Metal-organic chemical vapor deposition of epitaxial Tl2Ba2Ca2Cu3O10-X thin films

Bruce J. Hinds, Jon L. Schindler, Bin Han, Deborah A. Neumayer, Donald Degroot, Tobin J Marks, Carl R. Kannewurf

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Abstract

Superconducting thin films of Tl2Ba2Ca2Cu3O10-X (TL-2223) have been grown on single crystal (110) LaAlO3 using a two-step process. Ba2Ca2Cu3OX precursor films are deposited via metal-organic chemical vapor deposition (MOCVD) in a horizontal hot walled reactor. The second generation precursors Ba(hfa)2·tet, Ca(hfa)2·tet, and Ca(hfa)2 (hfa = hexafluoroacetylacetonate, tet = tetraglyme) were used as volatile metal sources due to their superior volatility and stability. Tl was introduced into the film via a high temperature post anneal in the presence of a Tl2O3:BaO:CaO:CuO pellet (1:2:2:3 ratio). Low O2 partial pressures were used to reduce the temperature in which the Tl-2223 phase forms and to improve the surface morphology associated with a liquid phase intermediate. Films are highly oriented with the c-axis perpendicular to the substrate and a-b axis epitaxy is seen from x-ray Φ-scans. The best films have a resistively measured Tc of 115K and a magnetically derived Jc of 6×105 A/cm2 (77K, 0 T). Preliminary surface resistance measurements, using parallel plate techniques, give Rs = 0.35 mΩ at 5K (ω=10 GHz).

Original languageEnglish
Title of host publicationMaterials Research Society Symposium Proceedings
EditorsSeshu B. Desu, David B. Beach, Bruce W. Wessels, Suleyman Gokoglu
PublisherPubl by Materials Research Society
Pages273-278
Number of pages6
Volume335
ISBN (Print)1558992340
Publication statusPublished - 1994
EventProceedings of the 1993 Fall Meeting of the Materials Research Society - Boston, MA, USA
Duration: Nov 29 1993Dec 3 1993

Other

OtherProceedings of the 1993 Fall Meeting of the Materials Research Society
CityBoston, MA, USA
Period11/29/9312/3/93

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ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Hinds, B. J., Schindler, J. L., Han, B., Neumayer, D. A., Degroot, D., Marks, T. J., & Kannewurf, C. R. (1994). Metal-organic chemical vapor deposition of epitaxial Tl2Ba2Ca2Cu3O10-X thin films. In S. B. Desu, D. B. Beach, B. W. Wessels, & S. Gokoglu (Eds.), Materials Research Society Symposium Proceedings (Vol. 335, pp. 273-278). Publ by Materials Research Society.