Microscale features and surface chemical functionality patterned by electron beam lithography: A novel route to poly(dimethylsiloxane) (PDMS) stamp fabrication

Matthew T. Russell, Liam S C Pingree, Mark C Hersam, Tobin J Marks

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

Poly(dimethylsiloxane) (PDMS) has become a ubiquitous material for microcontact printing, yet there are few methods available to pattern a completed PDMS stamp in a single step. It is shown here that electron beam lithography (EBL) is effective in writing patterns directly onto cured PDMS stamps, thus overcoming the need for multiple patterning steps. Not only does this method allow the modification of an existing lithographic pattern, but new 3D features such as cones, pits, and channels can also be fabricated. EBL can also be used to fabricate PDMS masks for photolithography whereby 1:1 pattern transfer into a photoresist is achieved. Additionally, direct EBL writing of surface chemical features has been achieved using a PDMS stamp coated with a self-assembled monolayer. An electrostatic mechanism appears to be operative in the EBL patterning process, as supported by calculations, thermogravimetric analysis, time-of-flight secondary ion mass spectroscopy, optical and atomic force microscopy, and chemical functionalization assays.

Original languageEnglish
Pages (from-to)6712-6718
Number of pages7
JournalLangmuir
Volume22
Issue number15
DOIs
Publication statusPublished - Jul 18 2006

Fingerprint

Electron beam lithography
Polydimethylsiloxane
microbalances
lithography
routes
electron beams
Fabrication
fabrication
photolithography
photoresists
printing
Self assembled monolayers
Photolithography
Photoresists
cones
mass spectroscopy
masks
atomic force microscopy
Thermogravimetric analysis
electrostatics

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Colloid and Surface Chemistry

Cite this

Microscale features and surface chemical functionality patterned by electron beam lithography : A novel route to poly(dimethylsiloxane) (PDMS) stamp fabrication. / Russell, Matthew T.; Pingree, Liam S C; Hersam, Mark C; Marks, Tobin J.

In: Langmuir, Vol. 22, No. 15, 18.07.2006, p. 6712-6718.

Research output: Contribution to journalArticle

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