Microstructure of epitaxial potassium niobate thin films prepared by metalorganic chemical vapor deposition

M. J. Nystrom, B. W. Wessels, J. Chen, T. J. Marks

Research output: Contribution to journalArticle

34 Citations (Scopus)

Abstract

The microstructure of (001)p-oriented (subscript p indicates the choice of a pseudocubic unit cell) potassium niobate (KNbO3) thin films grown by metalorganic chemical vapor deposition on (100)p lanthanum aluminate and having a large second-order nonlinear optical response is examined. Transmission electron microscopy reveals the films to be epitaxial and the film/substrate interface to be abrupt and semicoherent. The strain between the film and substrate due to the 5% lattice constant mismatch is accommodated by formation of an array of misfit dislocations as well as 60°and 120°ferroelectric microdomains. The domains are located in a 20 nm thick region adjacent to the interface. Beyond the multidomain region, the film is free of significant defects.

Original languageEnglish
Pages (from-to)761
Number of pages1
JournalApplied Physics Letters
DOIs
Publication statusPublished - 1995

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niobates
metalorganic chemical vapor deposition
potassium
microstructure
thin films
lanthanum
transmission electron microscopy
defects
cells

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Microstructure of epitaxial potassium niobate thin films prepared by metalorganic chemical vapor deposition. / Nystrom, M. J.; Wessels, B. W.; Chen, J.; Marks, T. J.

In: Applied Physics Letters, 1995, p. 761.

Research output: Contribution to journalArticle

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