Abstract
The operation of the Bell Laboratories large capacity, multipurpose plasma reactor for materials research and processing is discussed. The design of the reactor is such that all the plasma parameters can be independently controlled. This device has been used for growing, deposition, etching, as well as charged-particle-beammilling of thin films.
| Original language | English |
|---|---|
| Title of host publication | J Vac Sci Technol |
| Pages | 278-280 |
| Number of pages | 3 |
| Volume | 14 |
| Edition | 1 |
| Publication status | Published - Jan 1976 |
| Event | Proc of Natl Symp of AVS, 23rd - Chicago, IL, USA Duration: Sep 21 1976 → Sep 24 1976 |
Other
| Other | Proc of Natl Symp of AVS, 23rd |
|---|---|
| City | Chicago, IL, USA |
| Period | 9/21/76 → 9/24/76 |
ASJC Scopus subject areas
- Engineering(all)