MOCVD routes to thin metal oxide films for superconducting electronics

Douglas L. Schulz, Tobin J Marks

Research output: Contribution to journalArticle

72 Citations (Scopus)
Original languageEnglish
Pages (from-to)719-730
Number of pages12
JournalAdvanced Materials
Volume6
Issue number10
Publication statusPublished - Oct 1994

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Thallium compounds
Organic Chemicals
Superconducting films
Copper oxides
High temperature superconductors
Organic chemicals
Superlattices
Organometallics
Film growth
Vapor pressure
Molecular structure
Oxide films
Chemical vapor deposition
Electronic equipment
Metals
Thin films
Microelectronics

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

MOCVD routes to thin metal oxide films for superconducting electronics. / Schulz, Douglas L.; Marks, Tobin J.

In: Advanced Materials, Vol. 6, No. 10, 10.1994, p. 719-730.

Research output: Contribution to journalArticle

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