Metallic contact formation for molecular electronics: Interactions between vapor-deposited metals and self-assembled monolayers of conjugated mono- and dithiols

Bert De Boer, Martin M. Frank, Yves J. Chabal, Weirong Jiang, Eric Garfunkel, Zhenah Bao

Research output: Contribution to journalLetter

179 Citations (Scopus)

Abstract

We present grazing-incidence Fourier transform infrared and AFM data of Au,Al, and Ti vapor-deposited onto self-assembled monolayers (SAMs) of conjugated mono- and dithiols. SAMs of 4,4‴-dimercapto-p-quaterphenyl, 4,4″-dimercapto-p-terphenyl, and 4,4′-dimercapto-p-biphenyl have reactive thiols at the SAM/vacuum interface that interact with vapor-deposited Au or Al atoms, preventing metal penetration. Conjugated monothiols lack such metal blocking groups, and metals (Au, Al) can penetrate into their SAMs. Vapor deposition of Ti onto conjugated mono- and dithiol SAMs and onto hexadecanethiol SAMs destroys the monolayers.

Original languageEnglish
Pages (from-to)1539-1542
Number of pages4
JournalLangmuir
Volume20
Issue number5
DOIs
Publication statusPublished - Mar 2 2004

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

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