MOCVD of epitaxial BaTiO3 films using a liquid barium precursor

A. R. Teren, J. A. Belot, N. L. Edleman, Tobin J Marks, B. W. Wessels

Research output: Contribution to journalArticle

Abstract

The deposition of high quality BaTiO3 films using metal-organic chemical vapor deposition (MOCVD) is reported. Epitaxial films of BaTiO3 on (100) MgO are deposited using the low-melting metal-organic precursor, Ba(hfa)2·pentaethyleneglycol ethyl butyl ether [Ba(hfa)2·PEB]. The precursor is a liquid during deposition, providing a stable vapor pressure. The use of this precursor in growth process provides better compositional control than is possible with a solid precursor, Ba(hfa)2·tetraglyme. The volatility characteristics of the new precursor are evaluated using vacuum thermogravimetric analysis (TGA).

Original languageEnglish
Pages (from-to)175-177
Number of pages3
JournalAdvanced Materials
Volume12
Issue number15
Publication statusPublished - Aug 2000

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Organic Chemicals
Epitaxial films
Organic chemicals
Barium
Chemical vapor deposition
Metals
Metal melting
Liquids
Vapor pressure
Ether
Thermogravimetric analysis
Ethers
Vacuum

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Teren, A. R., Belot, J. A., Edleman, N. L., Marks, T. J., & Wessels, B. W. (2000). MOCVD of epitaxial BaTiO3 films using a liquid barium precursor. Advanced Materials, 12(15), 175-177.

MOCVD of epitaxial BaTiO3 films using a liquid barium precursor. / Teren, A. R.; Belot, J. A.; Edleman, N. L.; Marks, Tobin J; Wessels, B. W.

In: Advanced Materials, Vol. 12, No. 15, 08.2000, p. 175-177.

Research output: Contribution to journalArticle

Teren, AR, Belot, JA, Edleman, NL, Marks, TJ & Wessels, BW 2000, 'MOCVD of epitaxial BaTiO3 films using a liquid barium precursor', Advanced Materials, vol. 12, no. 15, pp. 175-177.
Teren AR, Belot JA, Edleman NL, Marks TJ, Wessels BW. MOCVD of epitaxial BaTiO3 films using a liquid barium precursor. Advanced Materials. 2000 Aug;12(15):175-177.
Teren, A. R. ; Belot, J. A. ; Edleman, N. L. ; Marks, Tobin J ; Wessels, B. W. / MOCVD of epitaxial BaTiO3 films using a liquid barium precursor. In: Advanced Materials. 2000 ; Vol. 12, No. 15. pp. 175-177.
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