Microvisualization of structural features and ion electroinsertion behavior of patterned WO3 thin films via integrated optical and atomic force microscopies

Keith J. Stevenson; Joseph T. Hupp

doi:10.1149/1.1390882

Microvisualization of structural features and ion electroinsertion behavior of patterned WO₃ thin films via integrated optical and atomic force microscopies

Keith J. Stevenson, Joseph T. Hupp

Northwestern University

Research output: Contribution to journal › Article

14 Citations (Scopus)

Abstract

A versatile method for preparing templated WO₃ thin films on transparent, conductive indium tin oxide (ITO) is demonstrated. In addition, the patterned thin films serve as quantitative experimental platforms for the study of interfacial ion transfer reactions. The differential electroinsertion/electrochromic activity can be correlated with structural characteristics of patterned WO₃ thin films. The influence of structural features such as film morphology, crystallinity and film thickness on the kinetic and optical electroinsertion behavior of redox-active metal oxides, specifically for MoO₃, using integrated `microvisualization' approach is presented.

Original language	English
Pages (from-to)	497-500
Number of pages	4
Journal	Electrochemical and Solid-State Letters
Volume	2
Issue number	10
DOIs	https://doi.org/10.1149/1.1390882
Publication status	Published - Oct 1 1999

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ASJC Scopus subject areas

Chemical Engineering(all)
Materials Science(all)
Physical and Theoretical Chemistry
Electrochemistry
Electrical and Electronic Engineering

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Stevenson, K. J., & Hupp, J. T. (1999). Microvisualization of structural features and ion electroinsertion behavior of patterned WO₃ thin films via integrated optical and atomic force microscopies. Electrochemical and Solid-State Letters, 2(10), 497-500. https://doi.org/10.1149/1.1390882

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10.1149/1.1390882