Materials for Superconducting Electronics: In Situ Growth of Prgao3Thin Films by Metalorganic Chemical Vapor Deposition

Bin Han, Deborah A. Neumayer, Douglas L. Schulz, Bruce J. Hinds, Tobin J Marks

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

Phase-pure thin films of the YBCO, BSCCO, TBCCO lattice-matched and low dielectric-loss perovskite insulator PrGaO3 have been grown in situ on single-crystal (110) LaA1O3, (001) SrTiG3, and (001) MgO substrates by metalorganic chemical vapor deposition (MOCVD). Films were grown at temperatures between 750 and 800 °C using the volatile metaiorganic /?-diketonate precursors M(dpm)3 (M = Pr, Ga, and dpm = dipivaloylmethanate) As assessed by x-ray diffraction, the films grow epitaxially on LaAlQ3 and SrTiO3 substrates with a high degree of (001) and/or (110) plane orientation parallel to the substrate surface. The films grown on MgO substrates are polycrystalline. Scanning electron microscopy reveals that the MOCVD-derived PrGaO3 films have smooth, featureless surfaces on all three kinds of substrates.

Original languageEnglish
Pages (from-to)1431-1434
Number of pages4
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume11
Issue number4
DOIs
Publication statusPublished - 1993

Fingerprint

Metallorganic chemical vapor deposition
metalorganic chemical vapor deposition
Electronic equipment
Substrates
electronics
Dielectric losses
dielectric loss
Perovskite
x ray diffraction
Diffraction
insulators
Single crystals
X rays
Thin films
Scanning electron microscopy
scanning electron microscopy
single crystals
thin films
Temperature
temperature

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Materials for Superconducting Electronics : In Situ Growth of Prgao3Thin Films by Metalorganic Chemical Vapor Deposition. / Han, Bin; Neumayer, Deborah A.; Schulz, Douglas L.; Hinds, Bruce J.; Marks, Tobin J.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 11, No. 4, 1993, p. 1431-1434.

Research output: Contribution to journalArticle

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