Mechanism of sputter-induced orientation change in YBCO films on MgO (001)

Y. Huang; B. V. Vuchic; P. Baldo; D. B. Buchholz; S. Mahajan; J. S. Lei; P. R. Markworth; K. L. Merkle; Robert P. H. Chang

Mechanism of sputter-induced orientation change in YBCO films on MgO (001)

Y. Huang, B. V. Vuchic, P. Baldo, D. B. Buchholz, S. Mahajan, J. S. Lei, P. R. Markworth, K. L. Merkle, Robert P. H. Chang

Northwestern University

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Citation (Scopus)

Abstract

The mechanisms of the sputter-induced orientation change in YBa₂Cu₃O_7-x(YBCO) films grown on MgO (001) substrates by pulsed organometallic beam epitaxy (POMBE) are investigated by x-ray diffraction, Rutherford backscatter spectroscopy (RBS), cross-section TEM (XTEM) and microanalysis. It is found that the W atom implantation concurring with the ion sputtering plays an important role in effecting the orientation change. This implantation changes the surface structure of the substrate and induces an intermediate layer in the initial growth of the YBCO film, which in turn acts as a template that induces the orientation change. It seems that the surface morphology change caused by ion sputtering has only a minor effect on the orientation change.

Original language	English
Title of host publication	Materials Research Society Symposium - Proceedings
Editors	W.J. Gray, I.R. Triay
Publisher	Materials Research Society
Pages	497
Number of pages	1
Volume	458
Publication status	Published - 1997
Event	Proceedings of the 1996 MRS Fall Meeting - Boston, MA, USA Duration: Dec 2 1996 → Dec 6 1996

Other

Other	Proceedings of the 1996 MRS Fall Meeting
City	Boston, MA, USA
Period	12/2/96 → 12/6/96

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials

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Huang, Y., Vuchic, B. V., Baldo, P., Buchholz, D. B., Mahajan, S., Lei, J. S., Markworth, P. R., Merkle, K. L., & Chang, R. P. H. (1997). Mechanism of sputter-induced orientation change in YBCO films on MgO (001). In W. J. Gray, & I. R. Triay (Eds.), Materials Research Society Symposium - Proceedings (Vol. 458, pp. 497). Materials Research Society.

Mechanism of sputter-induced orientation change in YBCO films on MgO (001). / Huang, Y.; Vuchic, B. V.; Baldo, P.; Buchholz, D. B.; Mahajan, S.; Lei, J. S.; Markworth, P. R.; Merkle, K. L.; Chang, Robert P. H.

Materials Research Society Symposium - Proceedings. ed. / W.J. Gray; I.R. Triay. Vol. 458 Materials Research Society, 1997. p. 497.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Huang, Y, Vuchic, BV, Baldo, P, Buchholz, DB, Mahajan, S, Lei, JS, Markworth, PR, Merkle, KL & Chang, RPH 1997, Mechanism of sputter-induced orientation change in YBCO films on MgO (001). in WJ Gray & IR Triay (eds), Materials Research Society Symposium - Proceedings. vol. 458, Materials Research Society, pp. 497, Proceedings of the 1996 MRS Fall Meeting, Boston, MA, USA, 12/2/96.

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title = "Mechanism of sputter-induced orientation change in YBCO films on MgO (001)",

abstract = "The mechanisms of the sputter-induced orientation change in YBa2Cu3O7-x(YBCO) films grown on MgO (001) substrates by pulsed organometallic beam epitaxy (POMBE) are investigated by x-ray diffraction, Rutherford backscatter spectroscopy (RBS), cross-section TEM (XTEM) and microanalysis. It is found that the W atom implantation concurring with the ion sputtering plays an important role in effecting the orientation change. This implantation changes the surface structure of the substrate and induces an intermediate layer in the initial growth of the YBCO film, which in turn acts as a template that induces the orientation change. It seems that the surface morphology change caused by ion sputtering has only a minor effect on the orientation change.",

author = "Y. Huang and Vuchic, {B. V.} and P. Baldo and Buchholz, {D. B.} and S. Mahajan and Lei, {J. S.} and Markworth, {P. R.} and Merkle, {K. L.} and Chang, {Robert P. H.}",

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AU - Huang, Y.

AU - Vuchic, B. V.

AU - Baldo, P.

AU - Buchholz, D. B.

AU - Mahajan, S.

AU - Lei, J. S.

AU - Markworth, P. R.

AU - Merkle, K. L.

AU - Chang, Robert P. H.

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N2 - The mechanisms of the sputter-induced orientation change in YBa2Cu3O7-x(YBCO) films grown on MgO (001) substrates by pulsed organometallic beam epitaxy (POMBE) are investigated by x-ray diffraction, Rutherford backscatter spectroscopy (RBS), cross-section TEM (XTEM) and microanalysis. It is found that the W atom implantation concurring with the ion sputtering plays an important role in effecting the orientation change. This implantation changes the surface structure of the substrate and induces an intermediate layer in the initial growth of the YBCO film, which in turn acts as a template that induces the orientation change. It seems that the surface morphology change caused by ion sputtering has only a minor effect on the orientation change.

AB - The mechanisms of the sputter-induced orientation change in YBa2Cu3O7-x(YBCO) films grown on MgO (001) substrates by pulsed organometallic beam epitaxy (POMBE) are investigated by x-ray diffraction, Rutherford backscatter spectroscopy (RBS), cross-section TEM (XTEM) and microanalysis. It is found that the W atom implantation concurring with the ion sputtering plays an important role in effecting the orientation change. This implantation changes the surface structure of the substrate and induces an intermediate layer in the initial growth of the YBCO film, which in turn acts as a template that induces the orientation change. It seems that the surface morphology change caused by ion sputtering has only a minor effect on the orientation change.

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