Metal-Organic Framework Thin Films as Platforms for Atomic Layer Deposition of Cobalt Ions to Enable Electrocatalytic Water Oxidation

Chung Wei Kung, Joseph E. Mondloch, Timothy C. Wang, Wojciech Bury, William Hoffeditz, Benjamin M. Klahr, Rachel C. Klet, Michael J. Pellin, Omar K. Farha, Joseph T Hupp

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96 Citations (Scopus)

Abstract

Thin films of the metal-organic framework (MOF) NU-1000 were grown on conducting glass substrates. The films uniformly cover the conducting glass substrates and are composed of free-standing sub-micrometer rods. Subsequently, atomic layer deposition (ALD) was utilized to deposit Co2+ ions throughout the entire MOF film via self-limiting surface-mediated reaction chemistry. The Co ions bind at aqua and hydroxo sites lining the channels of NU-1000, resulting in three-dimensional arrays of separated Co ions in the MOF thin film. The Co-modified MOF thin films demonstrate promising electrocatalytic activity for water oxidation.

Original languageEnglish
Pages (from-to)28223-28230
Number of pages8
JournalACS Applied Materials and Interfaces
Volume7
Issue number51
DOIs
Publication statusPublished - Dec 30 2015

Keywords

  • atomic layer deposition
  • cobalt oxide
  • electrocatalyst
  • metal-organic frameworks
  • pyrene
  • water oxidation

ASJC Scopus subject areas

  • Materials Science(all)

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    Kung, C. W., Mondloch, J. E., Wang, T. C., Bury, W., Hoffeditz, W., Klahr, B. M., Klet, R. C., Pellin, M. J., Farha, O. K., & Hupp, J. T. (2015). Metal-Organic Framework Thin Films as Platforms for Atomic Layer Deposition of Cobalt Ions to Enable Electrocatalytic Water Oxidation. ACS Applied Materials and Interfaces, 7(51), 28223-28230. https://doi.org/10.1021/acsami.5b06901