Microwave surface resistance of YBa2Cu3O7-δ thin films deposited by pulsed organometallic beam epitaxy

D. C. DeGroot, T. P. Hogan, C. R. Kannewurf, D. B. Buchholz, Robert P. H. Chang, F. Gao, M. Feng, R. A. Nordin

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

The microwave surface resistance of superconducting YBa2Cu3O7-δ thin films deposited by pulsed organometallic beam epitaxy (POMBE) has been characterized using the parallel plate transmission line resonator method. POMBE is an advanced organometric chemical vapor deposition technique where precursor vapors are precisely metered onto the substrate under computer control. In this study, the POMBE reactor was used to deposit epitaxial films of varying thickness onto LaAlO3 substrates. The deposition procedure and surface-resistance results for films of varying thicknesses are described. The reduction of surface resistance achieved supports the use of the POMBE technique as a possible method for preparing device-quality high-Tc films and multi-layer structures.

Original languageEnglish
Pages (from-to)271-277
Number of pages7
JournalPhysica C: Superconductivity and its Applications
Volume222
Issue number3-4
DOIs
Publication statusPublished - Mar 20 1994

Fingerprint

Surface resistance
Organometallics
Epitaxial growth
epitaxy
Microwaves
microwaves
Thin films
thin films
Superconducting films
Epitaxial films
Computer control
Substrates
parallel plates
laminates
transmission lines
Resonators
Chemical vapor deposition
Electric lines
Deposits
resonators

ASJC Scopus subject areas

  • Condensed Matter Physics

Cite this

Microwave surface resistance of YBa2Cu3O7-δ thin films deposited by pulsed organometallic beam epitaxy. / DeGroot, D. C.; Hogan, T. P.; Kannewurf, C. R.; Buchholz, D. B.; Chang, Robert P. H.; Gao, F.; Feng, M.; Nordin, R. A.

In: Physica C: Superconductivity and its Applications, Vol. 222, No. 3-4, 20.03.1994, p. 271-277.

Research output: Contribution to journalArticle

DeGroot, D. C. ; Hogan, T. P. ; Kannewurf, C. R. ; Buchholz, D. B. ; Chang, Robert P. H. ; Gao, F. ; Feng, M. ; Nordin, R. A. / Microwave surface resistance of YBa2Cu3O7-δ thin films deposited by pulsed organometallic beam epitaxy. In: Physica C: Superconductivity and its Applications. 1994 ; Vol. 222, No. 3-4. pp. 271-277.
@article{1c81f9d2813847d1aa6c085dfb411c6b,
title = "Microwave surface resistance of YBa2Cu3O7-δ thin films deposited by pulsed organometallic beam epitaxy",
abstract = "The microwave surface resistance of superconducting YBa2Cu3O7-δ thin films deposited by pulsed organometallic beam epitaxy (POMBE) has been characterized using the parallel plate transmission line resonator method. POMBE is an advanced organometric chemical vapor deposition technique where precursor vapors are precisely metered onto the substrate under computer control. In this study, the POMBE reactor was used to deposit epitaxial films of varying thickness onto LaAlO3 substrates. The deposition procedure and surface-resistance results for films of varying thicknesses are described. The reduction of surface resistance achieved supports the use of the POMBE technique as a possible method for preparing device-quality high-Tc films and multi-layer structures.",
author = "DeGroot, {D. C.} and Hogan, {T. P.} and Kannewurf, {C. R.} and Buchholz, {D. B.} and Chang, {Robert P. H.} and F. Gao and M. Feng and Nordin, {R. A.}",
year = "1994",
month = "3",
day = "20",
doi = "10.1016/0921-4534(94)90543-6",
language = "English",
volume = "222",
pages = "271--277",
journal = "Physica C: Superconductivity and its Applications",
issn = "0921-4534",
publisher = "Elsevier",
number = "3-4",

}

TY - JOUR

T1 - Microwave surface resistance of YBa2Cu3O7-δ thin films deposited by pulsed organometallic beam epitaxy

AU - DeGroot, D. C.

AU - Hogan, T. P.

AU - Kannewurf, C. R.

AU - Buchholz, D. B.

AU - Chang, Robert P. H.

AU - Gao, F.

AU - Feng, M.

AU - Nordin, R. A.

PY - 1994/3/20

Y1 - 1994/3/20

N2 - The microwave surface resistance of superconducting YBa2Cu3O7-δ thin films deposited by pulsed organometallic beam epitaxy (POMBE) has been characterized using the parallel plate transmission line resonator method. POMBE is an advanced organometric chemical vapor deposition technique where precursor vapors are precisely metered onto the substrate under computer control. In this study, the POMBE reactor was used to deposit epitaxial films of varying thickness onto LaAlO3 substrates. The deposition procedure and surface-resistance results for films of varying thicknesses are described. The reduction of surface resistance achieved supports the use of the POMBE technique as a possible method for preparing device-quality high-Tc films and multi-layer structures.

AB - The microwave surface resistance of superconducting YBa2Cu3O7-δ thin films deposited by pulsed organometallic beam epitaxy (POMBE) has been characterized using the parallel plate transmission line resonator method. POMBE is an advanced organometric chemical vapor deposition technique where precursor vapors are precisely metered onto the substrate under computer control. In this study, the POMBE reactor was used to deposit epitaxial films of varying thickness onto LaAlO3 substrates. The deposition procedure and surface-resistance results for films of varying thicknesses are described. The reduction of surface resistance achieved supports the use of the POMBE technique as a possible method for preparing device-quality high-Tc films and multi-layer structures.

UR - http://www.scopus.com/inward/record.url?scp=0028392931&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0028392931&partnerID=8YFLogxK

U2 - 10.1016/0921-4534(94)90543-6

DO - 10.1016/0921-4534(94)90543-6

M3 - Article

AN - SCOPUS:0028392931

VL - 222

SP - 271

EP - 277

JO - Physica C: Superconductivity and its Applications

JF - Physica C: Superconductivity and its Applications

SN - 0921-4534

IS - 3-4

ER -