Mechanism of sputter-induced orientation change in YBCO films on MgO (001)

Y. Huang, B. V. Vuchic, P. Baldo, D. B. Buchholz, S. Mahajan, J. S. Lei, P. R. Markworth, K. L. Merkle, Robert P. H. Chang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

The mechanisms of the sputter-induced orientation change in YBa2Cu3O7-x(YBCO) films grown on MgO (001) substrates by pulsed organometallic beam epitaxy (POMBE) are investigated by x-ray diffraction, Rutherford backscatter spectroscopy (RBS), cross-section TEM (XTEM) and microanalysis. It is found that the W atom implantation concurring with the ion sputtering plays an important role in effecting the orientation change. This implantation changes the surface structure of the substrate and induces an intermediate layer in the initial growth of the YBCO film, which in turn acts as a template that induces the orientation change. It seems that the surface morphology change caused by ion sputtering has only a minor effect on the orientation change.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium - Proceedings
EditorsW.J. Gray, I.R. Triay
PublisherMaterials Research Society
Pages497
Number of pages1
Volume458
Publication statusPublished - 1997
EventProceedings of the 1996 MRS Fall Meeting - Boston, MA, USA
Duration: Dec 2 1996Dec 6 1996

Other

OtherProceedings of the 1996 MRS Fall Meeting
CityBoston, MA, USA
Period12/2/9612/6/96

Fingerprint

Ion implantation
Sputtering
Ions
Microanalysis
Organometallics
Substrates
Epitaxial growth
Surface structure
Surface morphology
Diffraction
Spectroscopy
Transmission electron microscopy
X rays
Atoms
barium copper yttrium oxide

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Huang, Y., Vuchic, B. V., Baldo, P., Buchholz, D. B., Mahajan, S., Lei, J. S., ... Chang, R. P. H. (1997). Mechanism of sputter-induced orientation change in YBCO films on MgO (001). In W. J. Gray, & I. R. Triay (Eds.), Materials Research Society Symposium - Proceedings (Vol. 458, pp. 497). Materials Research Society.

Mechanism of sputter-induced orientation change in YBCO films on MgO (001). / Huang, Y.; Vuchic, B. V.; Baldo, P.; Buchholz, D. B.; Mahajan, S.; Lei, J. S.; Markworth, P. R.; Merkle, K. L.; Chang, Robert P. H.

Materials Research Society Symposium - Proceedings. ed. / W.J. Gray; I.R. Triay. Vol. 458 Materials Research Society, 1997. p. 497.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Huang, Y, Vuchic, BV, Baldo, P, Buchholz, DB, Mahajan, S, Lei, JS, Markworth, PR, Merkle, KL & Chang, RPH 1997, Mechanism of sputter-induced orientation change in YBCO films on MgO (001). in WJ Gray & IR Triay (eds), Materials Research Society Symposium - Proceedings. vol. 458, Materials Research Society, pp. 497, Proceedings of the 1996 MRS Fall Meeting, Boston, MA, USA, 12/2/96.
Huang Y, Vuchic BV, Baldo P, Buchholz DB, Mahajan S, Lei JS et al. Mechanism of sputter-induced orientation change in YBCO films on MgO (001). In Gray WJ, Triay IR, editors, Materials Research Society Symposium - Proceedings. Vol. 458. Materials Research Society. 1997. p. 497
Huang, Y. ; Vuchic, B. V. ; Baldo, P. ; Buchholz, D. B. ; Mahajan, S. ; Lei, J. S. ; Markworth, P. R. ; Merkle, K. L. ; Chang, Robert P. H. / Mechanism of sputter-induced orientation change in YBCO films on MgO (001). Materials Research Society Symposium - Proceedings. editor / W.J. Gray ; I.R. Triay. Vol. 458 Materials Research Society, 1997. pp. 497
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abstract = "The mechanisms of the sputter-induced orientation change in YBa2Cu3O7-x(YBCO) films grown on MgO (001) substrates by pulsed organometallic beam epitaxy (POMBE) are investigated by x-ray diffraction, Rutherford backscatter spectroscopy (RBS), cross-section TEM (XTEM) and microanalysis. It is found that the W atom implantation concurring with the ion sputtering plays an important role in effecting the orientation change. This implantation changes the surface structure of the substrate and induces an intermediate layer in the initial growth of the YBCO film, which in turn acts as a template that induces the orientation change. It seems that the surface morphology change caused by ion sputtering has only a minor effect on the orientation change.",
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