Microwave surface resistance of YBa2Cu3O7-δ thin films deposited by pulsed organometallic beam epitaxy

D. C. DeGroot; T. P. Hogan; C. R. Kannewurf; D. B. Buchholz; Robert P. H. Chang; F. Gao; M. Feng; R. A. Nordin

doi:10.1016/0921-4534(94)90543-6

Microwave surface resistance of YBa₂Cu₃O_7-δ thin films deposited by pulsed organometallic beam epitaxy

D. C. DeGroot, T. P. Hogan, C. R. Kannewurf, D. B. Buchholz, Robert P. H. Chang, F. Gao, M. Feng, R. A. Nordin

Northwestern University

Research output: Contribution to journal › Article

9 Citations (Scopus)

Abstract

The microwave surface resistance of superconducting YBa₂Cu₃O_7-δ thin films deposited by pulsed organometallic beam epitaxy (POMBE) has been characterized using the parallel plate transmission line resonator method. POMBE is an advanced organometric chemical vapor deposition technique where precursor vapors are precisely metered onto the substrate under computer control. In this study, the POMBE reactor was used to deposit epitaxial films of varying thickness onto LaAlO₃ substrates. The deposition procedure and surface-resistance results for films of varying thicknesses are described. The reduction of surface resistance achieved supports the use of the POMBE technique as a possible method for preparing device-quality high-T_c films and multi-layer structures.

Original language	English
Pages (from-to)	271-277
Number of pages	7
Journal	Physica C: Superconductivity and its Applications
Volume	222
Issue number	3-4
DOIs	https://doi.org/10.1016/0921-4534(94)90543-6
Publication status	Published - Mar 20 1994

ASJC Scopus subject areas

Condensed Matter Physics

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DeGroot, D. C., Hogan, T. P., Kannewurf, C. R., Buchholz, D. B., Chang, R. P. H., Gao, F., Feng, M., & Nordin, R. A. (1994). Microwave surface resistance of YBa₂Cu₃O_7-δ thin films deposited by pulsed organometallic beam epitaxy. Physica C: Superconductivity and its Applications, 222(3-4), 271-277. https://doi.org/10.1016/0921-4534(94)90543-6

Microwave surface resistance of YBa₂Cu₃O_7-δ thin films deposited by pulsed organometallic beam epitaxy. / DeGroot, D. C.; Hogan, T. P.; Kannewurf, C. R.; Buchholz, D. B.; Chang, Robert P. H.; Gao, F.; Feng, M.; Nordin, R. A.

In: Physica C: Superconductivity and its Applications, Vol. 222, No. 3-4, 20.03.1994, p. 271-277.

Research output: Contribution to journal › Article

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abstract = "The microwave surface resistance of superconducting YBa2Cu3O7-δ thin films deposited by pulsed organometallic beam epitaxy (POMBE) has been characterized using the parallel plate transmission line resonator method. POMBE is an advanced organometric chemical vapor deposition technique where precursor vapors are precisely metered onto the substrate under computer control. In this study, the POMBE reactor was used to deposit epitaxial films of varying thickness onto LaAlO3 substrates. The deposition procedure and surface-resistance results for films of varying thicknesses are described. The reduction of surface resistance achieved supports the use of the POMBE technique as a possible method for preparing device-quality high-Tc films and multi-layer structures.",

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