MOCVD of epitaxial BaTiO3 films using a liquid barium precursor

Andrew R. Teren, John A. Belot, Nikki L. Edleman, Tobin J Marks, Bruce W. Wessels

Research output: Contribution to journalArticle

27 Citations (Scopus)
Original languageEnglish
Pages (from-to)175-177
Number of pages3
JournalChemical Vapor Deposition
Volume6
Issue number4
Publication statusPublished - Aug 2000

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Epitaxial films
Metallorganic chemical vapor deposition
Barium
barium
metalorganic chemical vapor deposition
Liquids
liquids

ASJC Scopus subject areas

  • Process Chemistry and Technology
  • Electrochemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Teren, A. R., Belot, J. A., Edleman, N. L., Marks, T. J., & Wessels, B. W. (2000). MOCVD of epitaxial BaTiO3 films using a liquid barium precursor. Chemical Vapor Deposition, 6(4), 175-177.

MOCVD of epitaxial BaTiO3 films using a liquid barium precursor. / Teren, Andrew R.; Belot, John A.; Edleman, Nikki L.; Marks, Tobin J; Wessels, Bruce W.

In: Chemical Vapor Deposition, Vol. 6, No. 4, 08.2000, p. 175-177.

Research output: Contribution to journalArticle

Teren, AR, Belot, JA, Edleman, NL, Marks, TJ & Wessels, BW 2000, 'MOCVD of epitaxial BaTiO3 films using a liquid barium precursor', Chemical Vapor Deposition, vol. 6, no. 4, pp. 175-177.
Teren AR, Belot JA, Edleman NL, Marks TJ, Wessels BW. MOCVD of epitaxial BaTiO3 films using a liquid barium precursor. Chemical Vapor Deposition. 2000 Aug;6(4):175-177.
Teren, Andrew R. ; Belot, John A. ; Edleman, Nikki L. ; Marks, Tobin J ; Wessels, Bruce W. / MOCVD of epitaxial BaTiO3 films using a liquid barium precursor. In: Chemical Vapor Deposition. 2000 ; Vol. 6, No. 4. pp. 175-177.
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