MULTIPURPOSE PLASMA REACTOR FOR MATERIALS RESEARCH AND PROCESSING.

Research output: Chapter in Book/Report/Conference proceedingChapter

16 Citations (Scopus)

Abstract

The operation of the Bell Laboratories large capacity, multipurpose plasma reactor for materials research and processing is discussed. The design of the reactor is such that all the plasma parameters can be independently controlled. This device has been used for growing, deposition, etching, as well as charged-particle-beammilling of thin films.

Original languageEnglish
Title of host publicationJ Vac Sci Technol
Pages278-280
Number of pages3
Volume14
Edition1
Publication statusPublished - Jan 1976
EventProc of Natl Symp of AVS, 23rd - Chicago, IL, USA
Duration: Sep 21 1976Sep 24 1976

Other

OtherProc of Natl Symp of AVS, 23rd
CityChicago, IL, USA
Period9/21/769/24/76

Fingerprint

Plasmas
Charged particles
Processing
Etching
Thin films

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Chang, R. P. H. (1976). MULTIPURPOSE PLASMA REACTOR FOR MATERIALS RESEARCH AND PROCESSING. In J Vac Sci Technol (1 ed., Vol. 14, pp. 278-280)

MULTIPURPOSE PLASMA REACTOR FOR MATERIALS RESEARCH AND PROCESSING. / Chang, Robert P. H.

J Vac Sci Technol. Vol. 14 1. ed. 1976. p. 278-280.

Research output: Chapter in Book/Report/Conference proceedingChapter

Chang, RPH 1976, MULTIPURPOSE PLASMA REACTOR FOR MATERIALS RESEARCH AND PROCESSING. in J Vac Sci Technol. 1 edn, vol. 14, pp. 278-280, Proc of Natl Symp of AVS, 23rd, Chicago, IL, USA, 9/21/76.
Chang RPH. MULTIPURPOSE PLASMA REACTOR FOR MATERIALS RESEARCH AND PROCESSING. In J Vac Sci Technol. 1 ed. Vol. 14. 1976. p. 278-280
@inbook{e70f8e6a09154af8b177ac713bdecb2d,
title = "MULTIPURPOSE PLASMA REACTOR FOR MATERIALS RESEARCH AND PROCESSING.",
abstract = "The operation of the Bell Laboratories large capacity, multipurpose plasma reactor for materials research and processing is discussed. The design of the reactor is such that all the plasma parameters can be independently controlled. This device has been used for growing, deposition, etching, as well as charged-particle-beammilling of thin films.",
author = "Chang, {Robert P. H.}",
year = "1976",
month = "1",
language = "English",
volume = "14",
pages = "278--280",
booktitle = "J Vac Sci Technol",
edition = "1",

}

TY - CHAP

T1 - MULTIPURPOSE PLASMA REACTOR FOR MATERIALS RESEARCH AND PROCESSING.

AU - Chang, Robert P. H.

PY - 1976/1

Y1 - 1976/1

N2 - The operation of the Bell Laboratories large capacity, multipurpose plasma reactor for materials research and processing is discussed. The design of the reactor is such that all the plasma parameters can be independently controlled. This device has been used for growing, deposition, etching, as well as charged-particle-beammilling of thin films.

AB - The operation of the Bell Laboratories large capacity, multipurpose plasma reactor for materials research and processing is discussed. The design of the reactor is such that all the plasma parameters can be independently controlled. This device has been used for growing, deposition, etching, as well as charged-particle-beammilling of thin films.

UR - http://www.scopus.com/inward/record.url?scp=0016903706&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0016903706&partnerID=8YFLogxK

M3 - Chapter

VL - 14

SP - 278

EP - 280

BT - J Vac Sci Technol

ER -