Abstract
The operation of the Bell Laboratories large capacity, multipurpose plasma reactor for materials research and processing is discussed. The design of the reactor is such that all the plasma parameters can be independently controlled. This device has been used for growing, deposition, etching, as well as charged-particle-beammilling of thin films.
| Original language | English |
|---|---|
| Title of host publication | J Vac Sci Technol |
| Pages | 278-280 |
| Number of pages | 3 |
| Volume | 14 |
| Edition | 1 |
| Publication status | Published - Jan 1976 |
| Event | Proc of Natl Symp of AVS, 23rd - Chicago, IL, USA Duration: Sep 21 1976 → Sep 24 1976 |
Other
| Other | Proc of Natl Symp of AVS, 23rd |
|---|---|
| City | Chicago, IL, USA |
| Period | 9/21/76 → 9/24/76 |
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ASJC Scopus subject areas
- Engineering(all)
Cite this
MULTIPURPOSE PLASMA REACTOR FOR MATERIALS RESEARCH AND PROCESSING. / Chang, Robert P. H.
J Vac Sci Technol. Vol. 14 1. ed. 1976. p. 278-280.Research output: Chapter in Book/Report/Conference proceeding › Chapter
}
TY - CHAP
T1 - MULTIPURPOSE PLASMA REACTOR FOR MATERIALS RESEARCH AND PROCESSING.
AU - Chang, Robert P. H.
PY - 1976/1
Y1 - 1976/1
N2 - The operation of the Bell Laboratories large capacity, multipurpose plasma reactor for materials research and processing is discussed. The design of the reactor is such that all the plasma parameters can be independently controlled. This device has been used for growing, deposition, etching, as well as charged-particle-beammilling of thin films.
AB - The operation of the Bell Laboratories large capacity, multipurpose plasma reactor for materials research and processing is discussed. The design of the reactor is such that all the plasma parameters can be independently controlled. This device has been used for growing, deposition, etching, as well as charged-particle-beammilling of thin films.
UR - http://www.scopus.com/inward/record.url?scp=0016903706&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0016903706&partnerID=8YFLogxK
M3 - Chapter
VL - 14
SP - 278
EP - 280
BT - J Vac Sci Technol
ER -