Abstract
The mechanisms of the sputter-induced orientation change in YBa2Cu3O7-x(YBCO) films grown on MgO (001) substrates by pulsed organometallic beam epitaxy (POMBE) are investigated by x-ray diffraction, Rutherford backscatter spectroscopy (RBS), cross-section TEM (XTEM) and microanalysis. It is found that the W atom implantation concurring with the ion sputtering plays an important role in effecting the orientation change. This implantation changes the surface structure of the substrate and induces an intermediate layer in the initial growth of the YBCO film, which in turn acts as a template that induces the orientation change. It seems that the surface morphology change caused by ion sputtering has only a minor effect on the orientation change.
| Original language | English |
|---|---|
| Title of host publication | Materials Research Society Symposium - Proceedings |
| Editors | W.J. Gray, I.R. Triay |
| Publisher | Materials Research Society |
| Pages | 497 |
| Number of pages | 1 |
| Volume | 458 |
| Publication status | Published - 1997 |
| Event | Proceedings of the 1996 MRS Fall Meeting - Boston, MA, USA Duration: Dec 2 1996 → Dec 6 1996 |
Other
| Other | Proceedings of the 1996 MRS Fall Meeting |
|---|---|
| City | Boston, MA, USA |
| Period | 12/2/96 → 12/6/96 |
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ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
Cite this
Mechanism of sputter-induced orientation change in YBCO films on MgO (001). / Huang, Y.; Vuchic, B. V.; Baldo, P.; Buchholz, D. B.; Mahajan, S.; Lei, J. S.; Markworth, P. R.; Merkle, K. L.; Chang, Robert P. H.
Materials Research Society Symposium - Proceedings. ed. / W.J. Gray; I.R. Triay. Vol. 458 Materials Research Society, 1997. p. 497.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Mechanism of sputter-induced orientation change in YBCO films on MgO (001)
AU - Huang, Y.
AU - Vuchic, B. V.
AU - Baldo, P.
AU - Buchholz, D. B.
AU - Mahajan, S.
AU - Lei, J. S.
AU - Markworth, P. R.
AU - Merkle, K. L.
AU - Chang, Robert P. H.
PY - 1997
Y1 - 1997
N2 - The mechanisms of the sputter-induced orientation change in YBa2Cu3O7-x(YBCO) films grown on MgO (001) substrates by pulsed organometallic beam epitaxy (POMBE) are investigated by x-ray diffraction, Rutherford backscatter spectroscopy (RBS), cross-section TEM (XTEM) and microanalysis. It is found that the W atom implantation concurring with the ion sputtering plays an important role in effecting the orientation change. This implantation changes the surface structure of the substrate and induces an intermediate layer in the initial growth of the YBCO film, which in turn acts as a template that induces the orientation change. It seems that the surface morphology change caused by ion sputtering has only a minor effect on the orientation change.
AB - The mechanisms of the sputter-induced orientation change in YBa2Cu3O7-x(YBCO) films grown on MgO (001) substrates by pulsed organometallic beam epitaxy (POMBE) are investigated by x-ray diffraction, Rutherford backscatter spectroscopy (RBS), cross-section TEM (XTEM) and microanalysis. It is found that the W atom implantation concurring with the ion sputtering plays an important role in effecting the orientation change. This implantation changes the surface structure of the substrate and induces an intermediate layer in the initial growth of the YBCO film, which in turn acts as a template that induces the orientation change. It seems that the surface morphology change caused by ion sputtering has only a minor effect on the orientation change.
UR - http://www.scopus.com/inward/record.url?scp=0030674622&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0030674622&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:0030674622
VL - 458
SP - 497
BT - Materials Research Society Symposium - Proceedings
A2 - Gray, W.J.
A2 - Triay, I.R.
PB - Materials Research Society
ER -