Pt/Ta/SiO2/Si, Ir/SiO2/Si, and RuO2/SiO2/Si electrode layers has been studied using mass spectroscopy of recoiled ions (MSRI), a new technique which provides monolayer-specific in situ surface analysis under conditions of modest oxygen partial pressures required for oxide film growth using sputter-deposition. Results of the initial stages of growth of SrBi2Ta2O9 films on the various substrates listed above are presented also. It is found that the initial growth of SrBi2Ta2O9 films strongly depends on the composition of the bottom electrode surface, on diffusion and segregation processes, and the presence of reactive species on the electrode surface.",
keywords = "Ferroelectric films, Pt/Ti electrodes, SrBiTaO",
author = "J. Im and Krauss, {A. R.} and O. Auciello and Gruen, {D. M.} and Chang, {Robert P. H.}",
year = "1998",
language = "English",
volume = "22",
pages = "223--235",
booktitle = "Integrated Ferroelectrics",
edition = "1-4",

}

TY - CHAP

T1 - Mass spectroscopy of recoiled ion investigation of electrode segregation effects during the initial stages of SrBi2Ta2O9 film growth

AU - Im, J.

AU - Krauss, A. R.

AU - Auciello, O.

AU - Gruen, D. M.

AU - Chang, Robert P. H.

PY - 1998

Y1 - 1998

N2 - The thermodynamic stability of Pt/Ti/SiO2/Si, Pt/TiO2/SiO2/Si, Pt/Ta/SiO2/Si, Ir/SiO2/Si, and RuO2/SiO2/Si electrode layers has been studied using mass spectroscopy of recoiled ions (MSRI), a new technique which provides monolayer-specific in situ surface analysis under conditions of modest oxygen partial pressures required for oxide film growth using sputter-deposition. Results of the initial stages of growth of SrBi2Ta2O9 films on the various substrates listed above are presented also. It is found that the initial growth of SrBi2Ta2O9 films strongly depends on the composition of the bottom electrode surface, on diffusion and segregation processes, and the presence of reactive species on the electrode surface.

AB - The thermodynamic stability of Pt/Ti/SiO2/Si, Pt/TiO2/SiO2/Si, Pt/Ta/SiO2/Si, Ir/SiO2/Si, and RuO2/SiO2/Si electrode layers has been studied using mass spectroscopy of recoiled ions (MSRI), a new technique which provides monolayer-specific in situ surface analysis under conditions of modest oxygen partial pressures required for oxide film growth using sputter-deposition. Results of the initial stages of growth of SrBi2Ta2O9 films on the various substrates listed above are presented also. It is found that the initial growth of SrBi2Ta2O9 films strongly depends on the composition of the bottom electrode surface, on diffusion and segregation processes, and the presence of reactive species on the electrode surface.

KW - Ferroelectric films

KW - Pt/Ti electrodes

KW - SrBiTaO

UR - http://www.scopus.com/inward/record.url?scp=0032316438&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0032316438&partnerID=8YFLogxK

M3 - Chapter

VL - 22

SP - 223

EP - 235

BT - Integrated Ferroelectrics

ER -