Microstructure and field emission of nanocrystalline diamond prepared from C60 precursors

D. Zhou, A. R. Krauss, T. D. Corrigan, T. G. McCauley, Robert P. H. Chang, D. M. Gruen

Research output: Contribution to journalArticle

30 Citations (Scopus)

Abstract

Cold cathode electron field emission from nanocrystalline diamond thin films produced by microwave plasma-enhanced CVD with C60 as the growth precursor has been observed. The lowest onset field obtained is about 2 V/μm, and a 4 V/μm field is required to emit a current density of 0.4 mA/cm2. It has been found that hydrogen content of the plasma, which can be varied over a wide range, strongly affects the microstructure and electron field emission properties of the nanocrystalline diamond thin films. This is an important new development which allows one to exercise powerful control over many properties of diamond films. Based on TEM characterization and field emission measurements, the effects of the structural defects and the orientations of the diamond grains on the field emission properties are discussed.

Original languageEnglish
JournalJournal of the Electrochemical Society
Volume144
Issue number8
Publication statusPublished - Aug 1997

Fingerprint

Diamond
Field emission
field emission
Diamonds
Diamond films
diamonds
microstructure
Microstructure
electron emission
Thin films
cold cathodes
Electrons
physical exercise
Plasma enhanced chemical vapor deposition
thin films
diamond films
Hydrogen
Cathodes
Current density
Microwaves

ASJC Scopus subject areas

  • Electrochemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Microstructure and field emission of nanocrystalline diamond prepared from C60 precursors. / Zhou, D.; Krauss, A. R.; Corrigan, T. D.; McCauley, T. G.; Chang, Robert P. H.; Gruen, D. M.

In: Journal of the Electrochemical Society, Vol. 144, No. 8, 08.1997.

Research output: Contribution to journalArticle

Zhou, D. ; Krauss, A. R. ; Corrigan, T. D. ; McCauley, T. G. ; Chang, Robert P. H. ; Gruen, D. M. / Microstructure and field emission of nanocrystalline diamond prepared from C60 precursors. In: Journal of the Electrochemical Society. 1997 ; Vol. 144, No. 8.
@article{0a76cbd3c49048fc968c7011e678e91d,
title = "Microstructure and field emission of nanocrystalline diamond prepared from C60 precursors",
abstract = "Cold cathode electron field emission from nanocrystalline diamond thin films produced by microwave plasma-enhanced CVD with C60 as the growth precursor has been observed. The lowest onset field obtained is about 2 V/μm, and a 4 V/μm field is required to emit a current density of 0.4 mA/cm2. It has been found that hydrogen content of the plasma, which can be varied over a wide range, strongly affects the microstructure and electron field emission properties of the nanocrystalline diamond thin films. This is an important new development which allows one to exercise powerful control over many properties of diamond films. Based on TEM characterization and field emission measurements, the effects of the structural defects and the orientations of the diamond grains on the field emission properties are discussed.",
author = "D. Zhou and Krauss, {A. R.} and Corrigan, {T. D.} and McCauley, {T. G.} and Chang, {Robert P. H.} and Gruen, {D. M.}",
year = "1997",
month = "8",
language = "English",
volume = "144",
journal = "Journal of the Electrochemical Society",
issn = "0013-4651",
publisher = "Electrochemical Society, Inc.",
number = "8",

}

TY - JOUR

T1 - Microstructure and field emission of nanocrystalline diamond prepared from C60 precursors

AU - Zhou, D.

AU - Krauss, A. R.

AU - Corrigan, T. D.

AU - McCauley, T. G.

AU - Chang, Robert P. H.

AU - Gruen, D. M.

PY - 1997/8

Y1 - 1997/8

N2 - Cold cathode electron field emission from nanocrystalline diamond thin films produced by microwave plasma-enhanced CVD with C60 as the growth precursor has been observed. The lowest onset field obtained is about 2 V/μm, and a 4 V/μm field is required to emit a current density of 0.4 mA/cm2. It has been found that hydrogen content of the plasma, which can be varied over a wide range, strongly affects the microstructure and electron field emission properties of the nanocrystalline diamond thin films. This is an important new development which allows one to exercise powerful control over many properties of diamond films. Based on TEM characterization and field emission measurements, the effects of the structural defects and the orientations of the diamond grains on the field emission properties are discussed.

AB - Cold cathode electron field emission from nanocrystalline diamond thin films produced by microwave plasma-enhanced CVD with C60 as the growth precursor has been observed. The lowest onset field obtained is about 2 V/μm, and a 4 V/μm field is required to emit a current density of 0.4 mA/cm2. It has been found that hydrogen content of the plasma, which can be varied over a wide range, strongly affects the microstructure and electron field emission properties of the nanocrystalline diamond thin films. This is an important new development which allows one to exercise powerful control over many properties of diamond films. Based on TEM characterization and field emission measurements, the effects of the structural defects and the orientations of the diamond grains on the field emission properties are discussed.

UR - http://www.scopus.com/inward/record.url?scp=0031209219&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0031209219&partnerID=8YFLogxK

M3 - Article

VL - 144

JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

SN - 0013-4651

IS - 8

ER -