Metallic 1T phase source/drain electrodes for field effect transistors from chemical vapor deposited MoS2

Rajesh Kappera, Damien Voiry, Sibel Ebru Yalcin, Wesley Jen, Muharrem Acerce, Sol Torrel, Brittany Branch, Sidong Lei, Weibing Chen, Sina Najmaei, Jun Lou, Pulickel M. Ajayan, Gautam Gupta, Aditya D. Mohite, Manish Chhowalla

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Abstract

Two dimensional transition metal dichalcogenides (2D TMDs) offer promise as opto-electronic materials due to their direct band gap and reasonably good mobility values. However, most metals form high resistance contacts on semiconducting TMDs such as MoS2. The large contact resistance limits the performance of devices. Unlike bulk materials, low contact resistance cannot be stably achieved in 2D materials by doping. Here we build on our previous work in which we demonstrated that it is possible to achieve low contact resistance electrodes by phase transformation. We show that similar to the previously demonstrated mechanically exfoliated samples, it is possible to decrease the contact resistance and enhance the FET performance by locally inducing and patterning the metallic 1T phase of MoS2 on chemically vapor deposited material. The device properties are substantially improved with 1T phase source/drain electrodes.

Original languageEnglish
Article number092516
JournalAPL Materials
Volume2
Issue number9
DOIs
Publication statusPublished - Sep 1 2014

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ASJC Scopus subject areas

  • Materials Science(all)
  • Engineering(all)

Cite this

Kappera, R., Voiry, D., Yalcin, S. E., Jen, W., Acerce, M., Torrel, S., Branch, B., Lei, S., Chen, W., Najmaei, S., Lou, J., Ajayan, P. M., Gupta, G., Mohite, A. D., & Chhowalla, M. (2014). Metallic 1T phase source/drain electrodes for field effect transistors from chemical vapor deposited MoS2. APL Materials, 2(9), [092516]. https://doi.org/10.1063/1.4896077